KS D ISO 19319-2005 Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Determination of lateral resolution analysis area and sample area vie.pdf

1、 KSKSKSKS KS D ISO 19319SKSKSKS KSKSKS SKSKS KSKS SKS KS X , , KS D ISO 19319： 2005 2005 12 28 D ISO 19319：2005 ( ) ( ) ( ) ： ：2005 12 28 20051007 ： ： ( ) ( 02 5097292 5) . 7 5 , . D ISO 19319：2005 1 1. 1 2. 1 3. 1 4. , , 2 4.1 2 4.2 3 4.3 8 4.4 10 5. , , 11 5.1 11 5.2 12 5.3 13 5.4 13 15 i ICS 71.0

2、40.40 KS D ISO X , , 19319：2005Surface chemical analysis Auger electron spectroscopy and X-ray photoelectron spectroscopy Determination of lateral resolution, analysis area, and sample area viewed by the analyzer 2003 1 ISO/TR 19319 Surface chemical analysis Auger electron spectroscopy and X-ray pho

3、toelectron spectroscopyDetermination of lateral resolution, analysis area, and sample area viewed by the analyzer , . 1. (Auger) X (1) (2) (3) . 2. KS D ISO 181151 . KS D ISO 18115 “ ” “ ” . “ ” . KS D ISO 18115 “ ” . “ ” . 2.1 (analysis area) 2 2.2 (lateral resolution) 1. . 2. (i) FWHM (ii) 12 % 88

4、 % (intensity point) . 2 . . 20 % 80 % 16 % 84 % . 16 % 84 % 2 . 2.3 (sample area viewed by the analyzer) 2 3. AES D ISO 19319：2005 erf FWHM I Ii (AES ) Imax JA(r) ( r ) JAb(r) ( r ) JAi(r) ( r ) R (AES ) r (AES ) rmax(5) XPS X r r(50) 25 75 % b (AES ) i (AES ) 4. , , 4.1 AES XPS . , . (wafer) ( ),

5、, , . , 2 , . ( ), ( ) ( ) . AES XPS , . . , , . 3 6 7 9, (contrast) . , , 3 9. 39. , 0 . AES XPS (, ) . . 2 D ISO 19319：2005 , . AES XPS , ( ) . . . ( AES XPS X (flux) /X ) , AES/XPS . 4.2 4.2.1 . AES . , . XPS , ( ) . AES XPS ( .) . AES Cazaux9 , XPS Drummond10 . 1 3 AES XPS . ( 起 ) . AES( 1 ) , 3

6、 keV 25 keV “” . (field) (FWHM) 5 nm( )50 nm . , ( ) . , . AES FWHM 9, 4.2.2 . 1 AES XPS X 2 3 1 AES XPS 3 D ISO 19319：2005 1 X XPS . X X FWHM 10 m . X (synchrotron) (zone-plate) FWHM 100 nm 11. FWHM . 1 AES XPS . , , . 1 . , 2 ( , ) FHWM . 2 a) XPS . , 10 m . 2 b) XPS . . . 2 a) 2 b) . , . 1 , , .

7、3 X X , 2 XPS . 2 3 . 0.1 1 mm . a) XPS b) XPS 1 X 2 3 2 a) ( ), b) ( ) XPS 4 D ISO 19319：2005 1 X 2 3 3 X 2 XPS 4.2.2 AES . , . AES FWHM 50 nm 9, 12. 1 m . r , JA(r) 2 9, 12, 13. )2/exp(2/)1()2/exp()2/()(222222bbiiiiArIRrIrJ += (1) )()()( rJrJrJAbAiA+= (2) Ii： i： b： JAi(r), JAb(r)： , 2 FWHM 2.35i 2

8、.35b . Seah14 20 keV FWHM 0.2 m 3.0 m . b 0.0851.3 m . 4 i= 10 nm, b= 200 nm, R = 1.5 JA(r) . JA(r) r = 0 1 . b i JAi(r = 0) JAb(r = 0) 3 . r = 0 JAb(r) i . 5 D ISO 19319：2005 4 i= 10 nm, b= 200 nm, R = 1.5 r , (1) JA(r) (r = 0 1 .) AES ( ) 1 . I . r I Imax 25 % 75 % , I Imax 16 % 84 % , I Imax 12 %

9、 88 % , I Imax 10 % 90 % 1, 12. (1) 12, 13. . 5 4 JAi(r) I/Imax , 4 JAb(r) (plotted) I/Imax . 5 , 2575 %, 2080 %, 1684 %, 1288 %, 1090 % 15 nm, 22 nm, 32 nm, 102 nm, 150 nm . 2575 %, 2080 %, 1684 % ( b R ), , (1) i FWHM . , 1288 %, 1090 % (1) 3 (i, b, R) . b R 7, 15, AES . 5 2575 % . 6 D ISO 19319：2

10、005 X (nm) Y I/Imax 5 1 , I Imax ( 4 .) ( I/Imax . I/Imax= 0.25 I/Imax= 0.75 . I/Imax . 15 nm .) Seah13 2575 % r(50) . 0.5 R = erf z( i) (R 1)erf z( b) (3) erf (z)： erf (z) = dttz)(exp)/2(20 (4) (3) 1 2 2/)50(irt = .2/)50(brt = 6 R 4 r(50)/i b/i . b/i 20 r(50)/i b/i . r(50)/i r(50)/i 1.35(R = 1 )3.1

11、(R = 1.8 ) R . 1090 % Cazaux b/i R 12. 4 6 . Cazaux12 7 D ISO 19319：2005 . , Monte Carlo 12, 16. Cazaux 9 , . El Gomati 17 (cross section) . . 6 R r (50)/i b /i 4.2.3 XPS XPS AES . 1 XPS X 2 XPS . Baer Engelhard18 XPS ( 4.3.3 ) . 1 X , 2 a) . r 2 1684 % 9200 m . , , , 1/(1 | r |3) , 1/(1 | r |3) . 4.3 4.3.1 AES XPS 8 D ISO 19319：2005 AES XPS . AES XPS . 1 2 AES XPS . , . 4.3.2 AES (1) i= 10 nm, b= 200 nm, R = 1.5 JA(r) r 4 . rmax I Imax (1) . RrRrdrrrJdrrrJIIbiArA/)2/exp(1)1()2/exp(1)()(22max22max00maxmax += (5) 7 4 rmax (5) I/Imax . 7