1、Designation: E3001 15Standard Practice forWorkforce Education in Nanotechnology Characterization1This standard is issued under the fixed designation E3001; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the year of last revision.
2、A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This practice describes a procedure to provide the basiceducation of characterization methods for nanometer-scalematerials, to be tau
3、ght at an undergraduate college level. Thiseducation should be broad and include a suite of characteriza-tion methods to prepare an individual to work in variouscapacities within one of the many areas in nanotechnologyresearch, development, or manufacturing.1.2 This practice may be used to develop o
4、r evaluate aneducation program for characterization in the nanotechnologyfield. It provides listings of key methods that are relevant tosuch a program, with a minimum number of these methods tobe taught as a requirement for such an education. This practicedoes not provide specific course material to
5、 be used in such aprogram.1.3 While no units of measurements are used in thispractice, values stated in SI units are to be regarded asstandard.1.4 This standard does not purport to address all of thesafety concerns, if any, associated with its use. It is theresponsibility of the user of this standar
6、d to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.1.5 This standard does not purport to address all of thecharacterization methods for nanometer-scale materials, nor isit meant for use in certification processes. It is the
7、 responsi-bility of the user of this standard to utilize other knowledge andskill objectives as applicable to local conditions or required bylocal regulations.2. Referenced Documents2.1 ASTM Standards:2E2456 Terminology Relating to Nanotechnology2.2 Other Standards:BSI PAS 133 Terminology for Nanosc
8、ale Measurement andInstrumentation3ISO/TS 27687 Nanotechnologies Terminology and Defi-nitions for Nano-Objects Nanoparticle, Nanofibre, andNanoplate4ISO/TS 80004-6 Nanotechnologies Vocabulary Part 6:Nano-Object Characterization43. Terminology3.1 Definitions:3.1.1 For definitions of terms related to
9、nanotechnology ingeneral, refer to Terminology E2456 and ISO/TS 27687.3.1.2 For definitions of terms related to measurement meth-ods and instrumentation used, refer to BSI PAS 133 andISO/TS 80004-6.3.2 Definitions of Terms Specific to This Standard:3.2.1 characterization, nmeasurement(s), using one
10、ormore methods, to determine the structure and composition of amaterial as well as its physical or chemical properties.3.2.2 education, nthe teaching of specific topics as part ofa degree or certificate program, or as training to provideadditional skills and knowledge.4. Summary of Practice4.1 This
11、practice designates a list of nineteen characteriza-tion methods to be relevant to nanotechnology workforceeducation. Methods are grouped into two tiers, with fivemethods classified as Tier 1 and the others as Tier 2. Methodselection and tier classification are based on inputs fromindustry, nanotech
12、nology educators, and subject matter ex-perts.4.2 From this list, five methods have been classified as Tier1. An educational program is to select at least three Tier 1methods to be taught in detail, and to teach the remaining twoTier 1 methods plus a minimum of five Tier 2 methods at anintroductory
13、level.NOTE 1Tier 1 methods are considered key. This requirement ensures1This practice is under the jurisdiction of ASTM Committee E56 on Nanotech-nology and is the direct responsibility of Subcommittee E56.02 on Physical andChemical Characterization.Current edition approved Jan. 1, 2015. Published M
14、arch 2015. DOI: 10.1520/E3001-15.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary page onthe ASTM website.3Available from British Stan
15、dards Institution (BSI), 389 Chiswick High Rd.,London W4 4AL, U.K., http:/.4Available from International Organization for Standardization (ISO), 1, ch. dela Voie-Creuse, CP 56, CH-1211 Geneva 20, Switzerland, http:/www.iso.org.Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Co
16、nshohocken, PA 19428-2959. United States1that all Tier1 methods are taught, even when there are practical timeconstraints on the quantity of instructional material that can be covered inan undergraduate-level program.4.3 This approach provides both a broad education as wellas in-depth emphasis for k
17、ey subjects within the time con-straints of an instructional course or program.5. Significance and Use5.1 This practice establishes the basic structure for educa-tion in the characterization of nanoscale materials at theundergraduate college level. The approach taken is to classifyspecific character
18、ization methods into two tiers, with a mini-mum number of methods to be selected from each tier andtaught at an in-depth or introductory level. This offers theflexibility of tailoring to regional industry needs while stillretaining a high degree of equivalency in educational depth andbreadth across
19、geographical boundaries.5.2 Workers may transition in their roles in the workplace.Participants in such education will have a broad understandingof a complement of characterization methods, thus increasingtheir marketability for jobs within as well as beyond thenanotechnology field.5.3 This practice
20、 is intended to be one in a series ofstandards developed for workforce education in various aspectsof nanotechnology. It will assist in providing an organization abasic structure for developing a program applicable to manyareas in nanotechnology, thus providing dynamic and evolvingworkforce educatio
21、n.6. General Background Knowledge and Skills6.1 Introductory algebra, chemistry, physics, and statistics atthe college level.6.2 The environmental, health and safety (EHS) hazardspresented by nanoscale materials can be very different fromthose presented by bulk materials. Students should have a basi
22、cunderstanding of the unique EHS factors when handlingnanoscale materials.6.3 Students should also have a basic knowledge of theunique physical and chemical properties of nanoscale materialsas compared to their bulk equivalents.7. Concepts and Skills to be Covered7.1 Characterization methods covered
23、 should include onesbased on electron beam, scanning probe, optical, ion beam, andX-ray techniques, as well as electrical, mechanical and thermalmeasurements. Method selection is based on inputs fromindustry, nanotechnology educators and subject matter experts.7.2 Usage of the appropriate methods fo
24、r a given type andquantity of material or sample will also be covered, togetherwith sample preparation and data analysis methodology.7.3 The methods relevant for workforce education in nano-technology characterization are given in Section 8, withimportant topics to be covered for each method listed
25、specifi-cally. Additional methods or topics, or both, may be added onan as-needed basis.8. Characterization Methods Relevant to NanotechnologyWorkforce Education8.1 Scanning Electron Microscopy (SEM) or Field Emission(FE) SEM, or Both:8.1.1 Vacuum system operation,8.1.2 Appropriate materials to be a
26、nalyzed,8.1.3 Magnification range,8.1.4 Sample preparation,8.1.5 Care of biological samples,8.1.6 Types of emission,8.1.7 Impact of beam energy and spot size,8.1.8 Detection of secondary electrons,8.1.9 Detection of backscattered electrons, and8.1.10 Corrections for astigmatism and aberration.8.2 Tr
27、ansmission Electron Microscopy (TEM):8.2.1 Vacuum system operation,8.2.2 Appropriate materials to be analyzed,8.2.3 Magnification range,8.2.4 Sample preparation and sample thinning methods,8.2.5 Care of biological samples,8.2.6 Bright field mode,8.2.7 Diffraction contrast,8.2.8 Impact of beam energy
28、, and8.2.9 Corrections for astigmatism and aberration.8.3 Energy Dispersive X-Ray Spectroscopy (EDS):8.3.1 Vacuum system operation,8.3.2 Appropriate materials to be analyzed,8.3.3 Electron beam source,8.3.4 X-ray detector,8.3.5 Spectrum and data analysis, and8.3.6 Detection limit.8.4 Scanning Probe
29、Microscopy (SPM):8.4.1 Atomic Force Microscopy (AFM):8.4.1.1 AFM tip technology and tip construction,8.4.1.2 Vibration isolation needs and solutions,8.4.1.3 Optical lever,8.4.1.4 Photodiode detector,8.4.1.5 Probe positioning mechanism,8.4.1.6 Cantilever spring constant and resonance frequency,8.4.1.
30、7 Sample preparation and mounting,8.4.1.8 Laser alignment on cantilever, and8.4.1.9 Modes of operation: contact, tapping, and non-contact.8.4.2 Scanning Tunneling Microscopy (STM):8.4.2.1 Tip and sample conductivity,8.4.2.2 Vibration isolation needs and solutions,8.4.2.3 Sample flatness,8.4.2.4 Prob
31、e positioning mechanism,8.4.2.5 Probe tip construction,8.4.2.6 Piezoelectric tube scanner,8.4.2.7 Feedback loop proportional-integral-derivative(PID) control,8.4.2.8 Cases needing ultra high vacuum measurements,and8.4.2.9 Range of operation.8.5 Profilometry:8.5.1 Appropriate materials to be analyzed
32、,E3001 1528.5.2 Range of operation,8.5.3 Calibration, and8.5.4 Stylus designs and stylus force.8.6 Raman Spectroscopy:8.6.1 Concept of operation,8.6.2 Appropriate materials to be analyzed, and8.6.3 Chemical bonds and Doppler interactions.8.7 Fourier Transform Infrared Spectroscopy (FTIR):8.7.1 Appro
33、priate materials to be analyzed,8.7.2 Sample preparation,8.7.3 Infrared emitter,8.7.4 Michelson interferometer operation,8.7.5 Overview of the theory of Fourier transforms, and8.7.6 Interferogram analysis.8.8 Spectrophotometry:8.8.1 Appropriate materials to be analyzed,8.8.2 Transmittance and reflec
34、tance mode, and8.8.3 Sample preparation and cuvettes.8.9 Optical Microscopy:8.9.1 Light Microscopy:8.9.1.1 Appropriate materials to be analyzed,8.9.1.2 Magnification range and resolution limits, and8.9.1.3 Brightfield and darkfield illumination.8.9.2 Fluorescence Microscopy:8.9.2.1 Light sources,8.9
35、.2.2 Application to biological samples, and8.9.2.3 Limitations.8.9.3 Scanning Confocal Microscopy:8.9.3.1 Scanning modes: laser scanning and spinning disc,and8.9.3.2 3-dimensional image reconstruction and multi-channel image overlay.8.10 Ellipsometry:8.10.1 Appropriate materials to be analyzed,8.10.
36、2 One-angle verses two-angle measurements, and8.10.3 Stoichiometric information.8.11 Contact Angle Measurement:8.11.1 Appropriate materials to be analyzed,8.11.2 Surface energy, and8.11.3 Relationship of surface energy for water and proteinadhesion and implications for biocompatibility.8.12 Auger El
37、ectron Spectroscopy (AES):8.12.1 Vacuum system operation,8.12.2 Electron transitions and the Auger Effect,8.12.3 Spectrum and data analysis,8.12.4 Instrumentation,8.12.5 Quantitative analysis, and8.12.6 Depth profile.8.13 Secondary-Ion Mass Spectroscopy (SIMS):8.13.1 Vacuum system operation,8.13.2 A
38、ppropriate materials to be analyzed,8.13.3 Element sensitivity range,8.13.4 Ion source:8.13.4.1 Ion beam selection and interaction with surface,8.13.4.2 Gaseous ionization by electron ionization,8.13.4.3 Surface ionization of Cs ions, and8.13.4.4 Liquid metal ionization.8.13.5 Static versus dynamic
39、measurement methods:8.13.5.1 Sputter rates.8.13.6 Types of emission,8.13.7 Impact of beam energy, and8.13.8 Sample charging and reduction of negative charge.8.14 X-Ray Photoelectron Spectroscopy (XPS):8.14.1 Vacuum system operation,8.14.2 Appropriate materials to be analyzed,8.14.3 X-ray source,8.14
40、.4 Electron detector,8.14.5 Spectrum and data analysis, and8.14.6 Detection limit.8.15 X-Ray Diffraction:8.15.1 X-ray generation and characteristics,8.15.2 Lattice planes and Braggs Law,8.15.3 Sample Preparation:8.15.3.1 Diffraction of powder samples, and8.15.3.2 Diffraction of thin film samples.8.1
41、5.4 Comparison with reference spectra:8.15.4.1 Elemental composition, and8.15.4.2 Lattice parameter.8.16 Electrical Measurements:8.16.1 Current versus voltage (I-V) measurements,8.16.2 Resistivity measurements, and8.16.3 Capacitance measurements.8.17 Mechanical Measurements:8.17.1 Mechanical propert
42、ies of materials,8.17.2 Appropriate materials to be analyzed,8.17.3 Measurement modes:8.17.3.1 Indentation, and8.17.3.2 Scratch.8.17.4 Data collection and analysis.8.18 Thermal Gravimetric Analysis (TGA):8.18.1 Principles of TGA,8.18.2 Appropriate materials to be analyzed,8.18.3 Sample preparation,
43、and8.18.4 TGA curve analysis.8.19 Dynamic Light Scattering (DLS):8.19.1 Principles of DLS,8.19.2 Appropriate materials to be analyzed,8.19.3 Sample preparation,8.19.4 Hydrodynamic diameter,8.19.5 Nanoparticle size analysis,8.19.6 Nanoparticle size distribution, and8.19.7 Effects of different ligands
44、 on nanoparticle propertiesmeasured.8.20 For the methods listed above, SEM, SPM, OpticalMicroscopy, EDS, and Ellipsometry are classified as Tier 1Methods. The other fourteen methods are classified as Tier 2Methods.NOTE 2Selection and ranking of the Tier 1 methods are based onpolling responses from i
45、ndustry, nanotechnology educators, and subjectmatter experts nationwide. They are considered to be the most widelyaccepted across the country as key characterization skills needed fortechnicians in the nanotechnology workforce.E3001 1539. Procedure9.1 The entity offering the education program shall
46、rank-order the Tier 1 Methods listed in 8.20, taking into account theskill-set needs of local industry, then select the top threemethods and teach them in detail.9.2 The other two methods shall be taught at an introductorylevel together with other selected Tier 2 Methods.9.3 Should local industry re
47、quests the teaching in detail of amethod not among the five Tier 1 Methods listed in thepractice, the entity offering the education program has theoption to add that method to the three it has selected in 9.1.9.4 From the fourteen Tier 2 Methods listed in Section 8, thestandard shall require the ent
48、ity offering the education programto select five to be taught at an introductory level. Including thetwo methods described in 9.2, this makes a total of sevenmethods being taught at an introductory level.9.5 Adiagrammatic illustration of the procedure is shown inFig. 1.10. Keywords10.1 characterizat
49、ion; nano; nanoscale materials; workforceeducationAPPENDIXES(Nonmandatory Information)X1. ABOUT NANOTECHNOLOGY WORKFORCE EDUCATION STANDARDSX1.1 The Nanotechnology Applications and CareerKnowledge NetworkX1.1.1 The development of this standard was initiated bythe Nanotechnology Applications and Career Knowledge(NACK) Network. The NACK Network5is a national center inthe Advanced Technical Education program funded by theNational Science Foundation. Its mission is to help create andsustain economically viable nanotechnology education at com-munity and tec
