DIN ISO 18115-1-2017 Surface chemical analysis - Vocabulary - Part 1 General terms and terms used in spectroscopy (ISO 18115-1 2013)《表面化学分析 词汇 第1部分 一般术语和光谱学术语(ISO 18115-1-2013)》.pdf

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1、July 2017 English price group 32No part of this translation may be reproduced without prior permission ofDIN Deutsches Institut fr Normung e. V., Berlin. Beuth Verlag GmbH, 10772 Berlin, Germany,has the exclusive right of sale for German Standards (DIN-Normen).ICS 01.040.71; 71.040.40!%h8“2692161www

2、.din.deDIN ISO 18115-1Surface chemical analysis Vocabulary Part 1: General terms and terms used in spectroscopy (ISO 181151:2013),English translation of DIN ISO 18115-1:2017-07Chemische Oberflchenanalyse Vokabular Teil 1: Allgemeine Begriffe und Begriffe fr die Spektroskopie (ISO 181151:2013),Englis

3、che bersetzung von DIN ISO 18115-1:2017-07Analyse chimique des surfaces Vocabulaire Partie 1: Termes gnraux et termes utiliss en spectroscopie (ISO 181151:2013),Traduction anglaise de DIN ISO 18115-1:2017-07www.beuth.deDocument comprises 109 pagesDTranslation by DIN-Sprachendienst.In case of doubt,

4、the German-language original shall be considered authoritative.07.17 Introduction 50 Scope . 61 Abbreviated terms 62 Format . 82.1 Use of terms printed italic in definitions 82.2 Non-preferred and deprecated terms . 82.3 Subject fields . 93 Definitions of the surface analysis methods 94 Definitions

5、of terms for surface analysis . 135 Definitions of terms for multivariate analysis 886 Definitions of supplementary terms for surface analysis methods .957 Definitions of supplementary terms for surface analysis .1008 Definitions of supplementary terms for multivariate analysis . 106Annex A (informa

6、tive) Extract from IEC 60050-11111107Bibliography . 109National foreword 3 National Annex NA (informative) Bibliography 3 A comma is used as the decimal marker. Contents Page Foreword 4 DIN ISO 18115-1:2017-072 National foreword This standard (ISO 18115-1:2013) has been prepared by Technical Committ

7、ee ISO/TC 201 “Surface chemical analysis” (Secretariat: JISC, Japan). The responsible German body involved in its preparation was DIN-Normenausschuss Materialprfung (DIN Standards Committee Materials Testing), Working Committee NA 062-08-16 AA “Surface chemical analysis and scanning probe microscopy

8、”. This document contains non-SI units: 1 Barn = 1028m2. The DIN Standard corresponding to the International Standard referred to in this document is as follows: ISO 80000-10 DIN EN ISO 80000-10 National Annex NA (informative) Bibliography DIN EN ISO 80000-10, Quantities and units Part 10: Atomic an

9、d nuclear physics DIN ISO 18115-1:2017-07 3 ForewordISO (the International Organization for Standardization) is a worldwide federation of national standards bodies (ISO member bodies). The work of preparing International Standards is normally carried out through ISO technical committees. Each member

10、 body interested in a subject for which a technical committee has been established has the right to be represented on that committee. International organizations, governmental and non-governmental, in liaison with ISO, also take part in the work. ISO collaborates closely with the International Elect

11、rotechnical Commission (IEC) on all matters of electrotechnical standardization.The procedures used to develop this document and those intended for its further maintenance are described in the ISO/IEC Directives, Part 1. In particular the different approval criteria needed for the different types of

12、 ISO documents should be noted. This document was drafted in accordance with the editorial rules of the ISO/IEC Directives, Part 2 (see www.iso.org/directives).Attention is drawn to the possibility that some of the elements of this document may be the subject of patent rights. ISO shall not be held

13、responsible for identifying any or all such patent rights. Details of any patent rights identified during the development of the document will be in the Introduction and/or on the ISO list of patent declarations received (see www.iso.org/patents).Any trade name used in this document is information g

14、iven for the convenience of users and does not constitute an endorsement.For an explanation on the meaning of ISO specific terms and expressions related to conformity assessment, as well as information about ISOs adherence to the WTO principles in the Technical Barriers to Trade (TBT) see the follow

15、ing URL: Foreword - Supplementary informationThe committee responsible for this document is ISO/TC 201, Surface chemical analysis, Subcommittee SC 1, Terminology.This second edition cancels and replaces the first edition (ISO 18115-1:2010), which has been technically revised.ISO 18115 consists of th

16、e following parts, under the general title Surface chemical analysis Vocabulary: Part 1: General terms and terms used in spectroscopy Part 2: Terms used in scanning-probe microscopyDIN ISO 18115-1:2017-07 4 IntroductionSurface chemical analysis is an important area which involves interactions betwee

17、n people with different backgrounds and from different fields. Those conducting surface chemical analysis might be materials scientists, chemists, or physicists and might have a background that is primarily experimental or primarily theoretical. Those making use of the surface chemical data extend b

18、eyond this group into other disciplines.With the present techniques of surface chemical analysis, compositional information is obtained for regions close to a surface (generally within 20 nm) and composition-versus-depth information is obtained with surface analytical techniques as surface layers ar

19、e removed. The surface analytical terms covered in this part of ISO 18115 extend from the techniques of electron spectroscopy and mass spectrometry to optical spectrometry and X-ray analysis. The terms covered in ISO 18115-2 relate to scanning-probe microscopy. Concepts for these techniques derive f

20、rom disciplines as widely ranging as nuclear physics and radiation science to physical chemistry and optics.The wide range of disciplines and the individualities of national usages have led to different meanings being attributed to particular terms and, again, different terms being used to describe

21、the same concept. To avoid the consequent misunderstandings and to facilitate the exchange of information, it is essential to clarify the concepts, to establish the correct terms for use, and to establish their definitions.The terms and definitions in this International Standard have been prepared i

22、n conformance with the principles and style defined in ISO 1087-1:2000 and ISO 10241:1992. Essential aspects of these standards appear in 2.1 to 2.3. This part of ISO 18115 comprises the 78 abbreviations and 590 definitions of the combined ISO 18115-1:2010 and Amendment 1 to ISO 18115-1:2010. Correc

23、tions have been made to terms 4.61, backscattering factor, and 4.480, unified atomic mass unit that appeared in ISO 18115-1:2010.The terms are given in alphabetical order, classified under Clauses 3, 4, and 5 from the former International Standard with corrections and Clauses 6, 7, and 8 from Amendm

24、ent 1: Clause 3: Definitions of the surface analysis methods; Clause 4: Definitions of terms for surface analysis; Clause 5: Definitions of terms for multivariate analysis; Clause 6: Definitions of supplementary terms for the surface analysis methods; Clause 7: Definitions of supplementary terms for

25、 surface analysis; Clause 8: Definitions of supplementary terms for multivariate analysis.Additional terms, important for surface analysis, are given in an extract from IEC 60050-111 in Annex A.DIN ISO 18115-1:2017-07 5 0 ScopeThis part of ISO 18115 defines terms for surface chemical analysis. It co

26、vers general terms and those used in spectroscopy while ISO 18115-2 covers terms used in scanning-probe microscopy.1 Abbreviated termsAC alternating currentAES Auger electron spectroscopyAMRSF average matrix relative sensitivity factorANN artificial neural networkAPECS Auger photoelectron coincidenc

27、e spectroscopyARAES angle-resolved Auger electron spectroscopyAREPES angle-resolved elastic peak electron spectroscopyARXPS angle-resolved X-ray photoelectron spectroscopyCDP compositional depth profileCRM certified reference materialDA/DFA discriminant analysis/discriminant function analysisDAPCI d

28、esorption atmospheric pressure chemical ionizationDAPPI desorption atmospheric pressure photoionizationDART direct analysis in real timeDC direct currentDESI desorption electrospray ionizationDRS direct recoil spectroscopyeV electron voltsEELS electron energy loss spectroscopyEESI extractive electro

29、spray ionizationEIA energetic-ion analysisELDI electrospray enhanced laser desorption mass spectrometryDIN ISO 18115-1:2017-07 6 EPES elastic peak electron spectroscopyEPMA electron probe microanalysisERD elastic recoil detectionERDA elastic recoil detection analysisESCA electron spectroscopy for ch

30、emical analysisEXAFS extended X-ray absorption fine structure spectroscopyFABMS fast atom bombardment mass spectrometryFIB focused ion beam systemFWHM full width at half maximumGDMS glow discharge mass spectrometryGDOES glow discharge optical emission spectrometryGDS glow discharge spectrometryGISAX

31、S grazing-incidence small-angle X-ray scatteringHSA hemispherical sector analyserIBA ion beam analysisISS ion-scattering spectrometryLAESI laser ablation electrospray ionizationLB Langmuir-BlodgettLDI laser desorption ionizationLEIS(S) low-energy ion scattering spectrometryLMIG liquid-metal ion gunL

32、MIS liquid-metal ion sourceMAF analysis maximum autocorrelation factor analysisMALDI matrix-assisted laser desorption/ionization mass spectrometryMALDESI matrix-assisted laser desorption electrospray ionizationMCR multivariate curve resolutionMEIS(S) medium-energy ion scattering spectrometryMVA mult

33、ivariate analysisNEXAFS near-edge extended X-ray absorption fine structure spectroscopyPADI plasma-assisted desorption ionizationPCA principal-component analysisPERSF pure-element relative sensitivity factorDIN ISO 18115-1:2017-07 7 PIXE particle-induced X-ray emissionPLS partial least squaresRBS Ru

34、therford backscattering spectrometryREELS reflection electron energy loss spectroscopyRISR relative instrument spectral response functionrf radio-frequencyRM reference materialRSF relative sensitivity factorSALDI surface-assisted laser desorption/ionizationSAM self-assembled monolayerSAXS small-angl

35、e X-ray scatteringSDP sputter depth profileSEM scanning electron microscopeSEP surface excitation parameterSEXAFS surface extended X-ray absorption fine structure spectroscopySIMS secondary-ion mass spectrometrySNMS sputtered neutral mass spectrometrySSA spherical sector analyserTOF or ToF time of f

36、lightTXRF total-reflection X-ray fluorescence spectroscopyUPS ultraviolet photoelectron spectroscopyXAFS X-ray absorption fine structure spectroscopyXANES X-ray absorption near-edge spectroscopyXPS X-ray photoelectron spectroscopyXRR X-ray reflectometryXSW X-ray standing waves2 Format2.1 Use of term

37、s printed italic in definitionsA term printed in italics in a definition or a note is defined in another entry in this part of ISO 18115. However, the term is printed in italics only the first time it occurs in each entry.2.2 Non-preferred and deprecated termsA term listed lightface is non-preferred

38、 or deprecated. The preferred term is listed boldface.DIN ISO 18115-1:2017-07 8 2.3 Subject fieldsWhere a term designates several concepts, it is necessary to indicate the subject field to which each concept belongs. The field is shown lightface, between angle brackets, preceding the definition, on

39、the same line.3 Definitions of the surface analysis methods3.1Auger electron spectroscopyAESmethod in which an electron spectrometer (4.190) is used to measure the energy distribution of Auger electrons (4.37) emitted from a surface (4.458)Note 1 to entry: An electron beam in the energy range 2 keV

40、to 30 keV is often used for excitation of the Auger electrons. Auger electrons can also be excited with X-rays, ions, and other sources but the term Auger electron spectroscopy, without additional qualifiers, is usually reserved for electron-beam-induced excitation. Where an X-ray source is used, th

41、e Auger electron energies are referenced to the Fermi level (4.211) but, where an electron beam is used, the reference can either be the Fermi level or the vacuum level (4.483). Spectra, conventionally, can be presented in the direct (4.173) or differential (4.171) forms.3.2desorption electrospray i

42、onizationDESImethod in which a mass spectrometer is used to measure the mass-to-charge quotient and abundance of ionized entities emitted from a sample in air as a result of the bombardment by ionized solvent droplets generated by pneumatically assisted electrospray ionizationNote 1 to entry: Water

43、and methanol are often used as the solvents to create the droplets. Acids and alkalis are added to control the solution pH.Note 2 to entry: DESI is one of the few surface analysis methods designed to analyse materials without exposure to vacuum. It is used for complex molecules, organic molecules, a

44、nd biomolecules. In vivo analysis is claimed to be possible.3.3dynamic SIMSSIMS (3.17) in which the material surface (4.458) is sputtered at a sufficiently rapid rate that the original surface cannot be regarded as undamaged during the analysisNote 1 to entry: Dynamic SIMS is often simply termed SIM

45、S.Note 2 to entry: The ion areic dose (4.175) during measurement is usually more than 1016ions/m2.3.4elastic peak electron spectroscopyEPESmethod in which an electron spectrometer (4.190) is used to measure the energy, intensity, and/or energy broadening distribution of quasi-elastically scattered e

46、lectrons from a solid or liquid surface (4.458)Note 1 to entry: See recoil effect (4.366) and reflection electron energy loss spectroscopy (REELS) (3.16).Note 2 to entry: An electron beam in the energy range 100 eV to 3 keV is often used for this kind of spectroscopy.Note 3 to entry: In general, ele

47、ctron sources with energy spreads that are less than 1 eV are required to provide adequate information.Note 4 to entry: EPES is often an auxiliary method of AES (3.1) and REELS (3.16), providing information on the composition of the surface layer. EPES is suitable for the experimental determination of the inelastic mean free path (4.243), the electron differential elastic scattering cross section (4.127), and the surface excitation parameter (4.461).DIN ISO 18115-1:2017-07 9

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