ASTM E2088-2006(2015) Standard Practice for Selecting Preparing Exposing and Analyzing Witness Surfaces for Measuring Particle Deposition in Cleanrooms and Associated Controlled En.pdf

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1、Designation: E2088 06 (Reapproved 2015)Standard Practice forSelecting, Preparing, Exposing, and Analyzing WitnessSurfaces for Measuring Particle Deposition in Cleanroomsand Associated Controlled Environments1This standard is issued under the fixed designation E2088; the number immediately following

2、the designation indicates the year oforiginal adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This practice is inten

3、ded to assist in the selection,preparation, exposure, and analysis of witness surfaces for thepurpose of characterizing particle deposition rates in clean-rooms and associated controlled environments, particularly foraerospace applications.1.2 Requirements may be defined in terms of particle sizedis

4、tribution and count, percent area coverage, or productperformance criteria such as optical transmission or scatter.Several choices for witness surfaces are provided.1.3 The values stated in SI units are to be regarded asstandard. No other units of measurement are included in thisstandard.1.4 This st

5、andard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2. Referenced Documents (N

6、ote 1)2.1 ASTM Standards:2E1216 Practice for Sampling for Particulate Contaminationby Tape LiftF24 Test Method for Measuring and Counting ParticulateContamination on SurfacesF312 Test Methods for Microscopical Sizing and CountingParticles from Aerospace Fluids on Membrane Filters2.2 ISO Standard:ISO

7、 14644-1 Cleanrooms and Associated ControlledEnvironmentsPart 1: Classification of Air Cleanliness32.3 Government Standards:Fed-Std-209 Airborne Particulate Cleanliness Classes inCleanrooms and Clean Zones4IEST-STD-CC1246 Product Cleanliness Levels and Con-tamination Control Program5NOTE 1The Instit

8、ute of Environmental Sciences and Technology hasseveral Recommended Practices which may also be useful.3. Terminology3.1 Definitions:3.1.1 bidirectional reflectance distribution function(BRDF)the scattering properties of light reflected offsurfaces, expressed as the ratio of differential outputs ofr

9、adiance divided by differential inputs of radiance. Surfacecontaminants scatter the incident radiation in all directions andwith variable intensities. The BRDF is a method to quantify thespatial distribution of the scattered energy.3.1.2 cleanliness levelan established maximum allowableamount of con

10、tamination in a given area or volume, or on acomponent.3.1.3 cleanrooman environmentally conditioned area inwhich temperature, humidity, and airborne contaminants arecontrolled by design and operation. High-efficiency particulateair (HEPA) filters or better are usually required to achieve theair cle

11、anliness level. Air particulate cleanliness is classified inaccordance with Fed-Std-209 or ISO 14644-1.3.1.4 contaminantunwanted molecular and particulatematter that could affect or degrade the performance of thecomponents upon which they reside.1This practice is under the jurisdiction of ASTM Commi

12、ttee E21 on SpaceSimulation and Applications of Space Technology and is the direct responsibility ofSubcommittee E21.05 on Contamination.Current edition approved May 1, 2015. Published June 2015. Originallyapproved in 2000. Last previous edition approved in 2011 as E2088 06(2011).DOI: 10.1520/E2088-

13、06R15.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.3Available from American National Standards Institute (

14、ANSI), 25 W. 43rd St.,4th Floor, New York, NY 10036, http:/www.ansi.org.4Although Fed-Std-209 has been cancelled, it still may be used and designationsin Fed-Std-209 may be used in addition to the ISO designations.5Available from Institute of Environmental Sciences and Technology (IEST),Arlington Pl

15、ace One, 2340 South Arlington Heights Road, Suite 100, ArlingtonHeights, IL 60005-4516, http:/www.iest.org.Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959. United States13.1.5 contaminationa process of contaminating.3.1.6 contamination controlorgani

16、zed action to controlthe level of contamination.3.1.7 controlled areaan environmentally controlled area,operated as a cleanroom, but without the final stage of HEPA(or better) filters used in cleanrooms.3.1.8 critical surfaceany surface of an item or productwhich is required to meet established clea

17、nliness level require-ments.3.1.9 demonstrated equivalencethe condition in which amethod of measurement has passed a series of tests to showthat it gives equivalent results to those of a standard measure-ment.3.1.10 environmentally controlled areacleanrooms, con-trolled areas, good housekeeping area

18、s, and other enclosuresthat are designed to protect hardware from contamination.Cleanliness is achieved by controlling air purity, temperature,humidity, materials, garments, and personnel activities.3.1.11 fibera particle 100 m in length with a length todiameter ratio of ten or more.3.1.12 image ana

19、lysisthe measurement of size, shape,number, position, orientation, brightness, and other parametersof small objects using the combination of a microscope, animaging sensor, and a dedicated computer system. Imageanalysis can be used to perform particle counts or measureparticle dimensions automatical

20、ly, with far greater accuracythan manual techniques.3.1.13 micrometre (m)a unit of measurement equal toone millionth of a metre, or approximately 39 millionths of aninch, for example, 25 m is approximately 0.001 in. The term“micron” has been used but is not a recommended SI unit.3.1.14 nonvolatile r

21、esidue (NVR)soluble material remain-ing after evaporation of a filtered volatile fluid or precipitatefrom a gas phase, usually reported in milligrams per unit area(or volume).3.1.15 particle depositionthe settling of airborne particlesonto surfaces resulting from electrostatic or dynamicconditions,

22、or both, in cleanrooms or other controlled environ-ments.3.1.16 particle fallout (PFO)a standard particle depositionmethod used by the European aerospace community that usesblack glass witness surfaces and measures particle scatter inparts per million.63.1.17 particle size(1) the apparent maximum li

23、near di-mension of a particle in the plane of observation, as observedwith an optical microscope; (2 ) the equivalent diameter of aparticle detected by automatic instrumentation. The equivalentdiameter is the diameter of a reference sphere having knownproperties and producing the same response in th

24、e sensinginstrument as the particle being measured; (3) the diameter ofa circle having the same area as the projected area of a particle,in the plane of observation, observed by image analysis; (4) thesize defined by the measurement technique and calibrationprocedure.3.1.18 particulate contamination

25、discrete mass of solidmatter, size often measured in micrometres (m), whichadversely affects critical surfaces of component and hencesystem performance.3.1.19 percent area coverage (PAC)fraction of the surfacethat is covered by particles, reported in percent as total particleprojected area divided b

26、y total area of the surface.3.1.20 precision cleaningcleaning of hardware surfacesapproved by established facility methods or methods specifiedor provided by the customer with verification to a specifiedcleanliness level.3.1.21 visibly cleanabsence of particulate or molecularcontaminants when viewed

27、 from a specified distance withnormal (or corrected to normal) vision with a specifiedillumination level.3.1.22 witness surface (WS)a contamination-sensitivematerial used instead of direct evaluation of a specific surfacewhen that surface is either inaccessible or is too sensitive to behandled.3.1.2

28、2.1 optical witness surface (OWS)witness surfacefrom which contaminants may be analyzed by optical methods.3.1.22.2 particle witness surface (PWS)witness surfacefrom which particulate contaminants may be analyzed bystandard optical or electron microscopic methods.4. Summary of Practice4.1 Particle d

29、eposition in controlled environments is deter-mined by collecting particles on a clean witness surface for aspecified period of time or operational activity, then retrievingthe witness surface and quantifying the particle populationcollected.4.2 Witness surfaces (WS) are typically surfaces that lend

30、themselves to traditional microscopic or image analysis tech-niques for sizing and counting particles on the surface, but maybe an optical surface that is evaluated on the basis of thechange in its optical properties or may be a witness surface thatbest represents the surface material of interest wh

31、ich issubsequently evaluated by extracting a sample from the surfaceand sizing and counting particles removed from the witnesssurface.4.3 This practice does not address real time particle depo-sition measurements involving particle counters on site withcontinuous recording over a specified period of

32、 time.5. Significance and Use5.1 This practice provides a standard approach to measuringparticle deposition, or fallout, in cleanrooms and other con-trolled environments. It is based on the use of a witness surfaceto collect particles that deposit from the surrounding environ-ment and subsequently s

33、izing and counting the particles by6The Euramark Model 255 PFO photometer has been found to be satisfactory.The sole source of supply of the apparatus known to the committee at this time isEuramark, 834 East Rand Rd., Unit 6, Box 823, Mt. Prospect, IL 60056. If you areaware of alternative suppliers,

34、 please provide this information to ASTM Interna-tional Headquarters. Your comments will receive careful consideration at a meetingof the responsible technical committee,1which you may attend.E2088 06 (2015)2conventional methods. Several options are introduced, withlimitations and guidelines for sel

35、ecting the best choice for theintended application.5.2 This practice is applicable across numerous industriesincluding aerospace, microelectronics, and pharmaceuticals.6. Selecting Witness Surfaces6.1 Considerations for selecting WS include available meth-ods of analysis, precision and accuracy requ

36、ired, size ofparticles of concern, actual material of critical surfaces ofconcern, and cost. Preferably, the WS should be a surfacematerial which best represents the actual critical surface andshould be analyzed using the method which best represents theactual performance characteristics of interest

37、. Additionally,certain surfaces may become charged, especially in dryenvironments, and this charging can effect the particle deposi-tion. If WS are to monitor a vacuum environment they must bemade of low-outgassing, vacuum-compatible materials andheld securely in vacuum-compatible, low-particle shed

38、dingholders.6.2 Microscopic EvaluationWhen microscopic sizing andcounting of particles is the planned method of analysis, selectone of the following PWS, each of which is easily evaluateddirectly after exposure. Microscopic sizing and counting shallbe performed in accordance with Method F24 or Test

39、MethodsF312.6.2.1 Membrane Filters, should be gridded for ease inmicroscopic particle counting and precleaned before exposure.Amembrane filter can be prepared as either a tacky or tack-freesurface. The membrane filter is cleaned and then either (1)immediately placed in a cleaned petri dish, (2) dipp

40、ed intotrichloroethylene or methyl chloroform first so it will fuse tothe plastic petri dish, or (3) dipped into a prefiltered tackyadhesive and dried in a cleaned petri dish. The petri dish is thencovered and transported to the area being tested.6.2.2 Gridded Counting Slides, such as those used in

41、Prac-tice E1216 may be used as WS. After exposure, a pressure-sensitive tape is applied to the slide to encapsulate thedeposited particles before moving them to a microscope foranalysis.6.2.3 Stainless or Other Surfaces, other materials may beselected as WS based on specific needs for durability or

42、to bestrepresent the actual surface materials of interest. For thesePWS, particles are subsequently extracted from the surfacewith a fluid, filtered to collect the particles on a griddedmembrane, and subsequently analyzed microscopically. Note,the efficiency of the extraction method must be known or

43、estimated.6.3 Other Particle Sizing and Counting MethodsParticlecharacterization can also be performed using optical measure-ments other than manual microscopic methods. Highly pol-ished surfaces serve as WS and are selected based on theanalysis method chosen.6.3.1 The PFO instrument uses a smooth b

44、lack glass plate40 by 45 mm protected from unintentional sedimentation by aplate holder. The effective sampling surface is circular with adiameter of 25 mm.6.3.2 Silicon wafers or disks shall be selected for imageanalysis or other surface scanning methods.6.4 Optical Witness Surfaces, (that is, mirr

45、ors or lenses)shall be selected to best represent the critical surface of interestin the environment being evaluated. Reflectance or transmis-sion measurements shall be made in the wavelengths ofinterest, and the OWS must be the correct size and shape forthe instrumentation planned for use.6.5 Gravi

46、metric MethodsA gravimetric method can alsobe used, whereby a large witness surface is rinsed with solventto extract the particles, filtered onto a dry, preweighed mem-brane filter, and then dried and reweighed on a laboratorybalance with a resolution of 0.01 mg. The difference in weightcan be a rel

47、ative quantitative analysis of deposition based onweight. Note, the efficiency of the extraction method must beknown or estimated. A preweighed membrane filter could alsobe used as the witness surface thus eliminating the extractionstep. Additionally, a quartz crystal microbalance with adhesivesurfa

48、ces can measure accumulated mass in situ.7. Preparation of Witness Surfaces7.1 Witness Surface HoldersHolders should be designedto retain the witness surface securely and maximize the surfaceexposure. They should be made from smooth, cleanablematerials such as plastic, anodized aluminum, or stainles

49、s steel.A noncontact, easily removable, protective cover is requiredwhich prevents the collection of particulate contaminationduring transport of the surfaces between the test laboratory andthe controlled environment being evaluated. Holders shouldhave captive fasteners and tethers to prevent the holder orassociated hardware from impacting critical surfaces ifdropped. Holders should also be designed to be secured in thefacility being evaluated in either a vertical or horizontalorientation.7.2 Cleaning of HoldersHolders should be precisioncleaned

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