1、 KSKSKSKS KS D ISO 19318SKSKSKS KSKSKS SKSKS KSKS SKS KS X KS D ISO 19318： 2005 2005 12 28 D ISO 19318：2005 ( ) ( ) ( ) ： ：2005 12 28 20051007 ： ： ( ) ( 02 5097292 5) . 7 5 , . ICS 71.040.40 KS D ISO 19318：2005 X Surface chemical analysis X-ray photoelectron spectroscopy Reporting of methods used fo
2、r charge control and charge correction 2003 ISO 19318 Surface chemical analysisX-ray photoelectron spectroscopy Reporting of methods used for charge control and charge correction . 1. X ( .) . . 2. KS D ISO 18115 5 . 3. BE (eV) (eV) BEcorrBE (eV) measBE (eV) refFWHM (eV) XPS X (eV) corr4. 4.1 XPS A.
3、2 . XPS . 4.2 A.2 (electron flood gun), . 4.3 6 (mounting) , . ASTM7, 8 (ISO/TC 201/SC 2 ISO ) Guide E 1078 Guide E 1829 . 5. X KS D ISO 15472： X D ISO 19318：2005 9 , . 6. A.2 . . 6.1 6.1.1 . , , 2 . 1. 2. 3. 6.1.2 . ( , ) . 6.1.3 1, 2. , . 1. 2. , 1 mL 3. xyz 4. 6.1.4 XPS / . . 6.2 XPS , X , X , ,
4、3d5/2 (FWHM) , X , . 6.3 . 1. 2. 3. 4. XPS . 6.4 . 1. . . 2. . 2 D ISO 19318：2005 . (flux) . 3. . , . . 6.5 . 5 V, 20 mA, 5 cm . 6.6 . , , FWHM (BEmeas) . BE FWHM FWHM . Si 2p FWHM 2.4 eV 1.6 eV . 1.6 eV Si SiO2 . . 2 . . 7. A.3 . . 7.1 ( ) , . 7.2 ( corr) , . . (BEmeas) (BEref) . = BEcorr ref BE (1
5、) meas (BEcorr) (BE ) . measBE = BE (2) corr meas corr 7.2 . 3 D ISO 19318：2005 A() A.1 A.2 ( , ), A.3 ( , ), A.4 . , . ( , ) . , A.5 . XPS A.2.4.2 A.2.4.3 . , , , , (topography), X , . 1, 2 . , . X . , X , / . 3. 1990 , , . . , . , 27 0.15 eV 4. 2000 , . A.2 . . . A.2.1 1013 XPS, X . , , , , , . ,
6、 10 eV ) . , . 14, 15. A.2.2 16 ( ) . A.2.3 , 4 D ISO 19318：2005 2. . A.2.4 A.2.4.1 . , 2. A.2.4.2 , (differential) . / 17, ( ). A.2.4.3 (biasing) ( 10 V 10 V ) , ( ) . XPS . , . ( , Au 4f C 1s) 6, 16, 18. ( ) , . , . ( A.4 ). A.2.5 , X 19. X . X . , ( ) . A.3 . ( ) . , . A.3.1 6, 10, 16, 2024 , .
7、 , . , C 1s . A.3.1.1 C 1s 284.6 eV 285 eV , (1) . , . A.3.1.2 , 10, 21, 22 C 1s 284.6 eV 285.2 eV . ( FWHM) 5 D ISO 19318：2005 . ( , ) , / . A.3.1.3 22. 1 C 1s 23. . , , 16. 2 C 1s FWHM . , . A.3.2 10, 11, 20, 2528 (calibrant) (0.5 0.7nm) . . . . A.4 , XPS . , Au . 1 . Au 4f 26, 27 , . . , ( ), ,
8、 ” . A.3.3 29 29. , . 30. A.3.4 20. . . . . A.3.5 . 3132. . A.4 18 A.4.1 , A.2 A.3 . ( A.3 ) (A.2) . (A.3.2) corr , . 18 , 6 D ISO 19318：2005 ( BEmeas ) . corr . A.4.2 , ( 1 mm 3 mm 25 nm) . XPS ( 10V ) . Au 4f7/2 BEmeas BE . , Au 4fmeas 7/2 XPS . (Fermi) 18. A.5 3335 ( ) 33. ( ). 2 . , 33, 34 . A.
9、5.1 . . , . A.5.2 , . . 7 D ISO 19318：2005 1 Cazaux, J.：Mechanisms of Charging in Electron Spectroscopy( ), Journal of Electron Spectroscopy and Related Phenomena, 1999 12, 105, 23, 155 185 2 Cazaux, J.：About the Charge Compensation of Insulating Samples in XPS(XPS ), Journal of Electron Spectroscop
10、y and Related Phenomena, 2000 12, 113, 1, 15 33 3 Bart, F., Guitter, M. J., Henriot, M., Thromat, N., Gautier, M., Durand, J. P.：Surface analysis of Wide Gap Insulators with XPS(XPS ), Journal of Electron Spectroscopy and Related Phenomena, 1994 10, 69, 3, 245 248 4 Unger, W. E. S., Gross, Th., Bose
11、 O., Lippitz, A., Fritz, Th., Gelius, U., VAMAS TWA2 Project A2： Evaluation of Static Charge Stabilization and Determination Methods in XPS on NonConducting Samples. Report on an Inter-laboratory Comparison( XPS . ), Surface and Interface Analysis, 2000 8 , 29, 8, 535 543 5 KS D ISO 18115 6 Dickins
12、on, T., Povey, A.F., Sherwood, P.M.A.：Differential Sample Charging in ESCA(ESCA ), Journal of Electron Spectroscopy and Related Phenomena, 1973 12, 2, 5, 441 447 7 ASTM Standard E 107897, Standard Guide for Procedures for Specimen Preparation and Mounting in Surface Analysis( ), Annual Book of ASTM
13、Standards 2002(ASTM, West Conshohocken, Pennsylvania, 2002), 3.06, 794 802 8 ASTM Standard E 182902, Standard Guide for Handling Specimens Prior to Surface Analysis( ), Annual Book of ASTM Standards 2002(ASTM, West Conshohocken, Pennsylvania, 2002), 3.06, 854 858 9 KS D ISO 15472 X 10 Swift, P., Shuttleworth, D., Seah, M.P.：Static Charge Referencing Techniques, in Practical Surface Analysis( ), ：D. Briggs M. P. Seah(John Wiley and Sons, Ltd., New York
