1、BS ISO 15471:2016Surface chemical analysis Auger electron spectroscopy Description of selectedinstrumental performanceparametersBSI Standards PublicationWB11885_BSI_StandardCovs_2013_AW.indd 1 15/05/2013 15:06BS ISO 15471:2016 BRITISH STANDARDNational forewordThis British Standard is the UK implemen
2、tation of ISO 15471:2016. It supersedes BS ISO 15471:2004 which is withdrawn.The UK participation in its preparation was entrusted to Technical Committee CII/60, Surface chemical analysis.A list of organizations represented on this committee can be obtained on request to its secretary.This publicati
3、on does not purport to include all the necessary provisions of a contract. Users are responsible for its correct application. The British Standards Institution 2016. Published by BSI Standards Limited 2016ISBN 978 0 580 94111 5 ICS 71.040.40 Compliance with a British Standard cannot confer immunity
4、from legal obligations.This British Standard was published under the authority of the Standards Policy and Strategy Committee on 30 September 2016.Amendments issued since publicationDate T e x t a f f e c t e dBS ISO 15471:2016 ISO 2016Surface chemical analysis Auger electron spectroscopy Descriptio
5、n of selected instrumental performance parametersAnalyse chimique des surfaces Spectroscopie dlectrons Auger Description de certains paramtres relatifs la performance instrumentaleINTERNATIONAL STANDARDISO15471Second edition2016-09-01Reference numberISO 15471:2016(E)BS ISO 15471:2016ISO 15471:2016(E
6、)ii ISO 2016 All rights reservedCOPYRIGHT PROTECTED DOCUMENT ISO 2016, Published in SwitzerlandAll rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or postin
7、g on the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address below or ISOs member body in the country of the requester.ISO copyright officeCh. de Blandonnet 8 CP 401CH-1214 Vernier, Geneva, SwitzerlandTel. +41 22 749 01 11Fax +41 22 7
8、49 09 47copyrightiso.orgwww.iso.orgBS ISO 15471:2016ISO 15471:2016(E)Foreword ivIntroduction v1 Scope . 12 Normative references 13 Terms and definitions . 14 Symbols and abbreviated terms . 15 Description of selected instrumental performance parameters . 15.1 Method of analysis . 15.2 Samples . 25.3
9、 System configuration . 25.4 Electron gun cathode . 25.4.1 Cathode type 25.4.2 Cathode lifetime . 25.5 Lateral resolution and beam current . 25.5.1 General 25.5.2 Method 1 . 25.5.3 Method 2 . 35.5.4 Method 3 . 35.6 Spectrometer intensity performance and energy resolution . 35.6.1 General 35.6.2 Meth
10、od 1 . 35.6.3 Method 2 . 45.7 Spectrometer energy scale . 45.8 Spectrometer intensity linearity 45.9 Spectrometer response function . 45.10 Spectrometer parameters 45.10.1 Spectrometer aberration 45.10.2 Analytical area . 45.11 Image drift 45.12 Vacuum environment 4Bibliography 5 ISO 2016 All rights
11、 reserved iiiContents PageBS ISO 15471:2016ISO 15471:2016(E)ForewordISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carried out through ISO technical committ
12、ees. Each member body interested in a subject for which a technical committee has been established has the right to be represented on that committee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the Int
13、ernational Electrotechnical Commission (IEC) on all matters of electrotechnical standardization.The procedures used to develop this document and those intended for its further maintenance are described in the ISO/IEC Directives, Part 1. In particular the different approval criteria needed for the di
14、fferent types of ISO documents should be noted. This document was drafted in accordance with the editorial rules of the ISO/IEC Directives, Part 2 (see www.iso.org/directives).Attention is drawn to the possibility that some of the elements of this document may be the subject of patent rights. ISO sh
15、all not be held responsible for identifying any or all such patent rights. Details of any patent rights identified during the development of the document will be in the Introduction and/or on the ISO list of patent declarations received (see www.iso.org/patents).Any trade name used in this document
16、is information given for the convenience of users and does not constitute an endorsement.For an explanation on the meaning of ISO specific terms and expressions related to conformity assessment, as well as information about ISOs adherence to the World Trade Organization (WTO) principles in the Techn
17、ical Barriers to Trade (TBT) see the following URL: www.iso.org/iso/foreword.html.The committee responsible for this document is ISO/TC 201, Surface chemical analysis, Subcommittee SC 7, Electron spectroscopies.This second edition cancels and replaces the first edition (ISO 15471:2004), of which it
18、constitutes a minor revision with the following modifications: addition of a Bibliography; minor editorial changes to the text.iv ISO 2016 All rights reservedBS ISO 15471:2016ISO 15471:2016(E)IntroductionAuger electron spectrometers (AESs) and scanning Auger electron microscopes (SAMs) are produced
19、by many manufacturers throughout the world. While the basic principles of the AES analytical method in each instrument are the same, the specific designs of the instruments and the way that performance specifications are provided differ widely. As a result, it is often difficult to compare the perfo
20、rmance of instruments from one manufacturer with those from another. This International Standard provides a basic list of items devised to enable all Auger electron spectrometers to be described in a common manner. This International Standard is not intended to replace the manufacturers specificatio
21、n, which may extend to 30 or more pages. It is intended that, where certain items are contained in that specification, there are agreed and defined meanings to those items. ISO 2016 All rights reserved vBS ISO 15471:2016BS ISO 15471:2016Surface chemical analysis Auger electron spectroscopy Descripti
22、on of selected instrumental performance parameters1 ScopeThis International Standard specifies the requirements for the description of specific aspects of the performance of an Auger electron spectrometer.2 Normative referencesThe following documents, in whole or in part, are normatively referenced
23、in this document and are indispensable for its application. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document (including any amendments) applies.ISO 18115-1, Surface chemical analysis Vocabulary Part 1: General terms and terms
24、 used in spectroscopy3 Terms and definitionsFor the purposes of this document, the terms and definitions given in ISO 18115-1 apply.4 Symbols and abbreviated termsAES Auger electron spectroscopy (also Auger electron spectrometer)FWHM full width at half maximumrms root mean squareSAM scanning Auger e
25、lectron microscope (also scanning Auger electron microscopy)SEM scanning electron microscopeFL Fermi levelVL vacuum levelNOTE Historically, the kinetic-energy scales of AES instruments have been referred to the VL while XPS or combined AES/XPS instruments have been referred to the FL. Conversion fro
26、m FL to VL referencing is accomplished by subtracting the spectrometer work function from the electron kinetic energies; an approximate means for doing this, satisfactory for most practical AES and SAM applications, is to subtract 4,5 eV from kinetic energies referred to the FL.5 Description of sele
27、cted instrumental performance parameters5.1 Method of analysisA short description of the methods used to obtain information from the sample shall be given and the availability (as an option) of other analytical techniques in the system under consideration shall be stated.INTERNATIONAL STANDARD ISO 1
28、5471:2016(E) ISO 2016 All rights reserved 1BS ISO 15471:2016ISO 15471:2016(E)5.2 SamplesThe size and shape of samples that may be analysed with the instrument performing to specification shall be given. If the size or shape is restricted for particular modes of analysis, e.g. angle-resolved measurem
29、ents, measurements for insulators, etc., this shall be specified.5.3 System configurationThe designed geometric configuration of the significant analytical components of the system and their tolerances shall be described.EXAMPLE Tolerances for angles are often given as 1.5.4 Electron gun cathode5.4.
30、1 Cathode typeThe cathode system shall be specified.EXAMPLE Thermionic tungsten, lanthanum hexaboride (LaB6), cold field emission tungsten (110), or Schottky.5.4.2 Cathode lifetimeThe expected lifetime of the cathode under the operating conditions specified in 5.5 shall be stated. The emission curre
31、nts at chosen source potentials in 5.5 shall be stated. This would normally be a guarantee of lifetime operation but could, alternatively, be a mean historical lifetime. The type of lifetime shall be specified.5.5 Lateral resolution and beam current5.5.1 GeneralLateral resolutions shall be specified
32、 for the following:a) SEM acquired at optimum operating conditions;b) AES at specified conditions for each defined beam energy.The measured value of the spatial resolution shall be obtained by one of the methods in 5.5.2, 5.5.3 or 5.5.4. Curves giving the typical lateral resolution as a function of
33、beam current at 5 keV and/or 10 keV and any other appropriate beam energy shall be given.NOTE If an instrument has a lateral resolution function that can be represented by a Gaussian function, then the FWHM of such a function corresponds to the distance over which the measured signal changes from 12
34、 % to 88 % of its maximum value. In AES, the point spread function for the emitted Auger electrons is the Gaussian distribution of the beam superimposed on a backscattered halo. For this reason, it is convenient to define the lateral resolution as the distance corresponding to a 20 % to 80 % change
35、in the Auger signal across the step edge, which is equivalent to 71,5 % of the Gaussian resolution function. Although there is no physical basis for this choice, it has been widely used. Lateral resolution methods are reported in ISO/TR 19319.5.5.2 Method 1A sample shall be analysed which has an iso
36、lated feature whose size is smaller than 30 % of the instruments stated spatial resolution. The measured FWHM of a line trace for an Auger electron signal characteristic of that feature defines the spatial resolution. The distance for the feature signal to rise from 50 % of the maximum to 100 % and
37、then fall again to 50 % defines the measured spatial resolution.NOTE 1 If the width of the isolated feature is greater than 30 % of the spatial resolution, the measured spatial resolution will be greater than the true spatial resolution.2 ISO 2016 All rights reservedBS ISO 15471:2016ISO 15471:2016(E
38、)NOTE 2 The use of a small sample allows easy confirmation of the system astigmatism.5.5.3 Method 2A sample shall be analysed which is comprised of two materials with their surfaces in the same plane and joined along a common straight edge. A line trace for an Auger electron intensity, characteristi
39、c of one of the two materials, measured at 90 to the edge, is used to define spatial resolution. The distance for the Auger electron intensity to change from 20 % to 80 % of the difference in the intensities in the plateau regions away from the edge defines the spatial resolution in the direction of
40、 the scan.NOTE 1 If an instrument has a spatial resolution function that can be represented by a Gaussian function, then such an intensity distance distribution is equivalent to 71,5 % of the FWHM of the spatial resolution function of the instrument.NOTE 2 Close to the limit of resolution, astigmati
41、sm can be observed and so the spatial resolution might need determination in more than one azimuth.5.5.4 Method 3A sample shall be analysed which is composed of a knife edge of one material, in the sample plane, over a hole with a depth more than five times its diameter. A line trace for an Auger el
42、ectron intensity, characteristic of the knife edge material, measured at 90 to the edge, is used to define spatial resolution. The distance for the Auger electron intensity to change from 20 % to 80 % of the difference in the intensities in the plateau regions away from the edge defines the spatial
43、resolution in the direction of the scan.NOTE 1 If an instrument has a spatial resolution function that can be represented by a Gaussian function, then such an intensity distance distribution is equivalent to 71,5 % of the FWHM of the spatial resolution function of the instrument.NOTE 2 Close to the
44、limit of resolution, astigmatism can be observed and so the spatial resolution might need determination in more than one azimuth.5.6 Spectrometer intensity performance and energy resolution5.6.1 GeneralThe spectrometer intensity performance is determined from the difference between the intensity (co
45、unting rate) of the Cu L3VV peak at 918 eV and the background intensity (counting rate) at 950 eV (both measured in the direct mode). Performance shall be specified in pulse-counting systems as the difference in counting rates per nA of beam current or, alternatively, as the difference in counting r
46、ates at specified beam energy and beam current for (a) optimum energy resolution and (b) optimum sensitivity. If the spectrometer can be operated at different energy resolutions, the performance, the background intensity and the FWHM of the peak above background for each energy resolution shall be g
47、iven at at least one beam energy. The beam current shall be given for each beam energy. The signal-to-noise ratio shall be defined as the ratio of the spectrometer intensity performance, obtained using data-acquisition time(s) of 1 s at 918 eV and 950 eV, to the noise obtained from 5.6.2 or 5.6.3. T
48、he method by which the noise is measured shall be stated.5.6.2 Method 1The noise is defined as the rms deviation of 121 separate measurements of the background intensity measured at regularly spaced energies between 970 eV and 994 eV using data-acquisition time(s) of 1 s for each measurement (channe
49、l) and approximately 0,2 eV channel intervals. The rms deviation is calculated from the deviations of the measured intensities from a least-squares fit of a straight line to the measured intensities. ISO 2016 All rights reserved 3BS ISO 15471:2016ISO 15471:2016(E)5.6.3 Method 2The noise is defined as the rms deviation of 121 samples of the background intensity at 975 eV, each measured using a 1 s data-acquisition time, from the mean value of those measurements.5.7 Spectrometer energy scaleThe energy scale shall be specified with
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