1、 IEC 60749-7 Edition 2.0 2011-06 INTERNATIONAL STANDARD NORME INTERNATIONALE Semiconductor devices Mechanical and climatic test methods Part 7: Internal moisture content measurement and the analysis of other residual gases Dispositifs semiconducteurs Mthodes essais mcaniques et climatiques Partie 7:
2、 Mesure de la teneur en humidit interne et analyse des autres gaz rsiduels IEC 60749-7:2011 THIS PUBLICATION IS COPYRIGHT PROTECTED Copyright 2011 IEC, Geneva, Switzerland All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized in any form or by any
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16、entaires sur cette publication ou si vous avez des questions, visitez le FAQ du Service clients ou contactez-nous: Email: csciec.ch Tl.: +41 22 919 02 11 Fax: +41 22 919 03 00 IEC 60749-7 Edition 2.0 2011-06 INTERNATIONAL STANDARD NORME INTERNATIONALE Semiconductor devices Mechanical and climatic te
17、st methods Part 7: Internal moisture content measurement and the analysis of other residual gases Dispositifs semiconducteurs Mthodes essais mcaniques et climatiques Partie 7: Mesure de la teneur en humidit interne et analyse des autres gaz rsiduels INTERNATIONAL ELECTROTECHNICAL COMMISSION COMMISSI
18、ON ELECTROTECHNIQUE INTERNATIONALE L ICS 31.080.01 PRICE CODE CODE PRIX ISBN 978-2-88912-532-6 Registered trademark of the International Electrotechnical Commission Marque dpose de la Commission Electrotechnique Internationale 2 60749-7 IEC:2011 CONTENTS FOREWORD . 3 1 Scope . 5 2 Normative referenc
19、es . 5 3 Terms and definitions . 5 4 Test apparatus . 5 4.1 Mass spectrometer method . 5 4.2 Mass spectrometer 5 4.2.1 Spectra range 5 4.2.2 Detection limit . 6 4.2.3 System calibration . 6 4.2.4 Calibration for other gases 6 4.2.5 Daily calibration check . 7 4.2.6 Substitution . 7 4.2.7 Precision t
20、uning . 7 4.2.8 Record keeping . 7 4.3 Vacuum opening chamber . 7 4.4 Piercing arrangement 7 4.5 Pressure-sensing device . 7 5 Procedure 8 6 Failure criteria 9 7 Implementation . 9 8 Summary 10 Bibliography 11 60749-7 IEC:2011 3 INTERNATIONAL ELECTROTECHNICAL COMMISSION _ SEMICONDUCTOR DEVICES MECHA
21、NICAL AND CLIMATIC TEST METHODS Part 7: Internal moisture content measurement and the analysis of other residual gases FOREWORD 1) The International Electrotechnical Commission (IEC) is a worldwide organization for standardization comprising all national electrotechnical committees (IEC National Com
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32、ional Standard IEC 60749-7 has been prepared by IEC technical committee 47: Semiconductor devices. This second edition cancels and replaces the first edition published in 2002 and constitutes a technical revision. This second edition has been completely re-written so as to align it with the text of
33、the latest versions of MIL-STD-750, method 1018 and MIL-STD-883, method 1018. The main change is the removal of the two alternative methods formerly designated method 2 and method 3. 4 60749-7 IEC:2011 The text of this standard is based on the following documents: FDIS Report on voting 47/2087/FDIS
34、47/2098/RVD Full information on the voting for the approval of this standard can be found in the report on voting indicated in the above table. This publication has been drafted in accordance with the ISO/IEC Directives, Part 2. A list of all parts in the IEC 60749 series, under the general title Se
35、miconductor devices Mechanical and climatic test methods, can be found on the IEC website. The committee has decided that the contents of this publication will remain unchanged until the stability date indicated on the IEC web site under “http:/webstore.iec.ch“ in the data related to the specific pu
36、blication. At this date, the publication will be reconfirmed, withdrawn, replaced by a revised edition, or amended. 60749-7 IEC:2011 5 SEMICONDUCTOR DEVICES MECHANICAL AND CLIMATIC TEST METHODS Part 7: Internal moisture content measurement and the analysis of other residual gases 1 Scope This Intern
37、ational Standard specifies the testing and measurement of water vapour and other gas content of the atmosphere inside a metal or ceramic hermetically sealed device. The test is used as a measure of the quality of the sealing process and to provide information about the long-term chemical stability o
38、f the atmosphere inside the package. It is applicable to semiconductor devices sealed in such a manner but generally only used for high reliability applications such as military or aerospace. This test is destructive. 2 Normative references The following referenced documents are indispensable for th
39、e application of this document. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document (including any amendments) applies. None 3 Terms and definitions For the purposes of this document, the following terms and definitions apply. 3
40、.1 parts per million by volume ppmv the concentration of one substance in another substance expressed as a ratio of parts of the one substance in a million parts of the other substance, measured by volume 4 Test apparatus 4.1 Mass spectrometer method This method measures the water vapour content of
41、the device atmosphere by mass spectro- metry. The apparatus is detailed below. 4.2 Mass spectrometer The mass spectrometer shall be capable of meeting the requirements of 4.2.1 to 4.2.2 and shall be calibrated in accordance with 4.2.3 to 4.2.8. 4.2.1 Spectra range The mass spectrometer shall be capa
42、ble of reading a minimum spectra range of 1 AMU to 100 AMU (atomic mass units). 6 60749-7 IEC:2011 4.2.2 Detection limit The mass spectrometer shall be capable of reproducibly detecting the specified moisture content for a given volume package with a signal-to-noise ratio of 20:1 (i.e. for a specifi
43、ed limit of 5 000 ppmv, 0,01 ml, the mass spectrometer shall demonstrate a 250 ppmv minimum detection limit to moisture for a package volume of 0,01 ml). The smallest volume shall be considered the worst case. 4.2.3 System calibration The mass spectrometer shall be calibrated annually with a moistur
44、e level in the 4 500 ppmv to 5 500 ppmv range, with a moisture level in the 2 000 ppmv to 3 000 ppmv range and with a moisture level in the 7 000 ppmv to 8 000 ppmv range using the same sensitivity factor. This calibration needs to be performed for each calibrator volume to demonstrate a linear resp
45、onse and to detect offset. A minimum of three data points for each moisture level shall be collected. Package simulators which have the capability of generating at least three known volumes of gas 10 % on a repetitive basis by means of a continuous sample volume purge of known moisture content 5 % s
46、hall be used. Moisture content shall be established by the standard generation techniques (i.e. double pressure, divided flow, or cryogenic method). The dew point hygrometer shall be recalibrated a minimum of once a year using equipment traceable to national standards or by a suitable commercial cal
47、ibration services laboratory using equipment traceable to national standards. The dew point hygrometer shall be capable of measuring the dew point temperature to within an accuracy of 0,2 C. The system shall have a pressure sensor to measure the pressure in line with the temperature dew point sensor
48、 to an accuracy of 300 Pa for the range of pressure being used. In addition, the test laboratory shall have a procedure to calculate the concentration of moisture, in units of parts per million by volume, from the dew point temperature measurement and the pressure measurement. Gas analysis results o
49、btained by this method shall be considered valid only in the moisture range or limit bracketed by at least two (volume or concentration) calibration points (i.e. 5 000 ppmv between 0,01 ml to 0,1 ml or 1 000 ppmv to 5 000 ppmv between 0,01 ml to 0,1 ml). A best fit curve shall be used between volume calibration points. Systems not capable of bracketing may use an equivalent procedure as approved by the customer o
