1、 KSKSKSKSKSKSKSK KSKSKS KSKSK KSKS KSK KS KS D ISO 17973 KS D ISO 17973:2011 2011 12 30 http:/www.kats.go.krKS D ISO 17973:2011 : ( ) ( ) ( ) : (http:/www.standard.go.kr) ： ：2003 8 30 ：2011 12 30 2011-0687 ： ： ( 02-509-7294) (http:/www.kats.go.kr). 10 5 , . KS D ISO 17973:2011 i ii 1 1 2 1 3 .1 4 .1
2、 5 .2 6 .2 6.1 .2 6.2 3 6.3 3 6.4 5 6.5 5 6.6 .5 6.7 .7 6.8 .8 6.9 9 .11 KS D ISO 17973:2011 ii 2002 1 Surface chemical analysis Medium-resolution Auger electron spectrometers Calibration of energy scales for elemental analysis . (Auger electron spectroscopy : AES) . ( ) . 3 eV , ( KS D ISO 179741 )
3、 (Cu) (Al) (Au) . , . , . , 0.5 eV . , . 4.5 eV . . KS D ISO 17973:2011 Surface chemical analysis Medium-resolution Auger electron spectrometers Calibration of energy scales for elemental analysis 1 3 eV . , . , 0.5 % , 2 eV - . 4 keV . 2 . . ( ) . KS D ISO 18115, 3 KS D ISO 18115 . 4 AES a b (zero
4、 offset) (eV) Ecorr Emeas (eV) Emeas (eV) Emeas,n n( 1 )( (eV) Eref,n n( 1 ) (eV) FWHM ; (eV) W n n 1, 2, 3, 4( 1 ) (offset energy)(eV) Ecorr Emeas KS D ISO 17973:2011 2 (eV/s) (s) 5 . , , . , . . . , . 1 . . 1 6 6.1 - 2 100 eV 6.1 6.2 6.3 , 6.4 6.5 6.6 6.7 6.8 6.9 KS D ISO 17973:2011 3 . - 2 000 eV
5、 . (Cu) L3VV 400 000 , (rms) (Cu) L3VV - 0.3 % , 5 keV , . 2 100 eV . Savitzky Golay (Cu) L3VV 400 000 100 000 . , 99.8 % 10 mm 10 mm 0.1 0.2 mm . , 1 % . , . (6.3 ). - 10 20 keV . 6.2 Cu Au Al . . 6.3 , 2 % . ( ) . 6.6 3 % . . . 5 keV 30 A 1 cm2 1 . 2 . KS D ISO 17973:2011 4 a) b) 2 , , KS D ISO 17
6、973:2011 5 c) a b 2 , , ( ) 6.4 . , 2 eV - . . , , , 6.4 6.6 . . , . , . . 6.5 3 3,4 . . (bakeout) . , , . . , . 6.6 6.6.1 . KS D ISO 17973:2011 6 . 6.4 (Cu) M2,3VV L3VV 3 a) b) . a) , 0.1 eV . b) 0.07 W 1 eV/s . W (FWHM) , . / 1 . Savitzky Golay , ( 1 ). 6.6.2 (Au) M5N6,7N6,7 (Cu) L3VV 10 . 2 000 e
7、V 5 keV , . . / 6.6.1 3 c) d) (Au) M5N6,7N6,7 (Al) KL2,3L2,3 . 1 a - - rms n No smoothingSavitzky Golay 9 pointNo smoothing Savitzky Golay 9 point1 2 3 4 Cu M2,3VV Cu L3VV Al KL2,3L2,3 Au M5N6,7N6,7400 000 400 000 400 000 4 000 000 100 000 100 000 100 000 1 000 000 1 % 1 % 1 % 1 % 2 % 2 % 2 % 2 % a
8、 KS D ISO 17973:2011 7 a) Cu M2,3VV b) Cu L3VV c) Au M5N6,7N6,7d) Al KL2,3L2,3 . , . . a b c 3 0.3 % 6.7 3 . 3, a) (Cu) M2,3VV KS D ISO 17973:2011 8 , . “No Smoothing” , . , Savitzky Golay , 2 , Savitzky Golay 3 /2 1 . 1 2 1 . 2 (Au) M5N6,7N6,7 0.15 % . 0.3 % , , 3, c) . 2 0.1 eV Savitzky Golay n 0
9、1 % 0.2 % 0.3 % 0.4 % 0.5 % 1 Cu M2,3VV 9 9 9 9 9 2 Cu L3VV 9 15 19 25 29 3 Al KL2,3L2,3 9 19 29 39 49 4 Au M5N6,7N6,7 19 29 39 55 69 6.8 6.8.1 1 n n . n Emeas,n Eref,n(1) Emeas,n , Eref,n 3 . . . 5 8 . , 9 10 . 6.8.2 1, 2 3 4 . ( , ) 2 eV , . 2 eV , 6.8.3 . 6.6 , 1, 2 3 4 2 eV . n 3 6 eV , . KS D
10、ISO 179741 , . KS D ISO 17973:2011 9 3 Eref,n Eref,n eV n 1 Cu M2,3VV 58 62 60 64 2 Cu L3VV 914 919 915b920b3 Al KL2,3L2,31 388 1 393 1 390b1 395b4 Au M5N6,7N6,72 011a2 016a2 021 2 026 11 13 . a 6 keV 0.3 % R 0.5 % , 1 eV . b 0.27 % R 0.5 % , 1 eV . 6.8.3 , Ecorr Emeas . Ecorr Emeas Ecorr (2) Ecorr
11、 Ecorr aEmeas b (3) a, b 3 n , 1, 2 3 4 Eref,n Ecorr . . +=nnnnnnnnEEnEnEa2,meas2nmeas,meas,meas3131(4) =nnnEanb,meas3131(5) 6.8.4 1, 2 3 4 , a b , . 6.9 6.9.1 , 6.9.2 2 eV , 3 . 1, 2 3 4 2 eV , . 1, 2 3 4 2 eV , . 1, 2 3 4 2 eV . KS D ISO 17973:2011 10 1. , . 6.9.2 . 3 , , . 2 eV . 5,6,7,8,9 8 . 1
12、 5 eV . ( ). 5 8 , 9 . 4.5 eV 4 eV 5 eV . 5 eV . , 14 14 . 6 8 0.5 % , 5 9 0.6 % . 6 2 eV , 5 7 1 000 eV 2 eV , 5 eV 6 eV . 8 9 , 5 eV 4 eV . 2 eV . 10 . KS D ISO 17973:2011 11 1 KS D ISO 17974, 2 SAVITZKY, A. and GOLAY, M.J.E., Smoothing and differentiation of data by simplified least squares proce
13、dures, Analytical Chemistry, July 1964, vol. 36, no. 8, pp. 1627 1639 with corrections by STEINER, J., TERMONIA, Y. and DELTOUR, J., Comments on smoothing and differentiation of data by simplified least square procedure, Analytical Chemistry, Sept 1972, vol. 44, no. 11, pp 19061909 3 SEAH, M.P. and
14、TOSA, M., Linearity in electron counting and detection systems, Surface and Interface Analysis, Mar. 1992, vol. 18, no. 3, pp. 240 246 4 SEAH, M.P., LIM, C.S. and TONG, K.L., Channel electron multiplier efficiencies: The effect of the pulse height distribution on spectrum shape in Auger electron spe
15、ctroscopy, Journal of Electron Spectroscopy, Mar. 1989, vol. 48, no. 3, pp. 209 218 5 DAVIS, L.E., MACDONALD, N.C., PALMBERG, P.W., RIACH, G.E. and WEBER, R.E., Handbook of Auger Electron Spectroscopy, Eden Prairie, MN： Physical Electronics Industries, 1976 6 MCGUIRE, G.E., Auger Electron Spectrosco
16、py Reference Manual, New York： Plenum, 1979 7 SHIOKAWA, Y., ISIDA, T. and HAYASHI, Y., Auger Electron Spectra Catalogue： A Data Collection of Elements, Tokyo： Anelva, 1979 8 SEKINE, T., NAGASAWa, Y., KUDOH, M., SAKAI, Y., PARKES, A.S., GELLER, J.D., MOGAMI, A. and HIRATA, K., Handbook of Auger Elect
17、ron Spectroscopy, Tokyo： JEOL, 1982 9 CHILDS, K.D., CARLSON, B.A., LAVANIER, L.A., MOULDER, J.F., PAUL, D.F., STICKLE, W.F. and WATSON, D.G., Handbook of Auger Electron Spectroscopy, Eden Prairie, MN： Physical Electronics Inc., 1995 10 WAGNER, C.D., Photoelectron and Auger energies and the Auger parameter： A data set, in Practical Surface Analysis, Vol. 1, Auger and X-ray Photoelectron Spectroscopy, Chichester： Wiley, 1990, pp. 595 634 11 SEAH, M.P., AES: Energy calibration of electron spectr
