KS D ISO 23833-2012 Microbeam analysis－Electron probe microanalysis(EPMA)－Vocabulary《微束分析 电子探针微小分析 词汇》.pdf

1、 KSKSKSKSKSKSKSK KSKSKS KSKSK KSKS KSK KS KS D ISO 23833 KS D ISO 23833:2012 2012 5 25 http:/www.kats.go.krKS D ISO 23833:2012 : ( ) ( ) () () ( ) : (http:/www.standard.go.kr) ： ：2004 12 30 ：2012 5 25 2012-0219 ： ： ( 02-509-7274) (http:/www.kats.go.kr). 10 5 , . KS D ISO 23833:2012 i ii . iii 1 1 2

2、1 3 1 4 2 4.1 .2 4.2 (electron probe microanalyser).2 4.3 (electron scattering)2 4.4 X (X-ray).4 4.5 X (X-ray absorption)5 4.6 X (X-ray spectrum).6 5 .7 5.1 (electron optics)7 5.2 (electron beam) 9 5.3 (electron probe) 10 5.4 (electron scanning image).11 5.5 X (X-ray detection) 12 5.6 X (X-ray spect

3、rometry) .14 6 .18 6.1 (accelerating voltage).18 6.2 (detection limit) .19 6.3 (experimental data correction) 20 6.4 (quantitative analysis).20 6.5 (quantitative analysis correction).23 6.6 (sample to be analysed) 24 6.7 (spatial resolution).26 6.8 X (X-ray intensity)27 28 .29 KS D ISO 23833:2012 ii

4、 (EPMA： Electron probe X-ray microanalyzer) , , , , , 1 m . X X . (MBA： Micro Beam Analysis) , , , , , , , . . . (SEM： Scanning Electron Microscopy), (AEM： Analytical Electron Microscopy), (EDS： Energy Dispersive Spectroscopy) , ISO/TC 202(microbeam analysis) SC 1(terminology) . KS D ISO 23833:2012

5、iii 2006 1 ISO 23833, Microbeam analysis Electron probe microanalysis (EPMA) Vocabulary . KS D ISO 23833:2012 Microbeam analysis Electron probe microanalysis(EPMA) Vocabulary 1 (EPMA： Electron Probe Micro Analysis) . . . (： SEM, AEM, EDX) . 2 . . ( ) . KS X ISO 704, ISO 1087, Terminology work Vocabu

6、lary Part 1： Theory and Application ISO 10241, International terminology standards-preparation and layout 3 BSE (backscattered electron) CRM (certified reference material) EDS (energy-dispersive spectrometer) EDX (energy-dispersive X-ray spectrometry) X EPMA (electron probe microanalysis electron pr

7、obe microanalyser) eV (electronvolt) keV (kiloelectronvolt) SE (secondary electron) SEM (scanning electron microscope) WDS (wavelength-dispersive spectrometer) WDX (wavelength-dispersive X-ray spectrometry) X KS D ISO 23833:2012 2 4 4.1 EPMA X 4.1.1 X 4.1.2 , X X . 4.2 (electron probe microanalyser)

8、 X X . 4.3 (electron scattering) / . 4.3.1 (angle of scattering) KS D ISO 18115:2006 4.3.2 (backscattering) 4.3.2.1 (backscatter coefficient) KS D ISO 23833:2012 3 n(BS)/n(B) n(B) , n(BS) 4.3.2.2 (backscattered electron) 4.3.2.3 (backscattered electron angular distribution) 4.3.2.4 (backscattered el

9、ectron depth distribution) 4.3.3 (continuous energy loss approximation) . . 4.3.4 (elastic scattering) 0 (180) ( 0.1 ) 4.3.5 (inelastic scattering) , , , ( 0.01 ) . 4.3.6 (scattering cross-section) , ( ) 4.4.4 /(atom/cm2) (cm2) 4.3.7 (scattering effect) X 4.3.8 (secondary electron) KS D ISO 23833:20

10、12 4 . 4.4 X (X-ray) 4.4.1 X (characteristic X-ray) X 4.4.2 X (continuous X-ray) ( ) 4.4.3 (fluorescence yield) X . 4.4.4 (ionization cross-section) , 4.3.6 1 area(cm2) barns(10 24cm2) . 2 Q . dn Q(N/A)dx . dn , dx , (N/A) . 4.4.5 (ionization energy) (critical excitation energy) (edge energy) . , (：

11、 K, L ) eV keV 4.4.6 J (J-value) . KS D ISO 23833:2012 5 4.4.7 (stopping power) dE/ds ( ) / (eV/nm) . 4.4.8 X (X-ray fluorescence effect) (secondary fluorescence) X ( ) X X . 4.4.9 X (X-ray generation) ( , ) X X ( X ) (bremsstrahlung) ( X ) . 4.5 X (X-ray absorption) X . EPMA X . 4.5.1 (absorption e

12、dge) X X ( ) (background) . 4.5.2 (absorption factor) f(X) X X 4.5.3 (depth distribution function) (z) X z 4.5.4 (jump ratio) X X (photoionization) X . KS D ISO 23833:2012 6 KS D ISO 18115 5.195 4.5.5 (mass attenuation coefficient) / X I/Io exp ( /)s Io X , I s(cm) , , / (： cm2/g) 4.5.6 - (mass-dept

13、h distance) z (cm) (g/cm3) g/cm2 4.5.7 X ( ) (X-ray take-off angle) X 4.6 X (X-ray spectrum) X , / , 4.6.1 X (characteristic X-ray spectrum) , , , X 4.6.1.1 X (family of X-ray lines) / X 4.6.1.2 K (K-line) X K X 4.6.1.3 K (K-spectrum) K X KS D ISO 23833:2012 7 4.6.1.4 L (L-line) X L X 4.6.1.5 L (L-s

14、pectrum) L X 4.6.1.6 M (M-line) X M X 4.6.1.7 M (M-spectrum) M X 4.6.1.8 (satellite line) , (non-diagram lines), X X 4.6.1.9 X (X-ray line table) EPMA EPMA X K, L, M ( ) . , (FWHM), , ( ) . 4.6.2 X (continuous X-ray spectrum, continuum, bremsstrahlung) X . 0 E0 (- ) . 4.6.2.1 - ( ) (Duane-Hunt limit

15、) E0 X 4.6.2.2 (Kramers law) , X 5 5.1 (electron optics) KS D ISO 23833:2012 8 5.1.1 (condenser lens) (demagnification) , . 5.1.1.1 (condenser lens aperture) 5.1.1.2 (condenser lens current) , 5.1.2 (demagnification) 5.1.3 (electron gun) EPMA ( , LaB6 ) . 5.1.3.1 (electron gun brightness) , . 4I / (

16、 2d 22) I (A), d (cm), (radians) 5.1.3.2 (electron gun current) (beam current) 5.1.4 (objective lens) , , . . 5.1.4.1 (objective lens aberration) (： , , ) KS D ISO 23833:2012 9 5.1.4.2 (objective lens aperture) . 5.1.4.3 (objective lens current) , 5.1.5 (working distance) ( ) (principal plane) . 5.2

17、 (electron beam) 5.2.1 (beam current) 5.2 5.2.1.1 (beam current density) A/cm25.2.1.2 (beam current stability) 5.2.1 5.2.1.3 (beam diameter) , 0.8(80 %) 5.2 (FWHM) . KS D ISO 23833:2012 10 5.2.2 (Faraday cup) 100 m . 5.3 (electron probe) (4.2) . 5.3.1 (probe current) 5.3 5.3.1.1 (probe current densi

18、ty) A/cm25.3.1.2 (probe current stability) 5.3.2 (probe diameter) , 0.8(80 %) (FWHM) . 5.3.3 (sample stage) X ( x y ). 3 (x , y , z , z ) . 5.3.4 (absorbed current) (specimen current) . KS D ISO 23833:2012 11 . 5.4 (electron scanning image) ( , , X ) (CRT) 5.4.1 (area scanning) X 5.4.2 (backscattere

19、d electron image) ： , , - (Everhart-Thornley detector) 5.4.3 (compositional mapping) X . (scale) . 5.4.4 (dot mapping) X off( ) on( ) X . 5.4.5 (edge effect) . . 5.4.6 (image contrast) C (P1, P2) . C |S2 S1|/Smax(0 C 1). S2 S1 (P1, P2) , Smax . 5.4.7 (image magnification) (l) (： ) (L) M L/l 5.4.8 (image resolution) KS D ISO 23833:2012 12 . 5.4.9 (line analysis) . 5.4.10 (point analysis) 5.4.11 (secondary electron image) , (50 eV ) 5.4.12 (absorbed current image) (specimen current image) . 5.4.13 X (X-ray image) X X