1、Designation: D 4002 81 (Reapproved 2002)Standard Practice forEvaluation of Buffable Shoe Polish1This standard is issued under the fixed designation D 4002; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year of last revision.
2、A number in parentheses indicates the year of last reapproval. Asuperscript epsilon (e) indicates an editorial change since the last revision or reapproval.1. Scope1.1 This practice covers the definition of properties to testand the apparatus to use, in evaluating the performance ofbuffable shoe pol
3、ishes.1.2 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Termin
4、ology2.1 shoe polishaids in cleaning, improving the appear-ance, and protecting leather or other shoe materials from suchcommon damaging effects as scuffs, water, salt water, and othersurface deposits, commonly encountered with the use of shoesoutdoors or indoors. A buffable shoe polish requires buf
5、fing toobtain appearance improvements.3. Significance and Use3.1 This practice is intended to define the properties to betested, the apparatus to use, and the comparisons of productperformance. It is recognized that considerable discretionexists among formulators and marketers of shoe polish on what
6、properties or performance characteristics are best for theirproducts. This practice will be flexible to honor this fact withinthe confines of the shoe polish definition in 2.1.4. Apparatus and Materials4.1 Test Polish.4.2 Control PolishThe control polish is selected subjec-tively for comparison to t
7、he test polish. It may be a competitiveproduct, a modified formulation of the test polish, etc. The onestipulation is that, the control polish be of the same or similartype as the test polish. For example, if the test polish is anaerosol-emulsion polish, the control should be an aerosol-emulsion pol
8、ish. It would not be meaningful to select a paste orliquid product as a control for comparison to an aerosol-emulsion test polish.4.3 Test SubstratesThe test substrate should be one forwhich the test polish is intended. Separate tests should beconducted for smooth-grained leather substrates to which
9、 themost current leather finishes have been applied at a tannery.The finished leather should be the exact type normally used bythe shoe manufacturer to fabricate everyday dress shoes. Testsubstrates of man-made materials should be obtained in thesame manner. The test surface should be in good physic
10、alcondition, not badly cracked, scratched, or otherwise damagedso as to interfere with evaluation of polish properties. Variouscolors are required, see Section 9.4.4 ApplicatorsSeveral methods of shoe polish applica-tion to substrates should be tested. Various types of applicatorsinclude brush, clot
11、h, and foam. The same type of applicatorshould be used to apply the polish for both the control and testpolish.4.5 Polishing ClothThe same type of polishing clothshould be used for each sample. Materials such as washedcheese cloth, rumple cloth, flannel, cotton diaper cloth, andnonwoven fabrics are
12、suitable for this purpose. Felt or papershould not be used.4.6 Polishing BrushA separate horsehair brush or horse-hair composition shoe brush should be used with each sample.4.7 Cleaning SolventAliphatic solvents with kauri-butanol values less than 38.4.8 Eye Droppers and Tap Water.4.9 Sharp Metal K
13、nife.4.10 Light-Colored Wool, Polyester/Cotton Pieces, of trou-ser or dress clothing.4.11 Thermometer.4.12 Humidity Gage.5. Precautions5.1 The temperature and relative humidity of the test runsshould be measured and recorded. The temperature should bewithin 13 to 29C (55 to 85F) with a relative humi
14、dity of 20to 80 %.5.2 The substrate should have the same temperature as thesurrounding area.5.3 Comparisons should not be made between two separateswatches (or leather objects) since leather substrates may varywidely.5.4 Leather substrates are normally used only one time.6. Personnel and Instruction
15、s6.1 The application and evaluation of the test and controlpolishes require four individuals. They should be capable of1This practice is under the jurisdiction of ASTM Committee D21 on Polishesand is the direct responsibility of Subcommittee D21.04 on Performance Tests.Current edition approved March
16、 27, 1981. Published May 1981. Originallypublished as D 4002- 81. Last previous edition D 4002 - 81.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.making discriminating judgments of subjective physical andaesthetic properties. Train
17、ing and orientation to specific prod-uct performance characteristics may be required.6.1.1 The four persons should apply the polishes to one ofeach of the four test substrates. All persons then rate allproperties, except application properties, on the remainingthree panels that they did not apply po
18、lish to. The personsapplying the polishes should rate ease of use and otherapplication properties. This means there will be only fourreadings on application properties. The three rating the otherproperties, do not observe the application because they rateproperties of each polish “blind.”7. Procedur
19、e7.1 Cleaning of Test SubstratesAn aliphatic solvent hav-ing a kauri-butanol value less than 38 should be used to lightlywipe the test substrate. Soft cotton towels may be used to applythe solvent to the surface and to wipe it clean. New oradequately laundered towels should be used each time.7.2 Sur
20、face SubdivisionThe precleaned surface of eachtest substrate should be divided and outlined by tape withuniform squares.7.3 Application of polish or waxAssuming the controlpolish or the test polish is a commercially available product,follow the directions on the container as far as possible. Whenin
21、doubt on the method of use, the directions for similarproducts may be used. Equal volumes of control and test polishor wax should be used to avoid excessively thin or heavy coats.One or two applications may be used depending on thesubstrate and the discretion of the tester. The same number ofcoats m
22、ust be used for both the test sample and the control.8. Placement of Polishes or Waxes8.1 Method AA controlled, randomized method of layingout the test (X) and control (C) polishes or waxes is representedas follows:Test Panel Left Center Right1CXC2CCX3X4XXC8.1.1 These four positionings should be wri
23、tten on tags anddrawn randomly by each of the four who apply the polishes.8.2 Method BA controlled, randomized method of layingout the test (X) and control (C) polishes is represented asfollows:Test Panel Left Right1CX2XC3C4X8.2.1 These four positionings should be written on tags anddrawn randomly b
24、y each of the four who apply the polishes.9. Evaluation9.1 Compare the test polish and the control as follows:9.1.1 Application and Buffng Properties (ease of rub-up tomaximum gloss)During application and buffing of the pol-ishes, note the time and ease with which each product developsmaximum gloss.
25、9.1.2 Final PropertiesEvaluate any or all of the followingproperties no sooner than 5 min following application:9.1.2.1 GlossEvaluate as depth of gloss and buffing.9.1.2.2 UniformityObserve the surface for streaks, unpol-ished dry spots, and general uniformity.9.1.2.3 Film ClarityObserve the clearne
26、ss or sharpness ofan objects image in the surface of the polish. Overhead lights,face, hand, or other objects may be used for reflection. This testmay be eliminated for low-lustre surfaces that do not possessmirror-like finishes.9.1.2.4 Smear and Scuff ResistanceSmear is the degree ofoiliness or gre
27、asiness after the polish is rubbed-up to thedesired polish appearance. Scuff is the degree of film damageresulting from a glancing blow to the polish substrate. Checksmear by making a design such as an “S” with ones finger. Aglancing blow with ones knuckles or soft object such as abook or magazine m
28、ay be used for determining the degree ofscuff.9.1.2.5 Film HealingObserve the length of time requiredfor the smear or scuff in 9.1.2.4 to disappear from the polishfilm, should it occur.9.1.2.6 RebuffabilityObserve the ease of completeness orrepairability when the smears and scuffs are buffed with ap
29、olishing cloth. The amount of physical effort and length oftime required is noted.9.1.2.7 CleaningObserve the ease of removal of oldpolish films, as well as common soiling materials such as dust,grease, oils, finger marks, beverage stains, etc. This may bedone either in the laboratory or observed du
30、ring actual usetrials of the products. In the laboratory, removal of old polishmay be determined by applying multiple coats (10 to 20applications) and determining polish build-up. A polish show-ing little build-up would be rated a good cleaner for old polish.Other materials, such as grease, oils, et
31、c., should be tested onan individual basis.9.1.2.8 Water SpottingAt least 2 h after application of thepolishes, place at random to the polishes surfaces several spotsof water, about the size of a penny. Allow the water to remainon the surface for 5, 15, 30 min, and 1 h. At precise intervals,blot the
32、 water with a paper towel or other absorbent material.Do not wipe! Observe the presence and degree of film damage.Other materials such as milk, coffee, juice, alcoholic bever-ages, etc., may be used to supplement the water test.9.1.2.9 Gloss RetentionObserve the degree of gloss of afreshly applied a
33、nd buffed-polish film compared to that of anaged-polish film.9.1.2.10 Dust Attraction is measured by carefully wipingthe test surface to remove all dirt and dust. Place the testsubstrate in the place of your choice to accumulate dust. Checkdust build-up on the panel after 24, 48, and 72 h after 1 we
34、ek.9.1.2.11 FlexibilityCrease the test substrate between twofingers. Turn the substrates and crease in the opposite direction.Note the amount of polish that either falls off, dislodges,whitens, or powders at the crease.9.1.2.12 HidingScuff the leather substrate with a sharpknife until the thin top l
35、ayer has broken to expose a14-in.(6.3-mm) path of rough area, usually of a light color. Apply orre-apply dark colored polish, in accordance with containerD 4002 81 (2002)2directions. Observe degree of hiding.9.1.2.13 Staining PowerUsing a single color for substrateand polish, apply multiple coats (1
36、0 to 20 applications) of darkpolish on only half of each light-colored leather substrate.Observe the degree of darkening of the polished half (staining)versus the unpolished half for each sample.9.1.2.14 Dry CrockRub polish substrate gently with lightcolored pieces of wool, polyester/cotton pieces o
37、f trouser, ordress clothing to determine degree of rub off onto clothing.10. Report10.1 Method AUsing 8.1, all properties are rated 0 to 5. Avalue of 5 equals excellent and 0 equals complete failure.Values in between are various degrees between these extremes.This is a monadic value system for each
38、test surface evaluatedbased on each individual raters own reference scale. Since thethree individuals rating the final properties do not know theplacement sequence, each polished area is rated “blind” withno possibility for bias.10.1.1 Form 1 should be used to record the raw data. Form2 should be us
39、ed to summarize and compare the raw data. Thefollowing calculation provides a rating factor for each propertytested:F = rating factor for test polish,Fc= rating factor for control polish,X property = sum of all readings of a specific property forthe test polish,C property = sum of all readings of a
40、specific property forthe control polish,N = number of observations,F = X property/N, andFc= C property/N.10.2 Method BUsing 8.2, all properties are rated 1 to 5,with the control surface always given a rating of 3, regardlessof how good or bad it really is. The scale has the followingadjectival ratin
41、gs:1 = significantly poorer than control,2 = slightly poorer than control,3 = no difference from control,4 = slightly better than control, andPropertiesTest SwatchApplication No. 1Test SwatchApplication No. 2Left Center Right Left Center RightPropertiesTest SwatchApplication No. 3Test SwatchApplicat
42、ion No. 4Left Center Right Left Center RightRating Scale: 0 to 55 = excellent 2 = fair4 = very good 1 = poor3 = good 0 = complete failureNOTE 1Designate the position of the product (X or C) in the box designating the position on the test panel; for example: left, center,orright.FORM 1 Buffable Shoe
43、Polish EvaluationIndividual Ratings for 10.1.1.D 4002 81 (2002)35 = significantly better than control.This value system is a paired comparison with the controlsurface always acting as the point of reference. Since the threeindividuals rating the final properties need the control surfaceto be identif
44、ied, the identification of the control product mustnot be revealed to prevent bias.10.2.1 Form 3 should be used to record the raw data. Form4 should be used to summarize and compare the raw data. Thefollowing calculation provides a rating factor for each propertytested.F = rating factor for test pol
45、ish,X property = sum of all readings for a specific property forthe test polish,N = number of observations, andF = X property/N.Specific properties of the control are assigned a value of 3.0.11. Precision and Bias11.1 Method ADue to the subjective nature of this testmethod, no precision and bias can
46、 be established.11.2 Method B(Same as A.) However, since all the ratingfactors are in relation to the control, the values can be analyzedstatistically to determine if the differences observed are sig-nificant.12. Keywords12.1 buffable; buffing; dry crock; film; healing; leatherapplicator; polish; re
47、buffability; resistance; scuff; shoe; smear;substrateProducts ComparedSurfaces Used for TestingDate_Evaluator_Summary of Product (X) Properties Summary of Control (C) PropertiesFORM 2 Buffable Shoe Polish EvaluationIndividual Ratings for 10.1.1.D 4002 81 (2002)4PropertiesTest SwatchApplication No. 1
48、Test SwatchApplication No. 2Control Test Test ControlPropertiesTest SwatchApplication No. 3Test SwatchApplication No. 4Control Test Test ControlRating Scale: 1 to 55 = significantly better than control4 = slightly better than control3 = no difference from control2 = slightly poorer than control1 = s
49、ignificantly poorer than controlFORM 3 Buffable Shoe Polish EvaluationIndividual Ratings for 10.2.1.D 4002 81 (2002)5ASTM International takes no position respecting the validity of any patent rights asserted in connection with any item mentionedin this standard. Users of this standard are expressly advised that determination of the validity of any such patent rights, and the riskof infringement of such rights, are entirely their own responsibility.This sta
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