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本文(BS ISO 10110-14-2008 Optics and photonics - Preparation of drawings for optical elements and systems - Wavefront deformation tolerance《光学和光子学 光学元件和设备制图准备 波阵面变形公差》.pdf)为本站会员(hopesteam270)主动上传,麦多课文库仅提供信息存储空间,仅对用户上传内容的表现方式做保护处理,对上载内容本身不做任何修改或编辑。 若此文所含内容侵犯了您的版权或隐私,请立即通知麦多课文库(发送邮件至master@mydoc123.com或直接QQ联系客服),我们立即给予删除!

BS ISO 10110-14-2008 Optics and photonics - Preparation of drawings for optical elements and systems - Wavefront deformation tolerance《光学和光子学 光学元件和设备制图准备 波阵面变形公差》.pdf

1、BRITISH STANDARDBS ISO 10110-14:2007Optics and photonics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation toleranceICS 01.100.20; 37.020g49g50g3g38g50g51g60g44g49g42g3g58g44g55g43g50g56g55g3g37g54g44g3g51g40g53g48g44g54g54g44g50g49g3g40g59g38g40g51g55g3g36g54g3

2、g51g40g53g48g44g55g55g40g39g3g37g60g3g38g50g51g60g53g44g42g43g55g3g47g36g58BS ISO 10110-14:2007This British Standard was published under the authority of the Standards Policy and Strategy Committee on 31 March 2008 BSI 2008ISBN 978 0 580 57907 3National forewordThis British Standard is the UK implem

3、entation of ISO 10110-14:2007. It supersedes BS ISO 10110-14:2003 which is withdrawn. The UK participation in its preparation was entrusted by Technical Committee CPW/172, Optics and photonics, to Subcommittee CPW/172/1, Fundamental standards.A list of organizations represented on this committee can

4、 be obtained on request to its secretary.This publication does not purport to include all the necessary provisions of a contract. Users are responsible for its correct application.Compliance with a British Standard cannot confer immunity from legal obligations.Amendments/corrigenda issued since publ

5、icationDate CommentsReference numberISO 10110-14:2007(E)INTERNATIONAL STANDARD ISO10110-14Second edition2007-09-15Optics and photonics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation tolerance Optique et photonique Prparation des dessins pour lments et systmes

6、 optiques Partie 14: Tolrance de dformation du front donde BS ISO 10110-14:2007ii iiiContents Page Foreword iv Introduction v 1 Scope . 1 2 Normative references . 1 3 Terms and definitions. 1 4 Specification of tolerances for wavefront deformation 2 4.1 General. 2 4.2 Units . 2 4.3 Wavelength 2 4.4

7、Target aberrations 2 4.5 Cemented (or optically contacted) elements . 2 5 Indication in drawings 3 5.1 General. 3 5.2 Code number. 4 5.3 Form of the indication 4 5.4 Location . 5 5.5 Indication of illumination . 6 5.6 Specification of the image point location. 7 5.7 Indication of target aberrations.

8、 7 6 Examples of tolerance indications 7 Bibliography . 10 BS ISO 10110-14:2007iv Foreword ISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carried out throug

9、h ISO technical committees. Each member body interested in a subject for which a technical committee has been established has the right to be represented on that committee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborat

10、es closely with the International Electrotechnical Commission (IEC) on all matters of electrotechnical standardization. International Standards are drafted in accordance with the rules given in the ISO/IEC Directives, Part 2. The main task of technical committees is to prepare International Standard

11、s. Draft International Standards adopted by the technical committees are circulated to the member bodies for voting. Publication as an International Standard requires approval by at least 75 % of the member bodies casting a vote. Attention is drawn to the possibility that some of the elements of thi

12、s document may be the subject of patent rights. ISO shall not be held responsible for identifying any or all such patent rights. ISO 10110-14 was prepared by Technical Committee ISO/TC 172, Optics and photonics, Subcommittee SC 1, Fundamental standards. This second edition cancels and replaces the f

13、irst edition (ISO 10110-14:2003) which has been technically revised. ISO 10110 consists of the following parts, under the general title Optics and photonics Preparation of drawings for optical elements and systems: Part 1: General Part 2: Material imperfections Stress birefringence Part 3: Material

14、imperfections Bubbles and inclusions Part 4: Material imperfections Inhomogeneity and striae Part 5: Surface form tolerances Part 6: Centring tolerances Part 7: Surface imperfection tolerances Part 8: Surface texture Part 9: Surface treatment and coating Part 10: Table representing data of optical e

15、lements and cemented assemblies Part 11: Non-toleranced data Part 12: Aspheric surfaces Part 14: Wavefront deformation tolerance Part 17: Laser irradiation damage threshold BS ISO 10110-14:2007vIntroduction This part of ISO 10110 makes it possible to specify a functional tolerance for the performanc

16、e (expressed as single-pass wavefront deformation) of an optical system, which may have optical power or contain powered optical elements. This tolerance therefore includes the effect of surface form deformations, inhomogeneities, and possible interactions among the various individual errors. It sho

17、uld be noted that it is possible to specify a tolerance on the wavefront deformation only, without specifying tolerances on the individual surfaces. In this case, the manufacturer must ensure that the wavefront satisfies the specified tolerance, but is not bound by tolerances on the form of the indi

18、vidual surfaces of the element, and is free, for instance, to allow the surface form deformations to be large provided they cancel each other. It is also possible to supply a tolerance for the wavefront deformation, according to this part of ISO 10110, in addition to tolerances on the form of the in

19、dividual surfaces and/or inhomogeneity (according to ISO 10110-5 and ISO 10110-4, respectively). In this case, the manufacturer must ensure that all of the individual tolerances (surface deformations and inhomogeneity) are upheld, as well as ensuring that the wavefront is of the specified quality. O

20、ptical elements are often tested in a “double-pass” configuration, in which the wavefront passes through or, in the case of reflective optics, reflects from the element under test twice, as shown in ISO/TR 14999-1:2005, Figure 18. In the case of double-pass testing, the additional wavefront deformat

21、ion caused by the second transmission through the element must be accounted for when comparing the measurement results with the specified tolerances. If the wavefront is not severely deformed by passing once through the element under test, and reflects from a high quality mirror, so that it returns

22、through the identical portion of the test element to the interferometer, then the observed deformation of the wavefront is twice the (single-pass) wavefront deformation (defined in 3.2.3 of ISO 14999-4:2007). That is, the wavefront deformation is one-half the observed wavefront deformation. If the w

23、avefront is severely deformed by the element under test, then the individual rays do not pass through the same positions in the element under test on their return path, and the wavefront deformation is not exactly twice that of the single path case. If the measurement wavelength is not the specifica

24、tion wavelength, care must be taken. At least the wavefront deformation is to be recalculated. BS ISO 10110-14:2007blank1Optics and photonics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation tolerance 1 Scope The ISO 10110 series applies to the presentation of

25、design and functional requirements for optical elements and assemblies in technical drawings used for manufacturing and inspection. This part of ISO 10110 gives rules for the indication of the permissible deformation of a wavefront transmitted through or, in the case of reflective optics, reflected

26、from an optical element or assembly. The deformation of the wavefront refers to its departure from the desired shape. The tilt of the wavefront with respect to a given reference surface is excluded from the scope of this part of ISO 10110. There is no requirement that a tolerance for wavefront defor

27、mation be indicated. If such a tolerance is specified, it does not take precedence over a tolerance for the surface form according to ISO 10110-5. If tolerances for both the surface form and the wavefront deformation are given, they must both be upheld. 2 Normative references The following reference

28、d documents are indispensable for the application of this document. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document (including any amendments) applies. ISO 10110-1:2006, Optics and photonics Preparation of drawings for optic

29、al elements and systems Part 1: General ISO/TR 14999-2, Optics and photonics Interferometric measurement of optical elements and optical systems Part 2: Measurement and evaluation techniques ISO 14999-4:2007, Optics and photonics Interferometric measurement of optical elements and optical systems Pa

30、rt 4: Interpretation and evaluation of tolerances specified in ISO 10110 3 Terms and definitions For the purposes of this document, the terms and definitions given in ISO 14999-4 apply. NOTE ISO 14999-4 provides the definitions for all the deformation functions. BS ISO 10110-14:20072 4 Specification

31、 of tolerances for wavefront deformation 4.1 General The tolerances for wavefront deformation are indicated by specifying the maximum permissible values of the sagitta deviation, irregularity, and/or rotationally invariant irregularity. In addition, tolerances for three root-mean-square measures of

32、wavefront deformation (rms total, rms irregularity and rms rotationally varying wavefront deviation) may be specified. See 3.3 of ISO 14999-4:2007 for definitions. NOTE 1 The sagitta deviation is meaningful only when the location of the image is specified. If the location of the image is unspecified

33、, the sagitta deviation is defined to be zero. NOTE 2 Methods for determining the amount of sagitta deviation, irregularity and rotationally invariant irregularity of a given wavefront are given in ISO 14999-4. It is not necessary that tolerances be specified for all types of wavefront deformation.

34、4.2 Units The maximum permissible values for sagitta deviation, irregularity, rotationally invariant irregularity and, if applicable, any target aberrations should be specified in units of nanometres. If wavelengths are to be used, the wavelength shall also be indicated on the drawing. NOTE 1 These

35、quantities are defined with reference to a wavefront passing once through the element under test (single-pass). If a specification is to be given for one or more rms wavefront deformation types, the specification shall also be in units of nanometres or wavelengths (single-pass, see NOTE 1). NOTE 2 O

36、ne “wavelength“ is 1 the wavelength (in nanometres) in which the wavefront deformation is specified. NOTE 3 The specification of a tolerance for an rms deformation type requires that the optical system be analysed digitally. 4.3 Wavelength If wavelength units are to be used, the wavelength shall als

37、o be indicated on the drawing in order to reduce confusion. If none is provided, the wavelength is assumed to be 546,07 nm. 4.4 Target aberrations Frequently, the nominal theoretical wavefront is spherical or planar. In some cases, to allow for the presence of small amounts of residual aberration in

38、 the design of an optical system, non-zero target values may be specified for polynomial aberration types. 4.5 Cemented (or optically contacted) elements If two or more optical elements are to be cemented (or optically contacted), the wavefront deformation tolerances given for the individual element

39、s apply also for the elements after assembly, i.e. after cementing (or optically contacting), unless otherwise specified. See 4.8.3 of ISO 10110-1:2006. BS ISO 10110-14:200735 Indication in drawings 5.1 General In all cases in which a tolerance for wavefront deformation is to be indicated, the optic

40、al axis of the element shall be indicated on the drawing according to 4.2 of ISO 10110-1:2006. The location of the stop surface or pupil shall be indicated according to 5.3 of ISO 10110-1:2006. See Figure 1. The tolerance for wavefront deformation shall be indicated by a code number (see 5.2) and th

41、e tolerances for sagitta deviation, irregularity, rotationally invariant irregularity and rms deformation types shall be indicated as appropriate (see 5.3). Wavefront deformation should be specified in nanometres. However if wavelength units are to be used, the wavelength should also be indicated. A

42、ll quantities shall have their units specified. If no unit is indicated then wavelength units are implied. No provision is given for the specification of a PV-tolerance for the total wavefront deformation (that is, including both the sagitta deviation and the irregularity). If such a specification i

43、s necessary, this information shall be given in a note on the drawing, for example: “Total wavefront deformation shall not exceed 0,25 wavelengths” or “Total wavefront deformation shall not exceed 150 nm.” NOTE Such a specification might, for example, be useful for optical elements to be used in int

44、erferometers. See Clause 6 for examples of tolerance indications. (a) (b) Figure 1 Examples of an indication of a tolerance for wavefront deformation, with planar illumination BS ISO 10110-14:20074 5.2 Code number The code number for wavefront deformation is 13/. 5.3 Form of the indication The indic

45、ation shall have one of the three forms: 13/A (B/C); = E or 13/A (B/C) RMSx D; = E (where x is one of the Ietters t, i or a; see 3.3 of ISO 14999-4:2007) or 13/ RMSx D; = E (where x is one of the letters t, i or a). The indication “; = E” (last element of the three forms of indication specified abov

46、e) may be omitted provided the wavelength of specification is = 546,07 nm (see 5.1). The quantity A is either: 1) the maximum permissible (single-pass) sagitta deviation or 2) a dash () indicating that no explicit tolerance for sagitta deviation is given. The quantity B is either: 1) the miximum per

47、missible value of (single-pass) irregularity or 2) a dash () indicating that no explicit tolerance for irregularity is given. The quantity C is: the permissible value of the (single-pass) rotationally invariant irregularity. If no tolerance is given, the slash (/) is replaced by the final parenthesi

48、s, i.e. 13/ A (B). If no tolerance is given for any of the three deformation types, then A, B, C, the divisor line (/) and the parenthesis are replaced by a single dash (), i.e., 13/. The quantity D is: the maximum permissible value of the rms-quantity of the type specified by x, where x is one of t

49、he Ietters t, i or a. These deviations are defined in 3.3.5, 3.3.6, and 3.3.8 of ISO 14999-4:2007, respectively. The specification of more than one type of rms-deviation is allowed. These specifications shall be separated by a semicolon, as shown in Clause 6, Example 7. The quantity E is: the wavelength in which the wavefront deformation is specified. The wavefront deformation tolerance indicated applies to the optically effective area, except when the indication is to apply to a smaller test field for

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