EN 62226-2-1-2005 en Exposure to electric or magnetic fields in the low and intermediate frequency range Methods for calculating the current density and internal electric field ind.pdf

1、BRITISH STANDARD BS EN 62226-2-1:2005 Exposure to electric or magnetic fields in the low and intermediate frequency range Methods for calculating the current density and internal electric field induced in the human body Part 2-1: Exposure to magnetic fields 2D models The European Standard EN 62226-2

2、-1:2005 has the status of a British Standard ICS 17.220.20 BS EN 62226-2-1:2005 This British Standard was published under the authority of the Standards Policy and Strategy Committee on 11 February 2005 BSI 11 February 2005 ISBN 0 580 45402 9 National foreword This British Standard is the official E

3、nglish language version of EN 62226- - -2-1:2005. It is identical with IEC 62226-2-1:2004. The UK participation in its preparation was entrusted to Technical Committee GEL/106, Human exposure to Lf and Hf Electromagnetic radiation, which has the responsibility to: A list of organizations represented

4、 on this committee can be obtained on request to its secretary. Cross-references The British Standards which implement international or European publications referred to in this document may be found in the BSI Catalogue under the section entitled “International Standards Correspondence Index”, or b

5、y using the “Search” facility of the BSI Electronic Catalogue or of British Standards Online. This publication does not purport to include all the necessary provisions of a contract. Users are responsible for its correct application. Compliance with a British Standard does not of itself confer immun

6、ity from legal obligations. aid enquirers to understand the text; present to the responsible international/European committee any enquiries on the interpretation, or proposals for change, and keep the UK interests informed; monitor related international and European developments and promulgate them

7、in the UK. Summary of pages This document comprises a front cover, an inside front cover, the EN title page, pages 2 to 56, an inside back cover and a back cover. The BSI copyright notice displayed in this document indicates when the document was last issued. Amendments issued since publication Amd.

8、 No. Date CommentsEUROPEAN STANDARD EN 62226-2-1 NORME EUROPENNE EUROPISCHE NORM January 2005 CENELEC European Committee for Electrotechnical Standardization Comit Europen de Normalisation Electrotechnique Europisches Komitee fr Elektrotechnische Normung Central Secretariat: rue de Stassart 35, B -

9、1050 Brussels 2005 CENELEC - All rights of exploitation in any form and by any means reserved worldwide for CENELEC members. Ref. No. EN 62226-2-1:2005 E ICS 17.220.20 English version Exposure to electric or magnetic fields in the low and intermediate frequency range Methods for calculating the curr

10、ent density and internal electric field induced in the human body Part 2-1: Exposure to magnetic fields 2D models (IEC 62226-2-1:2004) Exposition aux champs lectriques ou magntiques basse et moyenne frquence Mthodes de calcul des densits de courant induit et des champs lectriques induits dans le cor

11、ps humain Partie 2-1: Exposition des champs magntiques Modles 2D (CEI 62226-2-1:2004) Sicherheit in elektrischen oder magnetischen Feldern im niedrigen und mittleren Frequenzbereich Verfahren zur Berechnung der induzierten Krperstromdichte und des im menschlichen Krper induzierten elektrischen Felde

12、s Teil 2-1: Exposition gegenber magnetischen Feldern 2D-Modelle (IEC 62226-2-1:2004) This European Standard was approved by CENELEC on 2004-12-01. CENELEC members are bound to comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this European Standard the status

13、 of a national standard without any alteration. Up-to-date lists and bibliographical references concerning such national standards may be obtained on application to the Central Secretariat or to any CENELEC member. This European Standard exists in three official versions (English, French, German). A

14、 version in any other language made by translation under the responsibility of a CENELEC member into its own language and notified to the Central Secretariat has the same status as the official versions. CENELEC members are the national electrotechnical committees of Austria, Belgium, Cyprus, Czech

15、Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Slovakia, Slovenia, Spain, Sweden, Switzerland and United Kingdom. EN 62226-2-1:0250 - - 2 Foreword The text of document 106/79

16、/FDIS, future edition 1 of IEC 62226-2-1, prepared by IEC TC 106, Methods for the assessment of electric, magnetic and electromagnetic fields associated with human exposure, was submitted to the IEC-CENELEC parallel vote and was approved by CENELEC as EN 62226-2-1 on 2004-12-01. This Part 2-1 is to

17、be used in conjunction with EN 62226-1 1) . The following dates were fixed: latest date by which the EN has to be implemented at national level by publication of an identical national standard or by endorsement (dop) 2005-09-01 latest date by which the national standards conflicting with the EN have

18、 to be withdrawn (dow) 2007-12-01 _ Endorsement notice The text of the International Standard IEC 62226-2-1:2004 was approved by CENELEC as a European Standard without any modification. _ 1)To be published. Page2 EN6222621:20056222-2-61 :CEI 2004 3 CONTENTS FOREWORD.9 INTRODUCTION.6 1 Scope . 7 2 An

19、alytical models .7 2.1 General.8 2.2 Basic analytical models for uniform fields.7 3 Numerical models.9 3.1 General information about numerical models9 3.2 2D models General approach10 3.3 Conductivity of living tissues11 3.4 2D Models Computation conditions .12 3.5 Coupling factor for non-uniform ma

20、gnetic field12 3.6 2D Models Computation results.13 4 Validation of models .15Annex A (normative) Disk in a uniform field 16 Annex B (normative) Disk in a field created by an infinitely long wire.19 Annex C (normative) Disk in a field created by 2 parallel wires with balanced currents 27 Annex D (no

21、rmative) Disk in a magnetic field created by a circular coil .38 Annex E (informative) Simplified approach of electromagnetic phenomena 50 Annex F (informative) Analytical calculation of magnetic field created by simple induction systems: 1 wire, 2 parallel wires with balanced currents and 1 circula

22、r coil 52 Annex G (informative) Equation and numerical modelling of electromagnetic phenomena for a typical structure: conductive disk in electromagnetic field. 54 Bibliography . 56 Figure 1 Conducting disk in a uniform magnetic flux density 8 Figure 2 Finite elements meshing (2 ndorder triangles) o

23、f a disk, and detail 10 Figure 3 Conducting disk in a non-uniform magnetic flux density.11 Figure 4 Variation with distance to the source of the coupling factor for non-uniform magnetic field, K, for the three magnetic field sources (disk radius R = 100 mm)14 Figure A.1 Current density lines J and d

24、istribution of J in the disk .16 Figure A.2 J = f r: Spot distribution of induced current density calculated along a diameter of a homogeneous disk in a uniform magnetic field17 Figure A.3 J i= f r: Distribution of integrated induced current density calculated along a diameter of a homogeneous disk

25、in a uniform magnetic field18 Figure B.1 Disk in the magnetic field created by an infinitely straight wire .19 Figure B.2 Current density lines J and distribution of J in the disk (source: 1 wire, located at d = 10 mm from the edge of the disk).20 Page3 EN6222621:20056222-2-61 :CEI 2004 5 Figure B.3

26、 Spot distribution of induced current density along the diameter AA of the disk (source: 1 wire, located at d = 10 mm from the edge of the disk).20 Figure B.4 Distribution of integrated induced current density along the diameter AA of the disk (source: 1 wire, located at d = 10 mm from the edge of t

27、he disk) .21 Figure B.5 Current density lines J and distribution of J in the disk (source: 1 wire, located at d = 100 mm from the edge of the disk).21 Figure B.6 Distribution of integrated induced current density along the diameter AA of the disk (source: 1 wire, located at d = 100 mm from the edge

28、of the disk) .22 Figure B.7 Parametric curve of factor K for distances up to 300 mm to a source consisting of an infinitely long wire (disk: R = 100 mm) .23 Figure B.8 Parametric curve of factor K for distances up to 1 900 mm to a source consisting of an infinitely long wire (disk: R = 100 mm) .24 F

29、igure B.9 Parametric curve of factor K for distances up to 300 mm to a source consisting of an infinitely long wire (disk: R = 200 mm) .25 Figure B.10 Parametric curve of factor K for distances up to 1 900 mm to a source consisting of an infinitely long wire (disk: R = 200 mm) .26 Figure C.1 Conduct

30、ive disk in the magnetic field generated by 2 parallel wires with balanced currents .27 Figure C.2 Current density lines J and distribution of J in the disk (source: 2 parallel wires with balanced currents, separated by 5 mm, located at d = 7,5 mm from the edge of the disk).28 Figure C.3 J i= f r: D

31、istribution of integrated induced current density calculated along the diameter AA of the disk (source: 2 parallel wires with balanced currents, separated by 5 mm, located at d = 7,5 mm from the edge of the disk) .28 Figure C.4 Current density lines J and distribution of J in the disk (source: 2 par

32、allel wires with balanced currents separated by 5 mm, located at d = 97,5 mm from the edge of the disk).29 Figure C.5 J i = f r: Distribution of integrated induced current density calculated along the diameter AA of the disk (source: 2 parallel wires with balanced currents separated by 5 mm, located

33、 at d = 97,5 mm from the edge of the disk).29 Figure C.6 Parametric curves of factor K for distances up to 300 mm to a source consisting of 2 parallel wires with balanced currents and for different distances e between the 2 wires (homogeneous disk R = 100 mm)30 Figure C.7 Parametric curves of factor

34、 K for distances up to 1 900 mm to a source consisting of 2 parallel wires with balanced currents and for different distances e between the 2 wires (homogeneous disk R = 100 mm)32 Figure C.8 Parametric curves of factor K for distances up to 300 mm to a source consisting of 2 parallel wires with bala

35、nced currents and for different distances e between the 2 wires (homogeneous disk R = 200 mm)34 Figure C.9 Parametric curves of factor K for distances up to 1 900 mm to a source consisting of 2 parallel wires with balanced currents and for different distances e between the 2 wires (homogeneous disk

36、R = 200 mm)36 Figure D.1 Conductive disk in a magnetic field created by a coil38 Figure D.2 Current density lines J and distribution of J in the disk (source: coil of radius r = 50 mm, conductive disk R = 100 mm, d = 5 mm).39 Figure D.3 J i= f r: Distribution of integrated induced current density ca

37、lculated along the diameter AA of the disk (source: coil of radius r = 50 mm, conductive disk R = 100 mm, d = 5 mm).39 Figure D.4 Current density lines J and distribution of J in the disk (source: coil of radius r = 200 mm, conductive disk R = 100 mm, d = 5 mm).40 Page4 EN6222621:20056222-2-61 :CEI

38、2004 7 Figure D.5 J i= f r: Distribution of integrated induced current density calculated along the diameter AA of the disk (source: coil of radius r = 200 mm, conductive disk R = 100 mm, d = 5 mm).40 Figure D.6 Current density lines J and distribution of J in the disk (source: coil of radius r = 10

39、 mm, conductive disk R = 100 mm, d = 5 mm).41 Figure D.7 J i= f r: Distribution of integrated induced current density calculated along the diameter AA of the disk (source: coil of radius r = 10 mm, conductive disk R = 100 mm, d = 5 mm).41 Figure D. 8 Parametric curves of factor K for distances up to

40、 300 mm to a source consisting of a coil and for different coil radius r (homogeneous disk R = 100 mm).42 Figure D.9 Parametric curves of factor K for distances up to 1 900 mm to a source consisting of a coil and for different coil radius r (homogeneous disk R = 100 mm).44 Figure D.10 Parametric cur

41、ves of factor K for distances up to 300 mm to a source consisting of a coil and for different coil radius r (homogeneous disk R = 200 mm).46 Figure D.11 Parametric curves of factor K for distances up to 1 900 mm to a source consisting of a coil and for different coil radius r (homogeneous disk R = 2

42、00 mm).48 Table 1 Numerical values of the coupling factor for non-uniform magnetic field K for different types of magnetic field sources, and different distances between sources and conductive disk (R = 100 mm) .15 Table B.1 Numerical values of factor K for distances up to 300 mm to a source consist

43、ing of an infinitely long wire (disk: R = 100 mm) 23 Table B.2 Numerical values of factor K for distances up to 1 900 mm to a source consisting of an infinitely long wire (disk: R = 100 mm) 24 Table B.3 Numerical values of factor K for distances up to 300 mm to a source consisting of an infinitely l

44、ong wire (disk: R = 200 mm) 25 Table B.4 Numerical values of factor K for distances up to 1 900 mm to a source consisting of an infinitely long wire (disk: R = 200 mm) 26 Table C.1 Numerical values of factor K for distances up to 300 mm to a source consisting of 2 parallel wires with balanced curren

45、ts (homogeneous disk: R = 100 mm).31 Table C.2 Numerical values of factor K for distances up to 1 900 mm to a source consisting of 2 parallel wires with balanced currents (homogeneous disk: R = 100 mm).33 Table C.3 Numerical values of factor K for distances up to 300 mm to a source consisting of 2 p

46、arallel wires with balanced currents (homogeneous disk: R = 200 mm).35 Table C.4 Numerical values of factor K for distances up to 1 900 mm to a source consisting of 2 parallel wires with balanced currents (homogeneous disk: R = 200 mm).37 Table D.1 Numerical values of factor K for distances up to 30

47、0 mm to a source consisting of a coil (homogeneous disk: R = 100 mm) .43 Table D.2 Numerical values of factor K for distances up to 1 900 mm to a source consisting of a coil (homogeneous disk: R = 100 mm) .45 Table D.3 Numerical values of factor K for distances up to 300 mm to a source consisting of

48、 a coil (homogeneous disk: R = 200 mm) .47 Table D.4 Numerical values of factor K for distances up to 1 900 mm to a source consisting of a coil (homogeneous disk: R = 200 mm) .49 Page5 EN6222621:20056222-2-61 CEI :02 40 13 INTRODUCTION Public interest concerning human exposure to electric and magnet

49、ic fields has led international and national organisations to propose limits based on recognised adverse effects. This standard applies to the frequency range for which the exposure limits are based on the induction of voltages or currents in the human body, when exposed to electric and magnetic fields. Th