BS EN ISO 14880-2-2007 Optics and photonics - Microlens arrays - Test methods for wavefront aberrations《光学和光子学 显微物镜系列 波像差的试验办法》.pdf

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1、 g49g50g3g38g50g51g60g44g49g42g3g58g44g55g43g50g56g55g3g37g54g44g3g51g40g53g48g44g54g54g44g50g49g3g40g59g38g40g51g55g3g36g54g3g51g40g53g48g44g55g55g40g39g3g37g60g3g38g50g51g60g53g44g42g43g55g3g47g36g58aberrationsThe European Standard EN ISO 14880-2:2006 has the status of a British StandardICS 31.260

2、Optics and photonics Microlens arrays Part 2: Test methods for wavefront BRITISH STANDARDBS EN ISO 14880-2:2006BS EN ISO 14880-2:2006This British Standard was published under the authority of the Standards Policy and Strategy Committee on 31 January 2007 BSI 2007ISBN 978-0-580-49965-4Amendments issu

3、ed since publicationAmd. No. Date Commentscontract. Users are responsible for its correct application.Compliance with a British Standard cannot confer immunity from legal obligations.National forewordThis British Standard was published by BSI. It is the UK implementation of EN ISO 14880-2:2006.The U

4、K participation in its preparation was entrusted to Technical Committee CPW/172, Optics and photonics.A list of organizations represented on CPW/172 can be obtained on request to its secretary.This publication does not purport to include all the necessary provisions of a EUROPEAN STANDARDNORME EUROP

5、ENNEEUROPISCHE NORMEN ISO 14880-2December 2006ICS 31.260English VersionOptics and photonics - Microlens arrays - Part 2: Test methodsfor wavefront aberrations (ISO 14880-2:2006)Optique et photonique - Rseaux de microlentilles - Partie2: Mthodes dessai pour les aberrations du front donde(ISO 14880-2:

6、2006)Optik und Photonik - Mikrolinsenarrays - Teil 2:Prfverfahren fr Wellenfrontaberrationen (ISO 14880-2:2006)This European Standard was approved by CEN on 12 November 2006.CEN members are bound to comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this Europ

7、eanStandard the status of a national standard without any alteration. Up-to-date lists and bibliographical references concerning such nationalstandards may be obtained on application to the Central Secretariat or to any CEN member.This European Standard exists in three official versions (English, Fr

8、ench, German). A version in any other language made by translationunder the responsibility of a CEN member into its own language and notified to the Central Secretariat has the same status as the officialversions.CEN members are the national standards bodies of Austria, Belgium, Cyprus, Czech Republ

9、ic, Denmark, Estonia, Finland, France,Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Romania,Slovakia, Slovenia, Spain, Sweden, Switzerland and United Kingdom.EUROPEAN COMMITTEE FOR STANDARDIZATIONCOMIT EUROPEN DE NORMA

10、LISATIONEUROPISCHES KOMITEE FR NORMUNGManagement Centre: rue de Stassart, 36 B-1050 Brussels 2006 CEN All rights of exploitation in any form and by any means reservedworldwide for CEN national Members.Ref. No. EN ISO 14880-2:2006: EForeword The text of ISO 14880-2:2006 has been prepared by Technical

11、 Committee ISO/TC 172 “Optics and optical instruments” of the International Organization for Standardization (ISO) and has been taken over as EN ISO 14880-2:2006 by Technical Committee CEN/TC 123 “Lasers and photonics“, the secretariat of which is held by DIN. This European Standard shall be given t

12、he status of a national standard, either by publication of an identical text or by endorsement, at the latest by June 2007, and conflicting national standards shall be withdrawn at the latest by June 2007. According to the CEN/CENELEC Internal Regulations, the national standards organizations of the

13、 following countries are bound to implement this European Standard: Austria, Belgium, Cyprus, Czech Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Romania, Slovakia, Slovenia

14、, Spain, Sweden, Switzerland and United Kingdom. Endorsement notice The text of ISO 14880-2:2006 has been approved by CEN as EN ISO 14880-2:2006 without any modifications. EN ISO 14880-2:2006Reference numberISO 14880-2:2006(E)INTERNATIONAL STANDARD ISO14880-2First edition2006-02-01Optics and photoni

15、cs Microlens arrays Part 2: Test methods for wavefront aberrations Optique et photonique Rseaux de microlentilles Partie 2: Mthodes dessai pour les aberrations du front donde EN ISO 14880-2:2006ii iiiContents Page Foreword iv Introduction v 1 Scope . 1 2 Normative references . 1 3 Terms and definiti

16、ons. 1 4 Symbols and abbreviated terms . 1 5 Apparatus 2 5.1 General. 2 5.2 Standard optical radiation source. 2 5.3 Standard lens 2 5.4 Collimator 2 5.5 Beam reduction optical system. 2 5.6 Aperture stop 3 6 Test principle. 3 7 Measurement arrangement 3 7.1 Measurement arrangement for single microl

17、enses 3 7.2 Measurement arrangement for microlens arrays 3 7.3 Geometrical alignment of the sample. 4 7.4 Preparation 4 8 Procedure 4 9 Evaluation 4 10 Accuracy 4 11 Test report . 5 Annex A (normative) Measurement requirements for test methods for microlenses. 6 Annex B (normative) Microlens test Me

18、thods 1 and 2 using Mach-Zehnder interferometer systems 8 Annex C (normative) Microlens test Methods 3 and 4 using a lateral shearing interferometer system 13 Annex D (normative) Microlens test Method 5 using a Shack-Hartmann sensor system 18 Annex E (normative) Microlens array test Method 1 using a

19、 Twyman-Green interferometer system 20 Annex F (normative) Measurement of uniformity of microlens array determined by test Method 2. 22 Bibliography . 25 EN ISO 14880-2:2006iv Foreword ISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (IS

20、O member bodies). The work of preparing International Standards is normally carried out through ISO technical committees. Each member body interested in a subject for which a technical committee has been established has the right to be represented on that committee. International organizations, gove

21、rnmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the International Electrotechnical Commission (IEC) on all matters of electrotechnical standardization. International Standards are drafted in accordance with the rules given in the ISO/IEC

22、Directives, Part 2. The main task of technical committees is to prepare International Standards. Draft International Standards adopted by the technical committees are circulated to the member bodies for voting. Publication as an International Standard requires approval by at least 75 % of the member

23、 bodies casting a vote. Attention is drawn to the possibility that some of the elements of this document may be the subject of patent rights. ISO shall not be held responsible for identifying any or all such patent rights. ISO 14880-2 was prepared by Technical Committee ISO/TC 172, Optics and photon

24、ics, Subcommittee SC 9, Electro-optical systems. ISO 14880 consists of the following parts, under the general title Optics and photonics Microlens arrays: Part 1: Vocabulary Part 2: Test methods for wavefront aberrations Part 3:Test methods for optical properties other than wavefront aberrations Par

25、t 4: Test methods for geometrical properties EN ISO 14880-2:2006vIntroduction This part of ISO 14880 specifies methods of testing wavefront aberrations for microlens arrays. Examples of microlens array applications include three-dimensional displays, coupling optics associated with arrayed optical r

26、adiation sources and photo-detectors, enhanced optics for liquid crystal displays, and optical parallel processor elements. The market in microlens arrays is generating an urgent need for agreement on basic terminology and test methods for a definition of the microlens array itself. Standard termino

27、logy and a clear definition are needed not only to promote applications but also to encourage scientists and engineers to exchange ideas and new concepts based on common understanding. Microlenses are used as single lenses and in arrays of two or more lenses. The characteristics of the lenses are fu

28、ndamentally evaluated with a single lens. Therefore, it is important that the basic characteristic of a single lens can be evaluated first. However, if a large number of lenses is formed on a single substrate, the measurement of the whole array will incur a lot of time and cost. Furthermore, methods

29、 for measuring lens shapes are essential as a production tool. Appraisal methods of the characteristic parameters are defined by ISO 14880-1, Vocabulary. It has been completed by a set of three other International Standards, i.e. Part 2, Test methods for wavefront aberrations, Part 3, Test methods f

30、or optical properties other than wavefront aberrations and Part 4, Test methods for geometrical properties. This part of ISO 14880 specifies methods for measuring wavefront quality. Wavefront quality is the basic performance characteristic of a microlens. Characteristics other than wavefront aberrat

31、ions are specified in ISO 14880-3 and ISO 14880-4. EN ISO 14880-2:2006blank1Optics and photonics Microlens arrays Part 2: Test methods for wavefront aberrations 1 Scope This part of ISO 14880 specifies methods for testing wavefront aberrations for microlenses within microlens arrays. It is applicabl

32、e to microlens arrays with very small lenses formed inside or on one or more surfaces of a common substrate. 2 Normative references The following referenced documents are indispensable for the application of this document. For dated references, only the edition cited applies. For undated references,

33、 the latest edition of the referenced document (including any amendments) applies. ISO 14880-1:2001, Optics and photonics Microlens arrays Part 1: Vocabulary 3 Terms and definitions For the purposes of this document, the terms and definitions given in ISO 14880-1 apply. 4 Symbols and abbreviated ter

34、ms Table 1 Symbols, abbreviated terms and units of measure Symbol Unit Term wavefront aberration P-V peak-to-valley value of wavefront aberration rms root-mean-square value of wavefront aberration m wavelength degree acceptance angle NA none numerical aperture EN ISO 14880-2:20062 5 Apparatus 5.1 Ge

35、neral The test system consists of a source of optical radiation, a collimator lens, a method of limiting the measurement aperture, a sample holding apparatus, imaging optics, an image sensor and an interference pattern analyser system. 5.2 Standard optical radiation source A source of optical radiat

36、ion shall be used, which is suitable for the testing of wavefront aberrations of microlenses. The aberrations of the wavefront at the operational wavelength impinging on the test equipment shall have a rms deviation of u /10 over the effective aperture of the microlens to be tested. Properties of th

37、e source to be specified include centre wavelength, half-width of the spectrum, the type of optical radiation source, states of polarization (randomly polarized optical radiation, linearly polarized optical radiation, circularly polarized optical radiation, etc.), radiance angle (in mrad), spot size

38、 or beam waist parameters. Otherwise, the specification of the radiation source shall be described in the documentation of the experimental results. NOTE 1 Usually, He-Ne gas lasers are used. Other gas lasers, solid-state lasers, semiconductor lasers (LD), and light emitting diodes (LED) are also us

39、ed. NOTE 2 LDs and LEDs are used together with a suitable optical wavefront aberration compensation system. 5.3 Standard lens Where a standard lens is used as a reference or for generating an ideal spherical wave, the wavefront aberrations of the standard lens shall be smaller by at least one order

40、of magnitude compared to that of the lens to be tested or shall be u /10 rms deviation. The objective lens of an optical microscope used as the standard lens shall be specified with the effective numerical aperture. The following shall be given: effective aperture; effective focal length at the oper

41、ational wavelength. The test geometry for the measurement of the wavefront aberrations is restricted to the case /f for the conjugates of the lens. 5.4 Collimator The collimator optics shall have a numerical aperture greater than the maximum numerical aperture of the test sample sufficient to avoid

42、effects due to diffraction. The wavefront aberrations shall be less than /20 rms deviation at the operational wavelength. Otherwise the specification used should be described in the test report. 5.5 Beam reduction optical system A telescopic system consisting of two positive lenses in an afocal arra

43、ngement is used for the adaptation of the beam cross-section to the array detector. The ratio of the focal lengths gives the reduction factor. NOTE The diameter of the evaluated lens area can be set to the effective aperture by software to avoid additional diffraction at a physical aperture. EN ISO

44、14880-2:200635.6 Aperture stop A physical stop is placed in the optical radiation beam of the test equipment to limit the diameter of the optical radiation beam incident on the lens to be tested. Alternatively the stop may be realized by a truncation software during evaluation. 6 Test principle The

45、wavefront aberrations of the test microlens shall be determined with an interferometer or another wavefront test device as described in the Annexes. When small-diameter Gaussian beams are used, care should be taken because geometrical optics does not apply to the propagation of such beams. The detec

46、tor surface shall be conjugate with the entrance or exit pupil of the test microlens. An aperture is used to analyse the data for the wave aberrations. The test method shall be chosen to suit the application. Single-pass applications require testing using single-pass interferometers. NOTE Modern int

47、erferometers use laser sources for considering the setting up of the interferometric test but it causes severe problems if a double-pass arrangement is chosen in reflected optical radiation, when Fizeau or Twyman-Green interferometers are used. All dielectric boundaries between lenses contribute to

48、spurious fringe patterns. Arrangements using transmitted optical radiation are less affected by spurious fringes than reflection type interferometers. It is preferable to use interferometers of the Mach-Zehnder or lateral shearing type or Shack-Hartmann arrangements in transmitted optical radiation.

49、 For the measurement of wave aberrations a single-pass geometry in transmitted optical radiation will therefore be the first choice for this aim. 7 Measurement arrangement 7.1 Measurement arrangement for single microlenses Interferometers or wavefront detectors shall be used to measure the transmitted wavefront of the microlens under test. Single-path interferometers such as Mach-Zehnder, lateral shearing or double-pass interferometers such as Fizeau, Twyman-Green, and Shack-Hartmann

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