T.F. EdgarDepartment of Chemical EngineeringThe University.ppt

1、T.F. Edgar Department of Chemical Engineering The University of Texas Austin, Texas 78712September 27 - 28, 2000 Madison, Wisconsin,UTStudents/Faculty,Large entering class (2000), 4 to 5 students interested in control (+1 student to transfer from Rice University in January, 2000) Web site enhancemen

2、t PhDs graduated/expected C. Pfeiffer (1/00) - Motorola - Nonlinear System Control B.S. Ko (6/00) - Exxon Chemicals - Control Loop Performance Monitoring C. Bode (12/00) - AMD - Lithography Run-to-Run Control (MPC) T. Soderstrom (12/00) - Data Reconciliation Faculty opening in systems area Leon Lasd

3、on will participate as PI,Reactive Distillation Project Goals (J. Schell, S. Lextrait, J. Peng),Operate columns Alkylation (Condea Vista) Etherification (SRP - but considering alternatives to TAME) Validate existing reactive distillation simulators (trays/segments) Aspens RADFRAC (equilibrium stages

4、) Aspens RateFRAC (mass transfer rates) Aspen dynamics Develop fundamental nonlinear models for comparison Proposals being sent to Aspentech, NSF,Run-to-Run Control of Photolithography Overlay Christopher A. Bode (Ph.D. 12/00),Accomplishments Overlay has been identified as one of the largest control

5、 issues in lithography (SIA roadmap) Overlay parameters define alignment of successive patterned layers Developed a MIMO Linear Model Predictive Control Strategy for photolithography overlay Input step disturbance observer model with constraints (run-to-run) Utilizes hierarchical control to group lo

6、ts with like overlay properties Deployed to full production in AMDs Fab25 production facility Dramatic increase in performance that enable 0.25 mm generation production Future work Add uncontrolled parameters to LMPC model to account for disturbances Develop multiple product control scheme Investiga

7、te application to linewidth control,TWMCC - Multiple Projects,Company JBR TFE JQ AMD Aspentech ? Condea-Vista DuPont Eastman Equilon Exxon/Mobil Fisher-Rosemount (?) KLA-Tencor ,TWMCC - Multiple Projects (Contd),Company JBR TFE JQ Motorola National Instruments Texas Instruments Tokyo Electron Americ

8、a Union Carbide/Dow (?) (?) Weyerhauser Courting Applied Materials, GE-Continental Controls, Chevron, DOT Products. Competition with other consortia?,M.S., Ph.D. Graduates (1998 - 2000),Student/Supervisor Destination K. Balakrishnan (TFE) Ph.D. (12/98) Motorola K. Teague (TFE) Ph.D. (5/99) Aspentech

9、 C. Pfeiffer (TFE) Ph.D. (12/99) Motorola Q. Finefrock (TFE) Ph.D. (?/?) Still consulting J. Campbell (TFE) Ph.D. (8/99) KLA-Tencor M. Misra (JQ) Ph.D. (8/99) Motorola T. Nugroho (JQ) Ph.D. (8/99) Pertamina R. Bindlish (JBR) Ph.D. (12/99) Dow C. Rao (JBR) Ph.D. (12/99) Postdoc/Ohio State G. Scheid (

10、JQ) M.S. (12/99) LSI Logic,M.S., Ph.D. Graduates (1998 - 2000),Student/Supervisor Destination W. Cho (TFE) Ph.D. (?) AMD B. Ko (TFE) Ph.D. (5/00) Exxon Chemicals C. Bode (TFE) Ph.D. (5/00) AMD H. Yue (JQ) Ph.D. (5/00) Tokyo Electron America S. Middlebrooks (JBR) Ph.D. (8/00) Trilogy (?) T. Soderstro

11、m (TFE) Ph.D. (12/00) Interviewing J. Schell (TFE) Ph.D. (5/01) Interviewing J. Wang (JBR) Ph.D. (5/01) Interviewing D. Patience (JBR) Ph.D. (5/01) Interviewing S.V. Venkatesh (JBR) M.S. (5/01) Interviewing S. Valle Cervantes (JQ) Ph.D. (5/01) Interviewing R. Mak (JQ) M.S. (5/01) Interviewing,Edgar

12、Group Research Highlights,Microelectronics Manufacturing (New activities) AMD - Adaptive run-to-run control (Alex Pasadyn) Motorola - Lithography (Victor Martinez) Tokyo Electron - successful summer project (Kevin Chamness) KLA-Tencor -TBD (Stacy Firth from Rice University) Texas Instruments - TBD R

13、un-to-Run Control/Fault Detection short course Reaction Distillation Modeling/Control (Schell, Peng, Lextrait),Recent Presentations (TFE),IEEE CDC (12/99) - Microelectronics manufacturing AIChE (3/00) - Vision 2020/distillation ADCHEM (6/00) - Gross error detection (Soderstrom) ASEE (6/00) - information technology in education ACC (6/00) - Ko, Hahn papers presented PSE (7/00) - Lee paper (multivariable control),Dual Rate PI Control System,Kc,S/H,Gp,+,+,-,+,slow sampling,fast sampling, Improved stability margin vs. PI Improved tuning properties,