BS ISO 23833-2013 Microbeam analysis Electron probe microanalysis (EPMA) Vocabulary《微光束分析 电子探针微量分析(EPMA) 词汇》.pdf

1、raising standards worldwideNO COPYING WITHOUT BSI PERMISSION EXCEPT AS PERMITTED BY COPYRIGHT LAWBSI Standards PublicationBS ISO 23833:2013Microbeam analysis Electron probe microanalysis (EPMA) VocabularyBS ISO 23833:2013 BRITISH STANDARDNational forewordThis British Standard is the UK implementatio

2、n of ISO 23833:2013. It supersedes BS ISO 23833:2006 which is withdrawn.The UK participation in its preparation was entrusted to TechnicalCommittee CII/9, Microbeam analysis.A list of organizations represented on this committee can beobtained on request to its secretary.This publication does not pur

3、port to include all the necessaryprovisions of a contract. Users are responsible for its correctapplication. The British Standards Institution 2013. Published by BSI StandardsLimited 2013 ISBN 978 0 580 78774 4 ICS 01.040.71; 71.040.99 Compliance with a British Standard cannot confer immunity fromle

4、gal obligations.This British Standard was published under the authority of theStandards Policy and Strategy Committee on 30 April 2013. Amendments issued since publicationDate T e x t a f f e c t e dBS ISO 23833:2013 ISO 2013Microbeam analysis Electron probe microanalysis (EPMA) VocabularyAnalyse pa

5、r microfaisceaux Analyse par microsonde lectronique (microsonde de Castaing) VocabulaireINTERNATIONAL STANDARDISO 23833Second edition 2013-04-15Reference number ISO 23833:2013(E)BS ISO 23833:2013ISO 23833:2013(E)ii ISO 2013 All rights reservedCOPYRIGHT PROTECTED DOCUMENT ISO 2013All rights reserved.

6、 Unless otherwise specified, no part of this publication may be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on the internet or an intranet, without prior written permission. Permission can be requested from either ISO at

7、the address below or ISOs member body in the country of the requester.ISO copyright officeCase postale 56 CH-1211 Geneva 20Tel. + 41 22 749 01 11Fax + 41 22 749 09 47E-mail copyrightiso.orgWeb www.iso.orgPublished in SwitzerlandBS ISO 23833:2013ISO 23833:2013(E) ISO 2013 All rights reserved iiiConte

8、nts PageForeword ivIntroduction v1 Scope . 12 Abbreviated terms 13 Definitions of general terms used in electron probe microanalysis 14 Definition of terms used to describe EPMA instrumentation 75 Definitions of terms used in EPMA methodology 17Bibliography .27BS ISO 23833:2013ISO 23833:2013(E)Forew

9、ordISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carried out through ISO technical committees. Each member body interested in a subject for which a technic

10、al committee has been established has the right to be represented on that committee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of el

11、ectrotechnical standardization.International Standards are drafted in accordance with the rules given in the ISO/IEC Directives, Part 2.The main task of technical committees is to prepare International Standards. Draft International Standards adopted by the technical committees are circulated to the

12、 member bodies for voting. Publication as an International Standard requires approval by at least 75 % of the member bodies casting a vote.Attention is drawn to the possibility that some of the elements of this document may be the subject of patent rights. ISO shall not be held responsible for ident

13、ifying any or all such patent rights.ISO 23833 was prepared by Technical Committee ISO/TC 202, Microbeam analysis, Subcommittee SC 1, Terminology.The European Microbeam Analysis Society (EMAS) made contributions to the preparation of the document.This second edition of ISO 23833 cancels and replaces

14、 the first edition (ISO 23833:2006), of which it constitutes a minor revision.This International Standard has a cross-reference relationship with the surface chemical analysis vocabulary prepared by ISO/TC 201 (ISO 18115-1:2010).iv ISO 2013 All rights reservedBS ISO 23833:2013ISO 23833:2013(E)Introd

15、uctionElectron probe X-ray microanalysis (EPMA) is a modern technique used to qualitatively determine and quantitatively measure the elemental composition of solid materials, including metal alloys, ceramics, glasses, minerals, polymers, powders, etc., on a spatial scale of approximately one microme

16、ter laterally and in depth. EPMA is based on the physical mechanism of electron-stimulated X-ray emission and X-ray spectrometry.As a major sub-field of microbeam analysis (MBA), the EPMA technique is widely applied in diverse business sectors (high-tech industries, basic industries, metallurgy and

17、geology, biology and medicine, environmental protection, trade, etc.) and has a wide business environment for standardization.Standardization of terminology in a technical field is one of the basic prerequisites for development of standards on other aspects of that field.This International Standard

18、is relevant to the need for an EPMA vocabulary that contains consistent definitions of terms as they are used in the practice of electron probe microanalysis by the international scientific and engineering communities that employ the technique. ISO 2013 All rights reserved vBS ISO 23833:2013BS ISO 2

19、3833:2013Microbeam analysis Electron probe microanalysis (EPMA) Vocabulary1 ScopeThis International Standard defines terms used in the practices of electron probe microanalysis (EPMA). It covers both general and specific concepts classified according to their hierarchy in a systematic order.This Int

20、ernational Standard is applicable to all standardization documents relevant to the practices of EPMA. In addition, some parts of this International Standard are applicable to those documents relevant to the practices of related fields (SEM, AEM, EDX, etc.) for definition of those terms common to the

21、m.2 Abbreviated termsBSE backscattered electronCRM certified reference materialEDS energy-dispersive spectrometerEDX energy-dispersive X-ray spectrometryEPMA electron probe microanalysis or electron probe microanalysereV electronvoltkeV kiloelectronvoltRM reference materialSE secondary electronSEM s

22、canning electron microscopeWDS wavelength-dispersive spectrometerWDX wavelength-dispersive X-ray spectrometry3 Definitions of general terms used in electron probe microanalysis3.1electron probe microanalysisEPMAtechnique of spatially-resolved elemental analysis based upon electron-excited X-ray spec

23、trometry with a focussed electron probe and an electron interaction volume with micrometer to sub-micrometer dimensions3.1.1qualitative EPMAprocedure in EPMA leading to the identification of the elements present in the electron-excited interaction volume by a systematic method for the recognition an

24、d assignment of X-ray spectral peaks to specific elementsINTERNATIONAL STANDARD ISO 23833:2013(E) ISO 2013 All rights reserved 1BS ISO 23833:2013ISO 23833:2013(E)3.1.2quantitative EPMAprocedure leading to the assignment of numerical values to represent the concentrations of elemental constituents th

25、at had been previously identified in the electron-excited interaction volume during the qualitative analysis phase in EPMANote 1 to entry: Quantitative analysis can be accomplished by comparing the unknown X-ray peak intensities to X-ray peak intensities measured under the same conditions using refe

26、rence material(s) or by calculating the concentration from first principles (also known as standardless analysis).3.2electron probe microanalyserinstrument for carrying out electron-excited X-ray microanalysisNote 1 to entry: This instrument is usually equipped with more than one wavelength spectrom

27、eter and an optical microscope for precise specimen placement.3.3electron scatteringdeviation in trajectory and/or kinetic energy suffered by an impinging energetic beam electron as a result of an interaction with a specimen atom or electron3.3.1angle of scatteringscattering angleangle between the d

28、irection of the incident particle or photon and the direction that the particle or photon is traveling after scatteringISO 18115-1:20103.3.2backscatteringescape of beam electrons from the specimen following sufficient scattering events to cause the trajectories to intersect the entrance surface of t

29、he specimen3.3.2.1backscatter coefficientfraction of beam electrons that are backscattered, given by the equation = n(BS)/n(B) where n(B) is the number of incident electrons and n(BS) is the number of backscattered electrons3.3.2.2backscattered electronelectron ejected from the entrance surface of t

30、he specimen by a backscattering process3.3.2.3backscattered electron angular distributiondistribution of backscattered electrons as a function of the angle relative to the surface normal3.3.2.4backscattered electron depth distributiondistribution of backscattered electrons as a function of the maxim

31、um depth into the specimen reached before travelling back to the entrance surface to exit the specimen2 ISO 2013 All rights reservedBS ISO 23833:2013ISO 23833:2013(E)3.3.3continuous energy loss approximationmathematical description of energy loss by fast electrons propagating through matter in which

32、 all of the discrete inelastic processes are approximated as a single continuous energy loss processNote 1 to entry: Also known as the continuous slowing-down approximation (CSDA).3.3.4elastic scatteringinteraction of an energetic electron from the impinging beam and a specimen atom during which the

33、 electrons energy remains essentially unaltered but its trajectory is changed by an angle from 0 up to rad (180) with an average of approximately 0,1 rad3.3.5inelastic scatteringinteraction of an energetic electron from the impinging beam and a specimen atom or electron during which kinetic energy i

34、s lost to the specimen by various mechanisms (secondary electron generation, bremsstrahlung, inner shell ionization, plasmon and photon excitation)Note 1 to entry: For inelastic scattering, the electron trajectory is modified by a small angle, generally less than 0,01 rad.3.3.6scattering cross-secti

35、onnumber of scattering events per unit areamathematical description of the probability of a scattering event (elastic or inelastic)Note 1 to entry: See ionization cross-section (3.4.4).Note 2 to entry: Scattering cross-section is usually expressed simply as an area, in cm2. The number of scattering

36、events per unit area is expressed in events/(atoms/cm2).3.3.7scattering effectmeasurable physical phenomenon, such as electron backscattering or loss of X-ray generation, that results from modification of the trajectory and/or kinetic energy of an impinging energetic beam electron by scattering proc

37、esses in the specimen3.3.8secondary electronElectron emitted from the specimen as a result of inelastic scattering of the primary beam electron by loosely bound valence-level electrons of the specimenNote 1 to entry: Secondary electrons have conventionally an energy less than 50 eV.3.4X-rayphoton of

38、 electromagnetic radiation created by fluorescence of an inner shell electron vacancy or by deceleration of an energetic electron in the Coulombic field of an atom3.4.1characteristic X-rayphoton of electromagnetic radiation created by the relaxation of an excited atomic state created by inner shell

39、ionization following inelastic scattering of an energetic electron or ion, or by absorption of an X-ray photon3.4.2continuous X-rayphoton of electromagnetic radiation created by deceleration (an inelastic scattering mechanism) of an energetic electron in the Coulombic field of an atom ISO 2013 All r

40、ights reserved 3BS ISO 23833:2013ISO 23833:2013(E)3.4.3fluorescence yieldfraction of inner shell ionization events that give rise to characteristic X-ray emission during subsequent de-excitationNote 1 to entry: The fluorescence yield is independent of the method of ionization.3.4.4ionization cross-s

41、ectionnumber of ionization events per unit areamathematical description of the probability of ionizing an atom by removing an atomic electron from a particular bound electron shell into the unbound vacuum, or continuum, energy level or stateNote 1 to entry: See scattering cross-section (3.3.6).Note

42、2 to entry: Ionization cross-section is usually expressed simply as an area, in cm2or in barns (1024cm2). Ionization event probability is expressed in events/(atoms/cm2).Note 3 to entry: Ionization cross-section is usually denoted by Q, which is defined by the mathematical expression dn = Q(N/A)dx w

43、here dn is the number of ionization events which occur in each increment dx of electron path and N/A is the number of atoms per unit volume.3.4.5ionization energycritical excitation energyedge energyminimum energy required to ionize an atomic electron, i.e. to remove a bound electron from a shell (K

44、, L, etc.) to (as a minimum) the continuum of energy states in a solidNote 1 to entry: Ionization energy units are eV or keV.3.4.6J-valuemean ionization energy, a critical parameter in mathematical descriptions of the continuous energy loss approximation3.4.7stopping powerdE/dsrate of energy loss ex

45、perienced by a primary electron (from all inelastic scattering processes) with distance travelled in the specimenNote 1 to entry: Stopping power is expressed as energy loss/unit distance (e.g. eV/nm).3.4.8X-ray fluorescence effectsecondary fluorescencephotoelectric absorption of an X-ray (characteri

46、stic or bremsstrahlung) by an atom, resulting in an excited atomic state which will de-excite with electron shell transitions and subsequent emission of an Auger electron or the characteristic X-ray of the absorbing atom3.4.9X-ray generationgeneration of X-rays in the specimen under the stimulation

47、of an incident beam of radiation (electrons, ions or photons)Note 1 to entry: X-rays can be generated through the ionization of inner atomic shells (characteristic X-rays) or through the “braking radiation” (bremsstrahlung) process (continuum or white radiation).4 ISO 2013 All rights reservedBS ISO

48、23833:2013ISO 23833:2013(E)3.5X-ray absorptionattenuation of the intensity of X-rays passing through matter, arising primarily from photoelectric absorption for X-ray energies appropriate to EPMA3.5.1absorption edgecritical ionization energy for a particular shell or subshell of an atom speciesNote

49、1 to entry: Absorption edges are detected in spectra as discontinuities in the X-ray continuum (bremsstrahlung) background due to a sharp change in the X-ray mass absorption coefficient at the edge.3.5.2absorption factorf()ratio of emitted X-ray intensity to the generated intensity in a specific direction towards the X-ray detector3.5.3depth distribution function(z)function which describes the distribution of generated X-rays as a function of depth below the specimen surfaceNote 1 to entry: z is expressed in units of density