ASTM E1523-2015 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy《采用X射线光电子能谱的电荷控制和电荷参照技术的标准指南》.pdf
《ASTM E1523-2015 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy《采用X射线光电子能谱的电荷控制和电荷参照技术的标准指南》.pdf》由会员分享,可在线阅读,更多相关《ASTM E1523-2015 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy《采用X射线光电子能谱的电荷控制和电荷参照技术的标准指南》.pdf(9页珍藏版)》请在麦多课文档分享上搜索。
1、Designation: E1523 09E1523 15Standard Guide toCharge Control and Charge Referencing Techniques inX-Ray Photoelectron Spectroscopy1This standard is issued under the fixed designation E1523; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revi
2、sion, the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This guide acquaints the X-ray photoelectron spectroscopy (XPS) user with the various charge control
3、 and charge shiftreferencing techniques that are and have been used in the acquisition and interpretation of XPS data from surfaces of insulatingspecimens and provides information needed for reporting the methods used to customers or in the literature.1.2 This guide is intended to apply to charge co
4、ntrol and charge referencing techniques in XPS and is not necessarily applicableto electron-excited systems.1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.1.4 This standard does not purport to address all of the safety co
5、ncerns, if any, associated with its use. It is the responsibilityof the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatorylimitations prior to use.2. Referenced Documents2.1 ASTM Standards:2E673 Terminology Relating to Surface Ana
6、lysis (Withdrawn 2012)3E902 Practice for Checking the Operating Characteristics of X-Ray Photoelectron Spectrometers (Withdrawn 2011)3E1078 Guide for Specimen Preparation and Mounting in Surface AnalysisE1829 Guide for Handling Specimens Prior to Surface Analysis3. Terminology3.1 DefinitionsSee Term
7、inology E673 for definitions of terms used in XPS.3.2 Symbols:BE Binding energy, in eVBEcorr Corrected binding energy, in eVBEmeas Measured binding energy, in eVBEref Reference binding energy, in eVBEmeas, ref Measured Binding energy, in eV, of a reference lineFWHM Full width at half maximum amplitu
8、de of a peak in thephotoelectron spectrum above the background, in eVXPS X-ray photoelectron spectroscopycorr Correction energy, to be added to measured bindingenergies for charge correction, in eV4. Overview of Charging Effects4.1 For insulating specimen surfaces, the emission of photoelectrons fol
9、lowing X-ray excitation may result in a temporary (orsometimes persistent) buildup of a positive surface charge caused by the photoelectric effect. Its insulating nature prevents thecompensation of the charge buildup by means of electron conduction from the sample holder. This positive surface charg
10、e changesthe surface potential thereby shifting the measured energies of the photoelectron peaks to higher binding energy. This binding1 This guide is under the jurisdiction of ASTM Committee E42 on Surface Analysis and is the direct responsibility of Subcommittee E42.03 on Auger ElectronSpectroscop
11、y and X-Ray Photoelectron Spectroscopy.Current edition approved May 1, 2009June 1, 2015. Published June 2009June 2015. Originally approved in 1993. Last previous edition approved in 20032009 asE1523 03.E1523 09. DOI: 10.1520/E1523-09.10.1520/E1523-15.2 For referencedASTM standards, visit theASTM web
12、site, www.astm.org, or contactASTM Customer Service at serviceastm.org. For Annual Book of ASTM Standardsvolume information, refer to the standards Document Summary page on the ASTM website.3 The last approved version of this historical standard is referenced on www.astm.org.This document is not an
13、ASTM standard and is intended only to provide the user of an ASTM standard an indication of what changes have been made to the previous version. Becauseit may not be technically possible to adequately depict all changes accurately, ASTM recommends that users consult prior editions as appropriate. In
14、 all cases only the current versionof the standard as published by ASTM is to be considered the official document.Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States1energy shift may reach a nearly steady-state value of between 2 and 5 eV
15、 for spectrometers equipped with nonmonochromaticX-ray sources. The surface potential charge and the resulting binding energy shift is, generally, larger for spectrometers equippedwith monochromatic X-ray sources because of the, generally, lower flux of low-energy electrons impinging on the specimen
16、surface. This lower flux arises because focused, monochromatic X-ray beams irradiate only a portion of the specimen and not othernearby surfaces (for example, the specimen holder) that are sources of low-energy electrons. The absence of an X-ray window inmany monochromatic X-ray sources (or a greate
17、r distance of the specimen from the X-ray window) also eliminates another sourceof low-energy electrons.4.2 The amount of induced surface charge, its distribution across the specimen surface, and its dependence on experimentalconditions are determined by several factors including specimen compositio
18、n, homogeneity, magnitude of surface conductivity,total photoionization cross-section, surface topography, spatial distribution of the exciting X-rays, and availability of neutralizingelectrons. Charge buildup is a well-studied (1, 2)4, three dimensional phenomenon that occurs along the sample surfa
19、ce and intothe material. The presence of particles on or different phases in the specimen surface may result in an uneven distribution of chargeacross the surface, a phenomenon known as differential charging. Charge buildup may also occur at phase boundaries or interfaceregions within the depth of t
20、he sample that is impacted by X-ray radiation.4.3 Several techniques have been developed for the purpose of controlling charge buildup and the subsequent changes in surfacepotential in order to obtain meaningful and reproducible data from insulating specimens. These techniques are employed duringthe
21、 data acquisition and are discussed in 7.2.4.4 Several techniques have been developed for the purpose of correcting the binding energy shifts that result from surfacecharging. These corrections are performed after the data has been accumulated and are discussed in 7.3.4.5 The use of the various char
22、ge control or charge referencing techniques described in this guide may depend on the availableinstrument as well as the specimen being analyzed.4.6 Specimens with non-insulating surfaces are those with a high enough electron conductivity to dynamically compensate theelectron loss caused by the phot
23、oelectric effect; they neither require control of the surface charge buildup nor charge referencecorrections. It is important to distinguish the shifts due to the temporary charge build caused by the photoelectric effect fromintrinsic charging effects. Intrinsic effects, such as the accumulation of
24、charge at an interface during film growth, influence thenature of spectra obtained and the BEs measured, but are part of the sample (3). It is also possible that the impinging of the X-raychanges the charge distribution by means of volatilization of certain chemical species or the creation or charge
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