1、American National Standards Institute11 West 42nd StreetNew York, New York10036ANSI/NAPM IT9.22-1996ANSI/NAPM IT9.22-1996for Imaging Materials Processed Photographic Films Methods for DeterminingScratch ResistanceANSI/NAPM IT9.22-1996Revision and redesignation ofANSI PH1.37-1977(R1989)American Natio
2、nal Standardfor Imaging Materials Processed Photographic Films Methods for DeterminingScratch ResistanceSecretariatNational Association of Photographic Manufacturers, Inc.Approved February 16, 1996American National Standards Institute, Inc.AmericanNationalStandardApproval of an American National Sta
3、ndard requires verification by ANSIthat the requirements for due process, consensus, and other criteria forapproval have been met by the standards developer.Consensus is established when, in the judgment of the ANSI Board ofStandards Review, substantial agreement has been reached by directlyand mate
4、rially affected interests. Substantial agreement means much morethan a simple majority, but not necessarily unanimity. Consensus requiresthat all views and objections be considered, and that a concerted effort bemade toward their resolution.The use of American National Standards is completely volunt
5、ary; their existence does not in any respect preclude anyone, whether he has approvedthe standards or not, from manufacturing, marketing, purchasing, or usingproducts, processes, or procedures not conforming to the standards.The American National Standards Institute does not develop standards andwil
6、l in no circumstances give an interpretation of any American NationalStandard. Moreover, no person shall have the right or authority to issue aninterpretation of an American National Standard in the name of the AmericanNational Standards Institute. Requests for interpretations should be ad-dressed t
7、o the secretariat or sponsor whose name appears on the title pageof this standard.CAUTION NOTICE: This American National Standard may be revised orwithdrawn at any time. The procedures of the American National StandardsInstitute require that action be taken periodically to reaffirm, revise, or withd
8、raw this standard. Purchasers of American National Standards mayreceive current information on all standards by calling or writing the AmericanNational Standards Institute.Published byAmerican National Standards Institute11 West 42nd Street, New York, New York 10036Copyright 1996 by American Nationa
9、l Standards InstituteAll rights reserved.No part of this publication may be reproduced in anyform, in an electronic retrieval system or otherwise,without prior written permission of the publisher.Printed in the United States of Americainsert code hereiForewordii0 Introduction11 Scope 22 Normative re
10、ferences .23 Method A .24 Method B .7Figures1 Spherical stylus scratch tester 42 Construction of spherical stylus scratch tester 4AnnexesA Validity of test methods 9B Bibliography .10ContentsPageiiForeword (This foreword is not part of American National Standard ANSI/NAPM IT9.22-1996.)Photographic f
11、ilm must have sufficient resistance to scratches and to abra-sion to permit satisfactory performance in equipment. In some applica-tions, photographic film can become unusable owing to scratches on eitherthe emulsion or support surface, even though the physical integrity andstrength of the photograp
12、hic film is excellent.The practical scratch resistance of photographic film is a difficult propertyto evaluate because of the many forms of abrasive materials and the dif-ferent mechanisms by which scratches can be induced. For example,scratches can be formed when dirt particles are cinched into a f
13、ilm roll. Inthis situation, there is a very high pressure on the particles, and the mag-nitude of the scratch is dependent upon the particle size, the relative hard-ness of the dirt and the film, and on whether the film surface is indentedsmoothly or with a rough fracture. In contrast, film can be a
14、braded by run-ning over a stationary surface. In such a case, the scratch severity is verydependent upon the film-surface pressure. This situation is more closelysimulated in the test methods described in this standard, in which thepressure on the stylus is varied and the resulting scratch is measur
15、ed.These test methods were first worked on in 1955 by Subcommittee 3 ofAmerican National Standards Committee PH1 and resulted in a compara-tive testing program by several participating laboratories. They becamestandard methods in 1963.In 1974, Subcommittee PH1-3 undertook additional investigative wo
16、rkinvolving four participating laboratories. This cooperative testing programstudied the effect of cleaning the sapphire stylus points and resulted in amodification to the cleaning procedure. Changes were also made in thetesting humidity and temperature, in order to make these methods consis-tent wi
17、th test methods described in other American National Standards.The current revision is essentially cosmetic and involved an updating ofreferences, minor editorial modifications, and reformatting into the presentANSI style guidelines. The only technical change is the inclusion of asmaller radius sapp
18、hire stylus.The standard contains two annexes that are informative and are not con-sidered part of this standard.Suggestions for improvement of this standard will be welcome. They shouldbe sent to the National Association of Photographic Manufacturers, Inc.,550 Mamaroneck Avenue, Suite 307, Harrison
19、, New York 10528-1612.This standard was processed and approved for submittal to ANSI byNAPM Technical Committee IT9 on the Physical Properties andPermanence of Imaging Materials. Committee approval of the standarddoes not necessarily imply that all committee members voted for itsapproval. At the tim
20、e it approved this standard, the IT9 Committee had thefollowing members:Peter Z. Adelstein, ChairmanA. Tulsi Ram, SecretaryiiiAssociation for Information and Image Management Judy KilpatrickAssociation of Reproduction Materials Manufacturers, Inc. .Philip NowersCanadian Conservation Institute Klaus
21、B. HendriksFirst Image Management CompanyWilliam E. NealeGenealogical Society of Utah.Eric EricksonNathan Nilsson (Alt.)Brent Reber (Alt.)Image Permanence Institute James M. ReillyDouglas Nishimura (Alt.)International Society of Photogrammetryand Remote Sensing .Francis J. ParrishLight Impressions C
22、orporation .Dennis InchMotion Picture Studio Preservation Rami MinaRick Utley (Alt.)National Association of PhotographicManufacturers, Inc. .Ronald CieciuchPeter Roth (Alt.)Haruhico IwanoJunichi KohnoDavid F. KopperlA. Tulsi Ram (Alt.)Charles A. Schallhorn (Alt.)Cheri L. Warner (Alt.)Peter KrauseGil
23、bert G. LeiterNeil Anderson (Alt.)William Murray (Alt.)Norman Newman (Alt.)Kenneth M. SmithRobert L. Seyfert (Alt.)National GeographicRobin E. SiegelNational Information Standards Organization (Liaison) .Margaret ByrnesNational Optical Astronomy Observatories .William E. SchoeningProfessional Photog
24、raphers of America, Inc.Robert M. OpferSmithsonian Institute .Mark McCormick-GoodhartJames Wallace (Alt.)Society of Imaging Science and Technology Peter Z. AdelsteinU.S. Defense Logistics Agency James N. McBeeU.S. General Services Administration Federal Supply and Services .Martin RobinsonU.S. Libra
25、ry of Congress .Gerald GibsonU.S. National Archives and Records AdministrationAlan R. CalmesSteven Puglia (Alt.)Sarah Wagner (Alt.)Wilhelm Imaging Research Henry WilhelmIndividual ExpertEugene OstroffOrganization Represented Name of RepresentativeAMERICAN NATIONAL STANDARD ANSI/NAPM IT9.22-1996Ameri
26、can National Standardfor Imaging Materials Processed Photographic Films Methods for DeterminingScratch Resistance10 IntroductionProcessed photographic film should have sufficient scratch or abrasion resistance to permit satisfactoryperformance when it is used in equipment for which it is intended an
27、d under conditions likely to beencountered. Treatments to enhance the scratch resistance of film are commercially available. Testmethods are needed to evaluate the effectiveness of such treatments, as well as to rate the inherentscratch resistance of photographic film.Scratch resistance is a complex
28、 and abstruse characteristic. Processed photographic film is subjectedto several varieties of scratch, such as those caused by grit particles or by cinching in rolls. Since eachvariety has a different physical mechanism, scratch resistance of film is not an absolute, singularproperty. One film may b
29、e rated superior to another in one test, while the opposite ranking may befound in another test. There is not a scratch or abrasion test capable of ranking a variety of film types asthey would behave under different practical conditions. The test methods described in this standardyield results that
30、correlate rather successfully with practical use in some applications, but not in all.The scratch resistance of photographic film is affected by relative humidity, processing conditions, andsurface friction. This means that scratch tests on photographic film must be carried out in a controlledatmosp
31、here with proper processing and without touching of the film surface or other handling that mightunintentionally lubricate the surface. In some cases, such as lacquered or freshly processed film, thescratch resistance may change with age. Lubrication generally increases the scratch resistance of a f
32、ilmsurface. Lubrication can be detected by the methods described in American National Standard forPhotography Processed films Method for determining lubrication, ANSI/ISO 5769-1984 (R1994),ANSI/NAPM IT9.4-1992.Both the emulsion layer and the base side of processed photographic film are susceptible t
33、o scratchingor abrasion. However, many film handling machines are designed to protect the emulsion side as muchas possible, so that the base side takes the brunt of the wear. The test methods given in this standardare applicable to both sides of the film.Scratch resistance greatly depends upon the g
34、eometry of the stylus used in the test. Styli that arenominally the same may differ widely in scratch characteristics. For this reason, the methods describedin this standard are good for material comparisons using a single stylus point. However, agreement ofscratch levels obtained with different equ
35、ipment may be poor.Unprocessed photographic emulsions generally exhibit photographic scratch or abrasion sensitivity(made visible by development) at lower levels than those where physical scratch is apparent. Method A(see clause 3) can be used to determine photographic abrasion sensitivity, if desir
36、ed; the test should beperformed in the dark, and the specimen should then be processed.ANSI/NAPM IT9.22-199621 ScopeThis standard describes two test methods for evaluating the scratch resistance of dry, processedphotographic film on either the emulsion or the base side. The two test methods usually
37、givecomparable results. Method A gives a measure of the minimum load required to produce a scratch,requires less elaborate evaluation equipment, and is less stringent in its requirements of the opticalcondition of the samples. Method B (see clause 4) provides a measurement of haze produced byvarious
38、 stylus loads, is a more complete measure of the scratch characteristics of a material, and is thepreferred method.This standard is intended for use in evaluating the scratch resistance of dry, processed photographicfilm. It provides empirical laboratory tests made under controlled conditions. It do
39、es not necessarilypredict the actual scratch resistance of a film in any particular commercial machine.2 Normative referencesThe following standards contain provisions which, through reference in this text, constitute provisions ofthis standard. At the time of publication, the editions indicated wer
40、e valid. All standards are subject torevision, and parties to agreements based on this standard are encouraged to investigate the possibilityof applying the most recent editions of the standards listed below.ANSI IT9.14-1992, Imaging media (Photographic film and papers) Method for determining theres
41、istance of photographic emulsions to wet abrasionANSI/ASTM D1003-95, Test method for haze and luminous transmittance of transparent plasticsANSI/ISO 5769-1984 (R1994), ANSI/NAPM IT9.4-1992, Photography Processed films Method fordetermining lubrication3 Method A3.1 ApparatusAn example of a scratch te
42、st apparatus is shown in figure 1.1)Figure 2 shows a mechanical drawing ofthe same apparatus. Exact dimensions are not critical except with respect to the stylus.3.1.1 The apparatus shall consist of a specimen holder that will hold the specimen flat on a smoothglass plate. The specimen holder should
43、 permit smooth, linear, horizontal travel of the specimen for adistance of at least 2 cm (.079 in) without sidewise motion. The holder may be either manually operatedor power driven.3.1.2 A spherical sapphire stylus of either 0.050-mm (0.002-in) or 0.075-mm (0.003-in) radius shall beused.2)It shall
44、be mounted at the end of a pivoted arm, so that it can be lowered onto the specimen andthereby scribe a line on it when the specimen holder travels along under the stylus. The stylus shouldmake perpendicular contact with the specimen.1)The test apparatus for mushiness, described in ANSI IT9.14, may
45、be adapted for this test which is constructedso that the load is continuously increased as the stylus arm is drawn across the specimen. However, it is not assatisfactory as only a single point, rather than a line, is obtained at each load level.2)Sapphire styli generally give results which usually r
46、eflect trade experience. They may be obtained from thefollowing sources: Stanton, Inc., 101 Sunnyside Blvd., Plainview, NY 11803, USA; Carbide Probes, Inc., 1328Research Park Dr., Dayton, OH 45432, USA; Sinto Kagaku, Co., Ltd., Nukui 2-16-30, Nerina, Tokyo 176, Japan.Diamond styli have the advantage
47、 of greater durability, but because of their different friction properties they arefrequently less sensitive to differences between materials. This information is given for the convenience ofANSI/NAPM IT9.22 and does not constitute an endorsement by NAPM or ANSI.ANSI/NAPM IT9.22-199633.1.3 The arm m
48、ay be pivoted on a threaded hinge with a knurled knob or other provision forpositioning the stylus laterally so that many parallel scribe lines can be made on the same specimen.Alternatively, the specimen holder can be provided with lateral positioning and a simple pivot used onthe stylus arm.3.1.4
49、The stylus arm should be counterbalanced so that it produces no load on the stylus. The weightsshall be designed so that, when used singly or in combination, the center of gravity of the mass will bepositioned directly over the stylus. Preferably, this should provide for automatic, accurate positioning.These weights should range from 1 to 100 grams, but are not necessarily limited to this range.ANSI/NAPM IT9.22-19964Figure 1 Spherical stylus scratch testerFigure 2 Construction of spherical stylus scratch testerANSI/NAPM IT9.22-199653.2 Sample preparation3.2
