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4、0 (outside USA) Fax: 724-776-0790 Email: CustomerServicesae.org SAE WEB ADDRESS: http:/www.sae.org SAE values your input. To provide feedback on this Technical Report, please visit http:/www.sae.org/technical/standards/EIA557B TECHNICAL REPORT EIA-557 REV. B Revised 2006-02 Statistical Process Contr
5、ol Systems NOTICE This document has been taken directly from the original TechAmerica document and contains only minor editorial and format changes required to bring it into conformance with the publishing requirements of SAE Technical Standards. The release of this document is intended to replace t
6、he original with the SAE International document. Any numbers established by the original document remain unchanged. The original document was adopted as an SAE publication under the provisions of the SAE Technical Standards Board (TSB) Rules and Regulations (TSB 001) pertaining to accelerated adopti
7、on of specifications and standards. TSB rules provide for (a) the publication of portions of unrevised specifications and standards without consensus voting at the SAE committee level, and (b) the use of the existing specification or standard format. TechAmerica Standard STATISTICAL PROCESS CONTROL
8、SYSTEMS EIA 557-B FEBRUARY 2006 EIA-557-BNOTICE TechAmerica Engineering Standards and Publications are designed to serve the public interest by eliminating misunderstandings between manufacturers and purchasers, facilitating interchangeability and improvement of products, and assisting the purchaser
9、 in selecting and obtaining with minimum delay the proper product for his particular need. Existence of such Standards and Publications shall not in any respect preclude any member or nonmember of TechAmerica from manufacturing or selling products not conforming to such Standards and Publications, n
10、or shall the existence of such Standards and Publications preclude their voluntary use by those other than TechAmerica members, whether the standard is to be used either domestically or internationally. Standards and Publications are adopted by TechAmerica in accordance with the American National St
11、andards Institute (ANSI) patent policy. By such action, TechAmerica does not assume any liability to any patent owner, nor does it assume any obligation whatever to parties adopting the Standard or Publication. This TechAmerica Standard is considered to have International Standardization implication
12、s, but the ISO/IEC activity has not progressed to the point where a valid comparison between the TechAmerica Standard and the ISO/IEC document can be made. This Standard does not purport to address all safety problems associated with its use or all applicable regulatory requirements. It is the respo
13、nsibility of the user of this Standard to establish appropriate safety and health practices and to determine the applicability of regulatory limitations before its use. Formulated under the cognizance of the TechAmerica Quality and Reliability Committee, QRE. Published by 2010 TechAmerica Standards
14、classification: excellent, good, poor), nominal data (i.e., unordered groupings such as defect type), or pass/fail data. AUDIT: The periodic observation of procedures and performed activities to evaluate compliance with requirements. AVERAGE: The sum of the sample values divided by the number of sam
15、ple values. A measure of location used to estimate the population mean. BINOMIAL DISTRIBUTION: A specific discrete probability distribution for attributes data. CAPABILITY: The natural variation of the process due to common causes. CAPABILITY INDEX: A measure of the relationship between the specific
16、ation limits and the capability. See EIA-738, “ Guideline on the Use and Application of Cpk“ and “The Use and Abuse of Cpk“ by Berton H. Gunter. CAUSE AND EFFECT DIAGRAM: A tool for individual or group problem-solving that uses a graphic description of the various process elements to analyze potenti
17、al sources of process variation. Also called a Fishbone Diagram (after its appearance) or Ishikawa Diagram (after its developer). CENTERLINE: A reference line on a control chart about which the chart points are expected to cluster in the absence of a special cause. It is usually set at the average,
18、median, or mode of the points being plotted, or (for a tunable process) at an achievable target value (to detect deviations from the value thought most desirable). CHARACTERISTIC: A distinguishing feature of a process or its output on which variables or attributes data can be collected. CHARACTERIZA
19、TION: A description of the characteristics of a product or process by mathematical modeling, design of experiments or statistical data evaluation. CHECKLIST: A listing of the specified criteria that may be observed and checked off during an audit or inspection. CHECK SHEET: A form for data collectio
20、n. COMMON CAUSE: A source of natural variation that affects all the individual values of the process output being studied. In control chart analysis it appears as part of the random process variation. CONTROL CHART: A graphic representation of a process characteristic showing plotted values of some
21、statistic gathered from that characteristic; a central line and one or two statistically derived control limits. Two basic uses are to determine whether a process has been operating in statistical control and to aid in maintaining statistical control. CONTROL LIMITS: The maximum allowable variation
22、of a process characteristic due to common causes alone. Variation beyond a control limit may be evidence that special causes are affecting the process. Control limits are calculated from process data and are usually represented as a line (or lines) on a control chart. They are not to be confused wit
23、h engineering specification limits. 6 EIA-557-B CONTROL LOOP: A corrective action system based on a feedback procedure. CRITICAL PROCESS NODE: A node in the process flow whose output has a significant impact on the process. CUSUM CHART: An SPC charting technique where cumulative deviation from a tar
24、get is plotted. DATA POINTS: Values that are either observed or calculated. DISCREPANT MATERIAL: Material that does not conform to specifications (see nonconforming units). EWMA (Exponentially Weighted Moving Average) Chart. An SPC charting technique based on assigned weights to past observations. F
25、AILURE MODE AND EFFECT ANALYSIS (FMEA): A disciplined analysis of possible failure modes on the basis of seriousness, probability of occurrence, and likelihood of detection. HISTOGRAM: A graph obtained by dividing the range of the data set into equal intervals and plotting the number of data points
26、in each interval. INDIVIDUAL: A single unit or a single measurement of a characteristic. INSPECTION: The assessment of a characteristic and its comparison to a standard. LOCATION: The typical value or central tendency of a distribution. LONG TERM CAPABILITY: The process capability under normal opera
27、ting conditions over an extended period of time. MANUFACTURING: All areas/operations where products or services are processed, stored, or handled. MEAN. The sum of the population values divided by the number of values in the population. A measure of location (central tendency) equal to the center of
28、 gravity of the population. MEDIAN: The middle value in a group of measurements when arranged from lowest to highest. When the number of measurements is an even number, the average of the two middle values is used as the median. A measure of location. MODE: The most frequently occurring value in a g
29、roup of measurements. A measure of location. NODE: A definable point in the process where form, fit or function of the product or service is altered. NONCONFORMING: Does not conform to specification(s), procedures or requirements. NONCONFORMING UNITS: Units that do not conform to a specification (se
30、e discrepant material). NONCONFORMITY: A specific occurrence of a condition that does not conform to specification (Sometimes called a discrepancy.). NORMAL DISTRIBUTION: A continuous, symmetrical, bell-shaped frequency distribution for variables data. When measurements have a normal distribution, a
31、bout 68.26% of all individuals lie within plus or minus one standard deviation unit of the mean; about 95.44% lie within plus or minus two standard deviation units of the mean; and about 99.73% of all individuals lie within plus or minus three standard deviation units of the mean. PARAMETER: A numer
32、ical characteristic of a population. 7 EIA-557-B PARETO ANALYSIS: A technique for problem-solving where all potential problem areas or sources of variation are ranked according to their contribution. POISSON DISTRIBUTION: A specific discrete probability distribution for attributes data. POPULATION:
33、The collection of all possible values of a given characteristic. PRECISION: The measure of natural variation of repeated measurements. PROBABILITY: The relative frequency with which an outcome takes place over a very long sequence of trials in which the outcome could have occurred. PROBABILITY DISTR
34、IBUTION: A collection of all possible outcomes of a random event, together with their respective probabilities. PROBABILITY DISTRIBUTION FUNCTION: A mathematical representation of a probability distribution. PROBLEM-SOLVING: The process of moving from effects to causes (special or common) to actions
35、 that improve performance. PROCESS: A combination of people, procedures, methods, machines, materials, measurement equipment, and/or environment for specific work activities to produce a given product or service. A repeatable sequence of activities with measurable inputs and outputs. PROCESS AVERAGE
36、: The location of the distribution of measured values of a particular process characteristic. PROCESS CAPABILITY STUDY: The quantification of natural process variability. PROCESS SPREAD: The extent to which the individual values of a process characteristic vary. PRODUCT PERFORMANCE: The totality of
37、the capability of characteristics of a product QUALITY FUNCTION DEPLOYMENT (QFD). A technique for analysis of the inter-relationships between different requirements. RANDOMNESS: A condition in which individual values are not predictable, although they may come from a definable distribution. RANDOM S
38、AMPLE: A set of individuals taken from a population in such a way that each possible individual has an equal chance of being selected. RANGE: The difference between the maximum and minimum values. A measure of spread. RUN: A consecutive number of points (usually 7 or 8) above or below a central line
39、. RUN CHART: A time-ordered graphic representation of a characteristic of a process showing plotted values of some statistic gathered from the process and a central line that can be analyzed for runs. SAMPLE: A set of individuals taken from a population. SCATTER DIAGRAM: A graph of the value of one
40、characteristic versus another characteristic. SHAPE: A general concept for the overall pattern formed by a distribution of values. SHORT TERM CAPABILITY: The process capability under controlled conditions over a brief period of time. 8 EIA-557-B SPECIAL CAUSE: A source of variation that is intermitt
41、ent, unpredictable, or unstable and affects only some of the individual values of the process output being studied. Sometimes called an assignable cause. SPECIFICATION LIMITS: The requirements for judging acceptability of a particular characteristic. STABILITY: The absence of special causes of varia
42、tion; the property of being in statistical control. STABLE PROCESS: A process that is in statistical control. STANDARD DEVIATION: A measure of the spread or variation in a probability distribution (population standard deviation) or in a sample of values measured on the output from a process (sample
43、standard deviation). STATISTIC: A value calculated from or based upon sample data used to make inferences about a parameter of the population from which the sample came. STATISTICAL CONTROL: The conditions describing a process from which all special causes of variation have been eliminated and only
44、common causes remain. STATISTICAL PROCESS CONTROL (SPC): The conversion of data to information using statistical techniques to document, correct and improve process performance. STATISTICAL QUALITY CONTROL (SQC): Statistical methods and procedures used to document and ensure compliance with requirem
45、ents. TARGET: The desired value for a statistic of a characteristic or parameter of a process node. TREND: The movement of a process in an increasing or decreasing direction. VARIABLES DATA: A measure of a characteristic where every value within a given interval is possible. VARIATION: The differenc
46、e among individual outputs of a process. The sources of variation can be grouped into two major classes: common causes and special causes. YIELD: The number of units that pass some inspection criteria divided by the number submitted. 9 EIA-557-B Annex B: References Military Specifications and Requir
47、ements MIL-PRF-38534 Hybrid Microcircuits, General Specification for MIL-HDBK-683 Statistical Process Control (SPC) Implementation and Evaluation Aid MIL-PRF-38535 Integrated Circuits (Microcircuits) Manufacture, General Specification for MIL-PRF-19500 Semiconductor Devices, General Specification fo
48、r MIL-STD-790 Standard Practice for Established Reliability and High Reliability Qualified Products List (QPL) Systems for Electrical, Electronic and Fiber Optic Parts Specifications Industry Standards ISO 10012 Measurement Management Systems - Requirements for Measurement Processes and Measuring Eq
49、uipment ANSI/ISO/ASQ A3534-2 Statistics Vocabulary and Symbols Statistical Quality Control ANSI/ISO/ASQ Q9000 Quality Management Systems Fundamentals and Vocabulary ANSI/ASQ M1 American National Standard for Calibration Systems ANSI/ISO/ASQ Q9001 Quality Management Systems Requirements ANSI/ISO/ASQ Q9004 Quality Management Systems Guidelines for performance Improvements EIA-738 Guideline on the Use and Application of Cpk IPC-9191 G
