1、AECMA STANDARD NORME AECMA AECMA NORM Edition approved for publication 31 January 2005 prEN 9132 Edition P 2 January 2005 Comments should be sent within six months after the date of publication to AECMA-STAN PUBLISHED BY THE EUROPEAN ASSOCIATION OF AEROSPACE INDUSTRIES - STANDARDIZATION d%k? the wax
2、 degrades easily under marking processes using a high current and tends to produce a mark of poor quality in these conditions. - Die-impression Die-impression stencil paper is widely used for producing electro-chemical etch marks in many applications. The stencil is made from a colored permeable fab
3、ric with a thin non-permeable laminate surface on one side of the stencil. A Dot Matrix printer is used to punch holes through the laminate coating in the shape of the Data Matrix image. Die-impression stencils are durable and can produce marks of a good quality. The most significant quality concern
4、s derive from the way the stencil is produced. A 24-pin Dot Matrix printer is normally used to produce the images onto the stencil. Problems can occur with inaccuracies in the printing process, such as misalignment of the holes in the stencil paper with the pins in the printer. - Thermal transfer pr
5、inted stencil - disposable This type of stencil material is similar to the Die-impression paper, with a permeable fabric and a non- permeable laminate. The main difference being that the laminate is only microns thick. The laminate is thermally removed from the stencil using a thermal printer leavin
6、g the image on the permeable fabric. The process is generally reliable and produces a good quality mark. The stencils are normally used once and then disposed of. Slight variations in print quality are mainly due to the weave of the permeable fabric structure. 3.4.8 Electrolyte solutions A large num
7、ber of electrolyte solutions exist, the compositions of which may vary according to component material type. However as they are all designed to produce some form of chemical attack of the material, it is vitally important that all traces of electrolyte are washed/removed/neutralized from the entire
8、 component immediately after the marking process is complete. It is also vitally important to note that when applying or removing the electrolyte, that the electrolyte and washing solution shall not be allowed to flow into any openings or cracks between parts. The type/composition and use of the ele
9、ctrolyte fluid shall be the responsibility of the Engineering Design authority. 3.4.9 Marking requirements Inspection of surface color - contrast Surface colors and mark contrast will affect the quality of component identification. In general, dark colors are applied to light surfaces and light mark
10、ings applied to dark surfaces. The minimum contrast level between the marking and its substrate as a gray density difference should be no less than 20 %. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or
11、 networking permitted without license from IHS-,-,-Page 17 prEN 9132:2005 1 CIC go 80 70 69 5C 4Li 30 LO TO n Density scale % Figure 12 - A Scale of Gray Density In order to maximize quality, original surface discoloration should be minimized. Module fill The module size fill shall be 60 - 105 % of
12、the nominal module size. In other words, overlapping of 5 % is permitted. Visual appearance To maximize quality, the process output must be controlled within acceptable visual limits (see Annex E for process guidelines). Module depth Module depth is subject to Engineering Design requirements. The mo
13、dule depth is based upon the requirements for process, environment survivability and other material considerations. Module size Nominal module size is typically in the range of 0,20 mm to 0,60 mm (0.008 to 0.024). Changes to this range should be approved by the Engineering Design authority. Recommen
14、ded nominal module size can be obtained using Table 1 Subclause 3.2: Minimum Readable Module Size by Surface Texture in the dot peen section of this document. 3.4.10 Testing To determine marking parameters, which meet the requirements of Clause 4, process trials shall be performed. Process trials sh
15、all be performed for all material types. If different components from the same material are electro-chemically etched, process trials are required only on one of these components or on a representative sample. In the course of the process trials the following parameters shall be specified: - Type of
16、 equipment - Power Setting - AC and / or DC - Time required for process steps - Electrolyte - Stencil material Other parameters may be required and instructed by Engineering Design Authority. The results of the process trials shall be documented in a test report. If one of the above parameters is ch
17、anged, the process trials must be repeated. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 18 prEN 9132:2005 3.4.1 1 Corrosion protection All met
18、al parts are susceptible to corrosion. It is therefore the responsibility of the Engineering Design authority to specify adequate corrosion protection for metallic parts at all stages of manufacturing. 3.4.12 Quality assurance Maintenance of the Electro-chemical etch marking facilities shall be in a
19、ccordance with instructions from the group responsible for maintenance schedules. Marking verification All characteristics shall be verified during the First Article Inspection (FAI) per EN 91 02 requirements. Annex D “Example Methodology for Checking Dot Peen Characteristics“ may be used as a verif
20、ication guideline for Dot peen marking. FA1 may also apply whenever the marking machine set up is disturbed, or after preventive maintenance or machine Any non-conforming marking shall be submitted to the appropriate non-conformance authority for part disposition. Marking validation and monitoring A
21、 Quality Assurance Plan shall be developed and instituted which ensures the quality of the Data Matrix marking process and which monitors/samples the marking process for declining quality of application, which in turn affects matrix quality requirements. For example, Dot Peen monitoring may be as si
22、mple as detecting approaching dot overlap with a 1OX magnifying glass. Marking equipment should be monitored/serviced through a Preventive Maintenance Plan recommended/developed in conjunction with the equipment supplier to ensure sufficient preventive/scheduled maintenance and to avoid marking outs
23、ide of allowable limits. Any non-conforming marking shall be submitted to the appropriate non-conformance authority for part disposition. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking perm
24、itted without license from IHS-,-,-Page 19 prEN 91 32:2005 Symbol layout Row Column Annex A (informative) Data Data capacity Nominal module size Range Num. Alphanum. 0,22 mm 0.0087 inch Cap. Cap. Symbol size mm inch Dot peening data capacity guidelines for selected surface textures 14 16 14 12x12 16
25、 10 3,08 x 3,08 0.121 xo.121 16 14x14 24 16 3,52 x 3,52 0.139 x 0.139 3 I 2,20 x 2,20 I 0.087 x 0.087 8 8 12 12 I 12 I 10x10 I 10 I 6 I 2,64x2,64 I 0.104x0.104 18 6x16 10 6 1,76 x 3,96 0.069 x 0.156 32 6xI4(2x) 20 13 1,76 x 7,04 0.069 x 0.277 26 10x24 32 22 2,64 x 5,72 0.104 x 0.225 Symbol layout Ro
26、w Column 18 I 18 I 16x16 I 36 I 25 I 3,96x3,96 I 0.156x0.156 Data Data capacity Nominal module size Range Num. Alphanum. 0,31 mm 0.01 2 inch Cap. Cap. Symbol size mm inch 20 I 20 I 18x18 I 44 I 31 I 4,40x4,40 I 0.1730.173 8 12 Rectangular symbol 32 6xI4(2x) 20 13 2,48 x 9,92 0.098 x 0.391 26 10x24 3
27、2 22 3,72 x 8,06 0.146 x 0.317 Surface texture with Ra =2,40 pm or 95 pin 8 I 18 I 6x16 I 10 I 6 I 2,48x5,58 I 0.098x0.220 Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without l
28、icense from IHS-,-,-Page 20 prEN 9132:2005 Symbol layout Row Column Data Data capacity Nominal module size Range Num. Alphanum. 0,41 mm 0.0161 inch Cap. Cap. Symbol size mm inch 10 I 10 I 8x8 I 6 I 3 I 4,10x4,10 I 0.161 x0.161 14 16 12 I 12 I 10x10 I 10 I 6 I 4,92x4,92 I 0.194x0.194 14 12x1 2 16 10
29、574 x 574 0.226 x 0.226 16 14x14 24 16 6,56 x 6,56 0.258 x 0.258 8 8 18 I 18 I 16x16 I 36 I 25 I 7,38 x 7,38 I 0.291 x 0.291 18 6x16 10 6 3,28 x 7,38 0.1 29 x 0.291 32 6xI4(2x) 20 13 3,28 x 13,12 0.129 x 0.517 20 I 20 I 18x18 I 44 I 31 I 8,20x8,20 I 0.323x0.323 12 Rectangular symbol 26 10x24 32 22 4
30、,92 x 10,66 0.1 94 x 0.420 Symbol layout Row Column Data Data capacity Nominal module size Range Num. Alphanum. 0,45 mm 0.01 77 inch Cap. Cap. Symbol size mm inch 16 18 10 I 10 I 8x8 I 6 I 3 I 4,50x4,50 I 0.177x0.177 16 14x14 24 16 7,20 x 7,20 0.283 x 0.283 18 16x1 6 36 25 8,lO x 8,lO 0.319 x 0.319
31、12 I 12 I 10x10 I 10 I 6 I 5,40x5,40 I 0.2130.213 8 12 14 I 14 I 12x12 I 16 I 10 I 6,30x6,30 I 0.248x0.248 32 6xI4(2x) 20 13 3,60 x 14,40 0.142 x 0.567 26 10x24 32 22 5,40 x 11,70 0.213 x 0.461 20 I 20 I 18x18 I 44 I 31 I 9,00x9,00 I 0.354x0.354 Rectangular symbol 8 I 18 I 6x16 I 10 I 6 I 3,60x8,10
32、I 0.142x0.319 Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 21 prEN 91 32:2005 Annex B (informative) Dot peening - Recommendation for stylus gri
33、nding a : 60“, 90“ or 120“ Figure B.l - Tolerance on stylus Figure B.2 - Grinding The grinding of the stylus tip is performed with 45“ crossed axes of the stylus and the grinding disk. The surface may show tangential grinding scores, which reduce illumination problems. Stylus is ground with a diamon
34、d wheel. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 22 prEN 9132:2005 Dot size (diameter) Dot center offset Annex C (informative) 0.0052 to 0
35、.0091 0.0009 to 0.0017 Examples of required tolerances with reference to the nominal module sizes for dot peening Dot size (diameter) Dot center offset Table C.l - Requirements in Inches 0.0073 to 0.0128 0.0012 to 0.0024 I Stylus point radius I 0.0039 Dot size (diameter) Dot center offset 0.0097 to
36、0.0169 0.0016 to 0.0032 I Angle of distortion k 7“ I Stylus point radius I 0.0059 I Angle of distortion k 7“ I Stylus point radius I 0.0098 I Angle of distortion k 7“ I Stylus angle I 120“ or 90“ I Stylus point radius I 0.0079 I Dot size (diameter) 0.0106 to 0.0186 I Dot center offset I 0.0018 to 0.
37、0035 I Angle of distortion k 7“ Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 23 prEN 9132:2005 Stylus angle Stylus point radius Table C.2 - Req
38、uirements in millimeters 90“ or 60“ 0,lO Angle of distortion I Dot size (diameter) I 0,132 to 0,231 I k 7“ Dot center offset Stylus angle Stylus point radius 0,022 to 0,044 I 120“ or 90“ 0,15 Angle of distortion k 7“ I Dot size (diameter) I 0,186 to 0,325 I Stylus angle Stylus point radius Dot cente
39、r offset 120“ or 90“ 0,25 0,031 to 0,062 I Angle of distortion k 7“ Dot size (diameter) Dot center offset I Dot size (diameter) I 0,246 to 0,431 I 0,270 to 0,473 0,045 to 0,090 Dot center offset Angle of distortion 0,041 to 0,082 I k 7“ I Stylus angle I 120“ or 90“ I I Stylus point radius I 0,20 I C
40、opyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 24 prEN 9132:2005 Annex D (informative) Examples of methodology for checking dot peen characteristi
41、cs D.l See Figure D.1. Example method for checking dot size and dot centre offset Figure D.l - Dot size and dot center offset The verification of a Data Matrix symbol may be achieved by one of the following methods: a) magnification using appropriate optical systems b) verification through camera sy
42、stems and software that is capable of evaluating quality to meet the requirements herein. D.2 See Figure D.2. Example method for checking angle of distortion 3 Figure D.2 - Angle of distortion Angle of distortion may be verified by the following methods: a) magnification using appropriate optical sy
43、stems b) verification through camera systems and software that is capable of evaluating quality to meet the requirements herein. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted wit
44、hout license from IHS-,-,-Page 25 prEN 91 32:2005 D.3 Example method for checking dot peen depth The dot depth is a function of the stylus radius, the stylus cone angle and the actual dot size. Table D.l contains the dot depth established from calculation, see Figures D.3 and D.4. The actual dot dep
45、th may be closely approximated by measuring the tip wear of the stylus, see Figure D.5. However, actual hardness of parts and stylus, which affect the tip wear of the stylus have to be taken into account. Other techniques may be used to measure actual dot depth. Figure D.3 - Example with 60“ stylus
46、angle and .O04 radius Calculating the dot depth based on comparison of the dot size Figure D.4 The dot size can be measured with appropriate magnification or use of photographic techniques involving scaled measurements. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provid
47、ed by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 26 prEN 9132:2005 D.4 Example method for checking dot peen depth Figure D.5 The wear of a stylus is best measured with a comparator. Subtracting the stylus wear from the calculat
48、ed dot depth (Table D.l) yields a sufficiently accurate approximation of the achieved dot depth. Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with AECMANot for ResaleNo reproduction or networking permitted without license from IHS-,-,-Page 2
49、7 prEN 9132:2005 D.5 Example method for checking dot peen depth Table D.l mm I Stylus Dot size cone angle Nominal module size inch 0.0087 0.0122 0.0161 0.0177 Stylus radius Dot depth inch 0.0039 0.0039 0.0059 0.0059 0.0098 0.0098 0.0079 0.0079 Copyright Association Europeene des Constructeurs de Materiel Aerospatial Provided by IHS under license with
