1、BSI Standards PublicationBS ISO 15932:2013Microbeam analysis Analytical electron microscopy VocabularyBS ISO 15932:2013 BRITISH STANDARDNational forewordThis British Standard is the UK implementation of ISO 15932:2013.The UK participation in its preparation was entrusted to TechnicalCommittee CII/9,
2、 Microbeam analysis.A list of organizations represented on this committee can beobtained on request to its secretary.This publication does not purport to include all the necessaryprovisions of a contract. Users are responsible for its correctapplication. The British Standards Institution 2013. Publi
3、shed by BSI StandardsLimited 2013ISBN 978 0 580 75210 0ICS 01.040.37; 37.020Compliance with a British Standard cannot confer immunity fromlegal obligations.This British Standard was published under the authority of theStandards Policy and Strategy Committee on 31 December 2013.Amendments issued sinc
4、e publicationDate Text affectedBS ISO 15932:2013 ISO 2013Microbeam analysis Analytical electron microscopy VocabularyAnalyse par microfaisceaux Microscopie lectronique analytique VocabulaireINTERNATIONAL STANDARDISO15932First edition2013-12-15Reference numberISO 15932:2013(E)BS ISO 15932:2013ISO 159
5、32:2013(E)ii ISO 2013 All rights reservedCOPYRIGHT PROTECTED DOCUMENT ISO 2013All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on the internet
6、 or an intranet, without prior written permission. Permission can be requested from either ISO at the address below or ISOs member body in the country of the requester.ISO copyright officeCase postale 56 CH-1211 Geneva 20Tel. + 41 22 749 01 11Fax + 41 22 749 09 47E-mail copyrightiso.orgWeb www.iso.o
7、rgPublished in SwitzerlandBS ISO 15932:2013ISO 15932:2013(E) ISO 2013 All rights reserved iiiContents PageForeword ivIntroduction v0 Scope . 11 Abbreviated terms 12 Definitions of terms used in the physical basis of AEM 23 Definitions of terms used in AEM instrumentation . 54 Definitions of terms us
8、ed in specimen preparation of AEM 105 Definitions of terms used in AEM image formation and processing .116 Definitions of terms used in AEM image interpretation and analysis .137 Definitions of terms used in the measurement and calibration of AEM image magnification and resolution 178 Definitions of
9、 terms used in electron diffraction in AEM 18Bibliography .21BS ISO 15932:2013ISO 15932:2013(E)ForewordISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carrie
10、d out through ISO technical committees. Each member body interested in a subject for which a technical committee has been established has the right to be represented on that committee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. IS
11、O collaborates closely with the International Electrotechnical Commission (IEC) on all matters of electrotechnical standardization.The procedures used to develop this document and those intended for its further maintenance are described in the ISO/IEC Directives, Part 1. In particular the different
12、approval criteria needed for the different types of ISO documents should be noted. This document was drafted in accordance with the editorial rules of the ISO/IEC Directives, Part 2. www.iso.org/directivesAttention is drawn to the possibility that some of the elements of this document may be the sub
13、ject of patent rights. ISO shall not be held responsible for identifying any or all such patent rights. Details of any patent rights identified during the development of the document will be in the Introduction and/or on the ISO list of patent declarations received. www.iso.org/patentsAny trade name
14、 used in this document is information given for the convenience of users and does not constitute an endorsement.The committee responsible for this document is ISO/TC 202, Microbeam analysis, Subcommittee SC 1, Terminology.iv ISO 2013 All rights reservedBS ISO 15932:2013ISO 15932:2013(E)IntroductionA
15、nalytical electron microscopy (AEM) is a technique used to qualitatively determine and quantitatively measure the elemental composition and examine the electronic state of the small volume of solid material observed by transmission electron microscopy (TEM) and scanning transmission electron microsc
16、opy (STEM). AEM is based on the physical mechanism of electron-stimulated X-ray spectrometry and electron energy loss spectrometry (EELS). AEM also provides structural information from small regions by microdiffraction while still possessing the capability of high-resolution imaging.9As a major sub-
17、field of microbeam analysis (MBA), AEM is widely applied in diverse business sectors (high-technology industries, basic industries, metallurgy and geology, biology and medicine, environmental protection, trade, etc.) and has a wide business environment for standardization.The standardization of term
18、inology in a technical field is one of the basic prerequisites for the development of standards on other aspects of that field.This International Standard is relevant to the international scientific and engineering communities that require an AEM vocabulary that contains consistent definitions of te
19、rms, as they are used in the practice of MBA combined with TEM and STEM.This International Standard is one developed in a package of standards on scanning electron microscopy (SEM; ISO 22493), electron probe X-ray microanalysis (EPMA; ISO 23833), energy-dispersive X-ray spectrometry (EDS; ISO 22309)
20、, etc., which have been either already developed or are to be developed by ISO/TC 202, Microbeam analysis, to completely cover the field of MBA. ISO 2013 All rights reserved vBS ISO 15932:2013BS ISO 15932:2013Microbeam analysis Analytical electron microscopy Vocabulary0 ScopeThis International Stand
21、ard defines terms used in the practice of AEM. It covers both general and specific concepts classified according to their hierarchy in a systematic order.This International Standard is applicable to all standardization documents relevant to the practice of AEM. In addition, some parts of this Intern
22、ational Standard are applicable to those documents relevant to the practice of related fields (e.g. TEM, STEM, SEM, EPMA, EDX) for the definition of those terms common to them.NOTE See also the ISO online browsing platform (OBP): https:/www.iso.org/obp/ui/1 Abbreviated termsAEM analytical electron m
23、icroscope/microscopyCBED convergent beam electron diffractionCCD charge-coupled deviceCRT cathode ray tubeEDS energy-dispersive X-ray spectrometer/spectroscopyEDX energy-dispersive X-ray spectrometer/spectroscopyEELS electron energy loss spectrometer/spectroscopyEPMA electron probe microanalysisFFT
24、fast Fourier transformFIB focused ion beamFWHM full width at half maximumHAADF high-angle annular dark fieldHREM high-resolution transmission electron microscope/microscopyLAADF low-angle annular dark fieldMBA microbeam analysisSE secondary electronSEM scanning electron microscopySTEM scanning trans
25、mission electron microscope/microscopyTEM transmission electron microscope/microscopyINTERNATIONAL STANDARD ISO 15932:2013(E) ISO 2013 All rights reserved 1BS ISO 15932:2013ISO 15932:2013(E)2 Definitions of terms used in the physical basis of AEM2.1electron opticsscience that deals with the trajecto
26、ry of electrons as they pass through electrostatic and/or electromagnetic fieldsSOURCE: ISO 22493, modified2.1.1electron sourcedevice that generates electrons necessary for forming an electron beam in an electron optical system2.1.1.1energy spreaddiversity of energy of electrons in the incident beam
27、SOURCE: ISO 22493, modified2.1.1.2effective source sizeeffective dimension of the electron source typically measured at the beam crossoverSOURCE: ISO 22493, modified2.1.2electron emissionejection of electrons from the surface of a material under certain excitation conditionsSOURCE: ISO 22493:2008, 3
28、.1.22.1.2.1thermionic emissionelectron emission which relies on the use of high temperature to enable electrons in the cathode to overcome the work function energy barrier and escape into the vacuum assisted by the application of an external electrostatic fieldSOURCE: ISO 22493, modified2.1.2.2field
29、 emissionelectron emission caused by the strong electric field on and near the surface of the materialSOURCE: ISO 22493, modified2.1.2.2.1cold field emissionfield emission in which the emission process relies purely on the applied electric field to extract electrons from the cathode operating at amb
30、ient temperatureSOURCE: ISO 22493, modified2.1.2.2.2thermal field emissionfield emission in which the emission process relies on both the elevated temperature of the cathode tip and an applied electric field of high voltageSOURCE: ISO 22493, modified2 ISO 2013 All rights reservedBS ISO 15932:2013ISO
31、 15932:2013(E)2.1.3electron lensbasic component of an electron optical system, using an electrostatic and/or electromagnetic field to change the trajectories of the electrons passing through it2.1.3.1electrostatic lenselectron lens employing an electrostatic field formed by a specific configuration
32、of electrodes2.1.3.2electromagnetic lenselectron lens employing an electromagnetic field formed by a specific configuration of electromagnetic coils (or permanent magnets) and pole piecesSOURCE: ISO 22493:2008, 3.1.3.22.1.4focusingconverging an electron beam to a minimum diameter using an electron l
33、ensSOURCE: ISO 22493, modified2.1.5demagnificationnumerical value by which the diameter of the electron beam exiting a lens is reduced in comparison to the diameter of the electron beam entering the lensSOURCE: ISO 22493:2008, 3.1.52.2electron scatteringelectron deflection with or without the loss o
34、f kinetic energy as a result of collision(s) with target atom(s) or electron(s)SOURCE: ISO 22493 and ISO 23833, modified2.2.1elastic scatteringelectron scattering in which energy and momentum are conserved in the collision systemSOURCE: ISO 22493:2008, 3.2.12.2.1.1zero lossunscattered and elasticall
35、y scattered electrons (with only minimal loss of energy due to phonon excitation), giving rise to an intensity peak or the position of which defines zero in the electron energy loss spectrum2.2.2inelastic scatteringelectron scattering in which energy and/or momentum are not conserved in the collisio
36、n systemNote 1 to entry: For inelastic scattering, the electron trajectory is modified by plasmon loss, core loss, and other multiple scatteringsSOURCE: ISO 22493, modified2.2.2.1thermal diffuse scatteringelectron scattering which is caused by electron-phonon scattering due to thermal vibration of t
37、he lattice ISO 2013 All rights reserved 3BS ISO 15932:2013ISO 15932:2013(E)2.2.2.2plasmon losstype of energy loss in EELS in which the incident electron is affected by the collective oscillations of free electrons in the specimen and loses kinetic energy as a result2.2.2.3inner-shell ionizationexcit
38、ation of an electron bound in an inner-shell (nonvalence) orbital to an unbound state in the continuum above the Fermi level2.2.2.4core lossenergy loss of an electron in the beam caused by excitation of an inner-shell electron2.2.3scattering cross-sectionhypothetical area normal to the incident radi
39、ation that would geometrically intercept the total amount of radiation actually scattered by a scattering atomNote 1 to entry: Scattering cross-section is usually expressed only as area (m2).SOURCE: ISO 22493:2008, 3.2.32.3Bloch wavewave function of an electron in a periodic crystal potential, which
40、 is written as the product of a plane wave envelope function and a periodic function that has the same periodicity as the crystal potential2.3.1anomalous absorptionabsorption of Bloch wave in a crystalline material when the wave is symmetric and forms its antinodes at the nuclei2.3.2anomalous transm
41、issiontransmission of Bloch wave in a crystalline material when the wave is antisymmetric and forms its nodes at the nuclei2.4coherencewave property exhibited by electron beams in which two waves share the same frequency and are in phaseNote 1 to entry: Phase shifts between two coherent beams result
42、 in interference and generate diffraction patterns.2.5TEMmicroscopy technique or microscope where images of an ultrathin specimen are obtained by an electron beam that is transmitted through it2.5.1HREMmethod for obtaining lattice and crystal structure images by interfering with a transmitted electr
43、on wave and diffracted electron waves using an electromagnetic lens with a small spherical aberration2.5.2STEMtransmission electron microscopy technique which rasters the focused electron beam over the specimen4 ISO 2013 All rights reservedBS ISO 15932:2013ISO 15932:2013(E)2.5.3HAADF-STEMimaging mod
44、e in a scanning transmission electron microscope in which images are formed by collecting very high-angle, incoherently scattered electrons with an annular dark-field detector2.5.4LAADF-STEMimaging mode in a scanning transmission electron microscope in which images are formed by collecting low-angle
45、 elastic and inelastic scattering electrons with an annular dark-field detector2.5.5ABF-STEMimaging technique of acquiring a bright-field scanning transmission electron microscope image with an annular detector2.6electron holographyapplication of holography techniques to electron waves in which the
46、coherent beam is split into at least two beams by using an electron biprism2.6.1electron prismdevice which splits the coherent electron beam into several beams in order to obtain an interferogram or hologram2.7Lorentz electron microscopymethod for observing magnetic domain structures by use of the t
47、ransmission electron microscope2.8phase-contrast electron microscopyTEM technique in which small phase shifts in the transmitted beam resulting from interactions with the specimen are converted into amplitude or contrast changes in the image2.9electron tomographyreconstruction technique of a three-d
48、imensional structure by the computer-assisted image processing of a series of projected images obtained by continuously tilting the specimen3 Definitions of terms used in AEM instrumentation3.1electron guncomponent that produces an electron beam with a well-defined kinetic energy SOURCE: ISO 22493:2
49、008, 4.13.1.1Schottky emissionthermionic electron emission that takes place under an electric field that enhances the emission by lowering the surface barrierSOURCE: ISO 22493, modified3.1.2field emission gunelectron gun employing field emissions sources, such as cold field electron emission or Schottky emission ISO 2013 All rights reserved 5BS ISO 15932:2013ISO 15932:2013(E)3.1.2.1cold field emission gunelectron gun employing cold field emission3.1.2.2extracting electrodeelectrode applying the electrosta
