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本文(PAS 133-2007 Terminology for nnanoscale measurement nand instrumentation《纳米刻度测量和技术用术语》.pdf)为本站会员(bowdiet140)主动上传,麦多课文库仅提供信息存储空间,仅对用户上传内容的表现方式做保护处理,对上载内容本身不做任何修改或编辑。 若此文所含内容侵犯了您的版权或隐私,请立即通知麦多课文库(发送邮件至master@mydoc123.com或直接QQ联系客服),我们立即给予删除!

PAS 133-2007 Terminology for nnanoscale measurement nand instrumentation《纳米刻度测量和技术用术语》.pdf

1、PAS 133:2007Terminology for nanoscale measurement and instrumentationICS 01.040.17; 17.040.99NO COPYING WITHOUT BSI PERMISSION EXCEPT AS PERMITTED BY COPYRIGHT LAWPUBLICLY AVAILABLE SPECIFICATIONPublishing and copyright informationThe BSI copyright notice displayed in this document indicates when th

2、e document was last issued. BSI 2007ISBN 978 0 580 61318 0Publication historyFirst published December 2007Amendments issued since publicationAmd. no. Date Text affectedPAS 133:2007 BSI 2007 iPAS 133:2007ContentsForeword iiiIntroduction 11 Scope 12 General terms 13 Nanoscale measurement methods 24 Ab

3、breviations 13Bibliography 14Summary of pagesThis document comprises a front cover, an inside front cover, pages i to iv, pages 1 to 14, an inside back cover and a back cover.PAS 133:2007ii BSI 2007 This page deliberately left blank BSI 2007 iiiPAS 133:2007ForewordPublishing informationThis Publicly

4、 Available Specification (PAS) has been commissioned by the UK Department for Innovation, Universities and Skills (DIUS) and developed through the British Standards Institution. It came into effect on 31 December 2007.Acknowledgement is given to the following organizations that were involved in the

5、development of this terminology: Keithley Instruments Ltd; Malvern Instruments; Manchester University; Micro Materials Ltd; Naneum Ltd; National Physical Laboratory; QinetiQ.In addition, acknowledgement is given to the contributions of those that commented, including BSI Technical Committee NTI/1, N

6、anotechnologies, the working groups of ISO Technical Committee ISO/TC 229, Nanotechnologies, and other organizations and experts.BSI retains ownership and copyright of this PAS. BSI reserves the right to withdraw or amend this PAS on receipt of authoritative advice that it is appropriate to do so. T

7、his PAS will be reviewed at intervals not exceeding two years, and any amendments arising from the review will be published as an amended PAS and publicized in Update Standards.This PAS is not to be regarded as a British Standard. It will be withdrawn upon publication of its content in, or as, a Bri

8、tish Standard.The PAS process enables a specification to be rapidly developed in order to fulfil an immediate need in industry. A PAS may be considered for further development as a British Standard, or constitute part of the UK input into the development of a European or International Standard.Relat

9、ionship with other publicationsThis PAS is issued as part of a suite of nanotechnology terminology PASs: PAS 71, Vocabulary Nanoparticles; PAS 131, Terminology for medical, health and personal care applications of nanotechnologies; PAS 132, Terminology for the bio-nano interface; PAS 133, Terminolog

10、y for nanoscale measurement and instrumentation; PAS 134, Terminology for carbon nanostructures; PAS 135, Terminology for nanofabrication; PAS 136, Terminology for nanomaterials.PAS 133:2007iv BSI 2007PAS 131 to PAS 136 include terms the definitions for which differ to those given in PAS 71:2005, wh

11、ich was published in June 2005. These differences are the result of further reflection and debate and reflect consensus within the PAS steering groups. Until PAS 71:2005 can be revised to incorporate these changes, it is intended that the terms in PAS 131 to PAS 136 take precedence over PAS 71:2005.

12、This suite of PAS acknowledges the standards development work being conducted by BSI Technical Committee NTI/1, Nanotechnologies, ISO TC/229, Nanotechnologies, IEC/TC 113, Nanotechnology standardization for electrical and electronic products and systems, and CEN/TC 352, Nanotechnologies. Attempts ha

13、ve been made to align the definitions in these PASs with the definitions being developed by these committees, particularly the draft ISO/TS 27687, Terminology and definitions for nanoparticles. However, as the work of these committees is at a development stage, complete alignment has not been possib

14、le in every instance.Contractual and legal considerationsThis publication does not purport to include all the necessary provisions of a contract. Users are responsible for its correct application.Compliance with a Publicly Available Specification cannot confer immunity from legal obligations. BSI 20

15、07 1PAS 133:2007Introduction Many authorities predict that applications of nanotechnologies will ultimately pervade virtually every aspect of life and will enable dramatic advances to be realized in most areas of communication, health, manufacturing, materials and knowledge-based technologies. Even

16、if this is only partially true, there is an obvious need to provide industry and research with suitable tools to assist the development, application and communication of the technologies. One essential tool in this armoury will be the harmonization of the terminology and definitions used in order to

17、 promote their common understanding and consistent usage. This terminology includes terms that are either specific to the sector covered by the title or are used with a specific meaning in the field of nanotechnology. It is one of a series of terminology PASs covering many different aspects of nanot

18、echnologies. This terminology attempts not to include terms that are used in a manner consistent with a definition given in the Oxford English Dictionary 1 and terms that already have well established meanings and to which the addition of the prefix “nano” changes only the scale to which they apply

19、but does not otherwise change their meaning.The multidisciplinary nature of nanotechnologies can lead to confusion as to the precise meaning of some terms because of differences in usage between disciplines. Users are advised that, in order to support the standardization of terminology, this PAS pro

20、vides single definitions wherever possible.1 ScopeThis Publicly Available Specification (PAS) lists terms and definitions used in measurement and/or instrumentation for characterization at the nanoscale and characterization of nanoscale properties by mean of average measurement. This is applicable t

21、o but not limited to terms used in the measurement of chemical, functional and structural properties at the nanoscale.It is intended for use by technologists, regulators, non-governmental organizations (NGOs), consumer organizations, members of the public and others with an interest in the applicati

22、on or use of nanotechnologies in the subject area. 2 General terms2.1 microelectromechanical systems (MEMS) systems with dimensions in the microscale that can respond to an electric (mechanical) stimulus and generate or produce a mechanical (electric) response NOTE MEMS may be used in nanometrology

23、as they might be sensitive to nanoscale properties. PAS 133:20072 BSI 20072.2 nanomaterial material having one or more external dimensions in the nanoscale or which is nanostructuredNOTE Nanomaterials can exhibit properties that differ from those of the same material without nanoscale features.2.3 n

24、anometrologyscience of measurement of nanoscale propertiesNOTE Nanoscale properties can be measured with probes larger than 100 nm. 2.4 nanoscalesize range from approximately 1 nm to 100 nmNOTE 1 Properties that are not extrapolations from larger size will typically, but not exclusively, be exhibite

25、d in this size range.NOTE 2 The lower limit in this definition (approximately 1 nm) has no physical significance but is introduced to avoid single and small groups of atoms from being designated as nano-objects or elements of nanostructures, which might be implied by the absence of a lower limit. IS

26、O/TS 276871)2.5 nanostructuredpossessing a structure comprising contiguous elements with one or more dimension in the nanoscale but excluding any primary atomic or molecular structureNOTE 1 An example of a primary atomic or molecular structure is the arrangement of atoms in a crystalline solid.NOTE

27、2 The use of the term contiguous implies that a sphere, of approximately 100 nm diameter, inscribed in a nanostructured material will intersect more than one element of the structure.3 Nanoscale measurement methods3.1 Scanning probe methods 3.1.1 atomic force microscopy (AFM) technique for imaging s

28、urfaces by mechanically scanning their contours using a microfabricated probe, in which the deflection of a sharp tip sensing the surface forces, mounted on a soft cantilever, is monitored as the tip is moved across the surfaceNOTE Part of the family of microscopies referred to as Scanning Probe Mic

29、roscopy (SPM).PAS 71: 2005, definition 10.23.1.2 contact mode atomic force microscope mode in which the probe or the sample height is adjusted to keep a constant repulsive force between the probe and the samplederived from BS ISO 18115:2001, Surface chemical analysis Vocabulary1)In preparation. BSI

30、2007 3PAS 133:20073.1.3 electrostatic force microscopy (EFM)AFM mode in which a conductive probe is used to map both topography and electrostatic force between the tip and the sample surfacederived from BS ISO 18115:2001, Surface chemical analysis Vocabulary3.1.4 force-distance curvepairs of force a

31、nd distance values resulting from a mode of operation of an AFM in which the probe is set at a fixed (x,y) position and the force measured as the probe tip is moved towards or away from the surfacederived from BS ISO 18115:2001, Surface chemical analysis Vocabulary3.1.5 intermittent mode AFM mode wh

32、ere the probe is operated with a sinusoidal z-displacement modulation such that the probe tip makes contact with the sample for a fraction of the sinusoidal cyclederived from BS ISO 18115:2001, Surface chemical analysis Vocabulary3.1.6 lateral force microscopy (LFM)AFM mode measuring the torsional d

33、eformation of the cantileverNOTE The lateral deformation usually depends on the friction between the tip and the surface.3.1.7 magnetic force microscopy (MFM)AFM mode measuring the force acting between the magnetic field of the sample and the magnetic dipoles of a cantilever coated with ferromagneti

34、c materials3.1.8 magnetic resonance force microscopy (MRFM)scanning probe method which combines the three-dimensional imaging capabilities of magnetic imaging with the high sensitivity and resolution of atomic force microscopy by mechanically detecting magnetic resonance signals between a permanent

35、magnet and the spin magnetization of the atoms 3.1.9 nanoprobe probe used to facilitate measurement at the nanoscale 3.1.10 non-contact mode atomic force microscope mode in which the probe oscillates above the surface and experiences an attractive force during this oscillationderived from BS ISO 181

36、15:2001, Surface chemical analysis Vocabulary3.1.11 scanning capacitance microscopy (SCM)AFM mode where an AC bias is applied to a conducting probe in contact with a semiconductor sample generating capacitance variations in the sample which can be detected using a GHz resonant capacitance sensor NOT

37、E SCM measures the change in electrostatic capacitance between the surface and the probe.PAS 133:20074 BSI 20073.1.12 scanning electrochemical microscopy (SECM)AFM mode in which a conductive probe is used in an electrolyte solution to measure both topography and electrochemical currentderived from B

38、S ISO 18115:2001, Surface chemical analysis Vocabulary3.1.13 scanning Kelvin probe microscopy (SKPM)AFM non-contact mode which measures the relative potential between the surface and a conductive probe by determining the probe bias for a null alternating currentderived from BS ISO 18115:2001, Surfac

39、e chemical analysis Vocabulary3.1.14 scanning probe microscopy (SPM)method in which a probe is scanned over the surface of a sample, usually coupled to a feedback loop. A generic term for all devices using physical interaction between a probe tip and a sample surface for sub-micrometer imaging NOTE

40、1 Amongst this family those mentioned in note 2 can be used for nanofabrication, for example, the physical probe can be used to move or place atoms on a surface, change the chemistry of a surface, or remove material from a surface in a controlled manner leaving a textured surface.NOTE 2 Established

41、types of scanning probe microscopy that can be used for nanofabrication include: AFM (Atomic Force Microscopy); MFM (Magnetic Force Microscopy); SNOM (Scanning Near-field Optical Microscopy (or NSOM Near Field Scanning Optical Microscopy) ); SECM (Scanning Electrochemical Microscopy); STM (Scanning

42、Tunneling Microscopy).3.1.15 scanning tunneling microscopy (STM)technique for revealing the apparent electron-density-related atomic structure of surfaces, using a needle-like probe near the object under observation; a tunnelling current, which is measured, is generated by altering the potential at

43、the tip of the probe; a 3D representation of the sample surface is generated by rastering the tip over the surface of the object and mapping the distance for constant current level at various pointsNOTE STMs have also been used to produce changes in the molecular composition of substances.PAS 71:200

44、5, definition 10.283.2 Ion beam analysis methods3.2.1 Auger electron spectroscopy (AES)method in which an electron spectrometer is used to measure the energy distribution of Auger electrons emitted from a surface BS ISO 18115, definition 3.5 BSI 2007 5PAS 133:20073.2.2 elastic recoil detectionmethod

45、 in which measurement of the elastic scattering of ions is used to analyse for light elements in a solid NOTE For carbon materials, the method is often used to determine the hydrogen content, for example, in a-C:H.3.2.3 focused ion beam (FIB) beam of ions (usually gallium) focused through a set of e

46、lectrostatic lenses to create a small spot on a substrate NOTE 1 The beam removes material from the substrate through physical sputtering. The beam spot can be scanned across the surface to create a pattern. Nanometer scale resolution can be obtained in this process. NOTE 2 Also know as FIB milling.

47、NOTE 3 The generated secondary electrons (or ions) can be collected to form an image of the surface of the sample.NOTE 4 FIB is particularly used for site-specific analysis, deposition and ablation of materials.3.2.4 ion beam analysis (IBA)method to elucidate composition and structure of the outermo

48、st atomic layers of a solid material, in which principally mono-energetic, singly charged probe ions, scattered from the surface are detected and recorded as a function of their energy or angle of scattering, or both BS ISO 18115, definition 4.83.2.5 Rutherford back scattering (RBS)method in which t

49、he scattering of high energy ions is used to determine compositional and structural information about a solidNOTE The technique can be used, for example, to determine the variation of sp3 fraction and the density of a carbon film.3.2.6 secondary-ion mass spectrometry (SIMS)method in which a mass spectrometer is used to measure the mass-to-charge quotient and abundance of secondary ions emitted from a sample as a result of bombardment by energetic ions BS ISO 18115, definition 4.93.3 Electron

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