KS B ISO 10110-14-2010 Optics and photonics－Preparation of drawings for optical elements and systems－Part 14：Wavefront deformation tolerance《光学和光学仪器 光学元件和系统制图准备 第14部分 波阵面变形公差》.pdf

1、 KSKSKSKS KSKSKSK KSKSKS KSKSK KSKS KSK KS KS B ISO 1011014 14： KS B ISO 1011014 :2010 2010 8 2 http:/www.kats.go.krKS B ISO 1011014:2010 : ( ) ( ) ( ) : (http:/www.standard.go.kr) ： ：2004 12 30 ：2010 8 2 2010-0300 ： ： ( 02-509-7290) (http:/www.kats.go.kr). 10 5 , . KS B ISO 1011014:2010 14： Optics

2、and photonicsPreparation of drawings for optical elements and systemsPart 14：Wavefront deformation tolerance 2007 2 ISO 1011014, Optics and photonicsPreparation of drawings for optical elements and systemsPart 14：Wavefront deformation tolerance , . 1 KS B ISO 10110 . ( ) . (“ ”) . . . KS B ISO 10110

3、5( 5： ) 5. . . 2 . . ( ) . KS B ISO 101101, 1： ISO/TR 149992, Optics and photonicsInterferometric measurement of optical elements and optical systemsPart 2：Meaurement and evaluation techniques ISO 149994：2007, Optics and photonicsInterferometric measurement of potical elements and optical systemsPar

4、t 4：Interpretation and evaluation of tolerances specified in ISO 10110 3 KS B ISO 1011014:2010 2 ISO 149994 . ISO 149994 . 4 4.1 , . , rms (rms , rms , rms ) . ISO 149994 3.3 . 1 . 0 , . 2 , ISO 149994 . . 4.2 , , , (nanometer) . , . 1 1 (1 , single pass). rms , (1 ). 2 (1) 1 x ( ). 3 rms . 4.3 . 54

5、6.07 nm . 4.4 , . 0 . 4.5 ( ) ( ) , ( ) . KS B ISO 101101：2006 4.8.3 . 5 KS B ISO 1011014:2010 3 5.1 , KS B ISO 101101：2006 4.2 . KS B ISO 101101：2006 5.3 . 1 (5.2) . , , rms (5.3). . . . . ( ) PV- . (註) . “ 0.25 ” “ 150 nm ”. . 6. . b) 1 a) KS B ISO 1011014:2010 4 5.2 13/. 5.3 3 . 13/A(B/C); E 13/A

6、 (B/C) RMSx D; E( x t, i a) 13/RMSx D; E ( x t, i a) “; E”( 3 ) 546.07 nm (5.1). A . 1) ( ) 2) () B . 1) ( ) 2) () C (1 ). , (/) ：13/A(B). 3 , A, B, C, (/), () (：13/). D x rms , x t, i, a . ISO 149994：2007 3.3.5, 3.3.6 3.3.8 . 6. 7 . E . . , . . 13/A (B/C) RMSx D (); E 6. 4 . KS B ISO 1011014:2010 5

7、 5.4 . 1 . , . , ( 2). , 3 . 3 () . 5.5 , . 4 ( ) . 1, 2, 3 5.6 . , “im” . 5 , . , , 0 . KS B ISO 1011014:2010 6 ：mm b) 2 CE：13/3(1) CF：13/1(0.2) DE：13/3(1) DF：13/1(0.2) 3 a) KS B ISO 1011014:2010 7 ：mm 4 ：mm 5 5.7 ISO 149992 A “ ” . . C i i ： ： 6. 8 6 . KS B ISO 1011014:2010 8 1 13/(1); 632.8 nm 1

8、 632.8 nm) . . 2 13/5 () RMSi 0.05; 632.8 nm 5 . , rms 0.05 . 632.8 nm. 3 13/600 nm(300 nm/150 nm); 632.8 nm 600 nm. 300 nm . 150 nm . 4a 13/3 (1/0.5); ( 30) 30 mm . 3 . 1 . . 546.07 nm. 4b 13/0.5 RMSi 0.05 ( 12) 12 mm , ( ) rms 0.05 . 546.07 nm. 5 13/3 (1); 632.8 nm 3 , 1 . 632.8 nm. 6 13/RMSt 0.0

9、7; 546.07 nm , . rms 0.07 . 546.07 nm. 7a 13/RMSi 0.07; RMSa 0.03; 632.8 nm , . rms 0.07 , rms 0.03 . 632.8 nm. 7b 13/RMSt 0.07; RMSi 0.04 KS B ISO 1011014:2010 9 , , . rms 0.07 , rms 0.04 . 546.07 nm. 8 13/(0.1); 632.8 nm C 8 1.24; C 15 0.44 . . 1.24 Z 8 -0.44Z 15 , 0.1. ( ) 632.8 nm. 9 CE：13/3(1)

10、CF：13/1(0.2) DE：13/3(1) DF：13/1(0.2) C E D E 3 1 . C F D F 1 0.2. 546.07 nm. KS B ISO 1011014:2010 10 1 ISO/TR 149991：2005, Optics and photonicsInterferometric measurement of optical elements and optical systemsPart 1：Terms, definitions and fundamental relationships KS B ISO 1011014:2010 11 KS B ISO

11、 1011014:2010 , . 1 1.1 ISO 1011014 ：2003, Optics and optical instrumentsPreparation of drawings for optical elements and systemsPart 14：Wavefront deformation tolerance . 1.2 ISO ISO 1011014：2003, Optics and optical instrumentsPreparation of drawings for optical elements and systemsPart 14：Wavefront

12、 deformation tolerance . 1.3 2004 (2010) . 1.3.1 1 (2010) ISO 1011014：2003 2007 ISO 1011014：2007 , ISO 1011014：2007, Optics and photonics Preparation of drawings for optical elements and systemsPart 14：Wavefront deformation tolerance . 14： 153787 1 92 3(13) (02)26240114 (02)262401489 http:/ KS B ISO 1011014 :2010 KSKSKS SKSKS KSKS SKS KS SKS KSKS SKSKS KSKSKS Optics and photonics Preparation of drawings for optical elements and systems Part 14 ：Wavefront deformation tolerance ICS 01.100.20；37.020 Korean Agency for Technology and Standards http:/www.kats.go.kr