1、Designation: F1367 98 (Reapproved 2011)Standard Specification forChromium Sputtering Targets for Thin Film Applications1This standard is issued under the fixed designation F1367; the number immediately following the designation indicates the year oforiginal adoption or, in the case of revision, the
2、year of last revision. A number in parentheses indicates the year of last reapproval. Asuperscript epsilon () indicates an editorial change since the last revision or reapproval.1. Scope1.1 This specification covers sputtering targets fabricatedfrom chromium metal.1.2 This specification sets purity
3、grade levels, physicalattributes, analytical methods and packaging requirements.1.3 The values stated in SI units are to be regarded asstandard. No other units of measurement are included in thisstandard.2. Referenced Documents2.1 ASTM Standards:2E112 Test Methods for Determining Average Grain Size3
4、 Terminology3.1 Definitions of Terms Specific to This Standard:3.1.1 raw material lotoriginal material lot from which anumber of targets is fabricated.3.1.2 relative density, nactual target density divided bythe theoretical density of chromium, 7.21 g/cm2.4. Classification4.1 Grades of chromium are
5、 defined in Table 1.4.2 Grade, as defined in Table 1, is based on the totalmetallic impurity content of the metallic elements listed inTable 2. Elements not detected shall be counted and reported aspresent at the detection limit5. Ordering Information5.1 Orders for these targets shall include the fo
6、llowing:5.1.1 Grade,5.1.2 Configuration, (see 8.1 and 8.2),5.1.3 Whether certification is required, (see 12.1), and5.1.4 Whether a sample representative of the finished prod-uct is required to be provided by the supplier to the purchaser.6. Chemical Composition6.1 The metallic elements listed in Tab
7、le 2 shall be assayedand reported.6.2 Gaseous elements to be assayed and reported are C, O,N and S.6.3 Other elements may be assayed and reported as agreedupon between the purchaser and the supplier, but these shallnot be counted in determining the grade designation.6.3.1 Acceptable limits and analy
8、tical techniques for addi-tional elements shall be agreed upon between the purchaser andthe supplier.7. Physical Properties7.1 Minimum relative density shall be agreed upon by thepurchaser and the supplier.7.2 Actual target density shall be determined byArchimedesprinciple or other acceptable techni
9、ques.7.3 Grain size shall be agreed upon between the purchaserand the supplier, and reported in accordance with Test MethodE112.8. Dimensions, Mass, and Permissible Variations8.1 Each target shall conform to an appropriate engineeringdrawing.8.2 Nominal dimensions, tolerances and other attributessha
10、ll be agreed upon between purchaser and supplier.1This specification is under the jurisdiction of ASTM Committee F01 onElectronics and is the direct responsibility of Subcommittee F01.17 on SputterMetallization.Current edition approved June 1, 2011. Published June 2011. Originallyapproved in 1992. L
11、ast previous edition approved in 2003 as F1367-98 (2003). DOI:10.1520/F1367-98R11.2For referenced ASTM standards, visit the ASTM website, www.astm.org, orcontact ASTM Customer Service at serviceastm.org. For Annual Book of ASTMStandards volume information, refer to the standards Document Summary pag
12、e onthe ASTM website.TABLE 1 Chromium GradesAGrade Implied Purity, %Metallic Impurity Level byWeight, ppm, max4N 99.99 1003N7 99.97 3003N5 99.95 5003N 99.9 10002N8 99.8 2000AAdditional grades may be designated by following the same pattern. That is,examine the purity expressed in weight percent. Cou
13、nt the leading, “9s” and setthis number as “n”. Then note the first following digit, if present, (rounded ifnecessary) and call this numeral “x”. The grade is expressed as “nNx”.1Copyright ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959, United States.9. Work
14、manship, Finish and Appearance9.1 Workmanship, finish and appearance shall be agreedupon between the purchaser and the supplier.10. Sampling10.1 Analyses for impurities shall be performed on a samplethat is representative of the finished product.10.2 Reporting analytical results of the unprocessed r
15、awmaterial lot is not acceptable.11. Analytical Methods11.1 Analysis for impurities in Table 2 and 6.2 shall beperformed as follows:11.1.1 Carbon, Oxygen and SulfurCombustion/infraredspectrometry, mdl of 10 ppm, or less.11.1.2 NitrogenThermal conductivity spectrometry, mdlof 10 ppm, or less.11.1.3 A
16、ll OthersAA, direct current plasma (DCP), induc-tively coupled plasma (ICP), spark source mass spectroscopy(SSMS) or glow discharge mass spectroscopy (GDMS), mdl of5 ppm, or less.11.1.4 Other analytical techniques may be used providedthey can be proved equivalent to the methods specified, andhave mi
17、nimum detection limits of the specified methods.12. Certification12.1 When required by the purchaser, a certificate of analy-sis that represents the finished material lot shall be provided foreach target.12.2 Certificate of analysis shall state the manufacturers orsuppliers name, the suppliers lot n
18、umber, impurity levels,method of analysis, and any other information agreed uponbetween the purchaser and the supplier.12.3 Impurity levels may be reported on a certificate ofanalysis using actual analytical results, or typical results basedupon historical statistical data for the same process, as a
19、greedupon between the purchaser and the supplier. The minimumdetection limit for each element listed in Table 2 that was notdetected in the analysis shall be noted on the certificate ofanalysis.13. Product Marking13.1 Each target shall be marked on a non-sputteringsurface with a unique lot number, a
20、 unique target number,purity grade, and any other information agreed upon betweenthe purchaser and the supplier.14. Packaging and Package Marking14.1 Single piece targets shall be individually vacuum orinert gas packed, and enclosed in a shipping carton that ensurestarget integrity during shipment.1
21、4.2 Each component of multiple piece targets shall beindividually vacuum or inert gas packed; the resulting pack-ages shall then be individually or collectively enclosed in ashipping carton that ensures target integrity during shipment.15. Keywords15.1 chromium; sputtering; targetsASTM International
22、 takes no position respecting the validity of any patent rights asserted in connection with any item mentionedin this standard. Users of this standard are expressly advised that determination of the validity of any such patent rights, and the riskof infringement of such rights, are entirely their ow
23、n responsibility.This standard is subject to revision at any time by the responsible technical committee and must be reviewed every five years andif not revised, either reapproved or withdrawn. Your comments are invited either for revision of this standard or for additional standardsand should be ad
24、dressed to ASTM International Headquarters. Your comments will receive careful consideration at a meeting of theresponsible technical committee, which you may attend. If you feel that your comments have not received a fair hearing you shouldmake your views known to the ASTM Committee on Standards, a
25、t the address shown below.This standard is copyrighted by ASTM International, 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959,United States. Individual reprints (single or multiple copies) of this standard may be obtained by contacting ASTM at the aboveaddress or at 610-832-9585
26、 (phone), 610-832-9555 (fax), or serviceastm.org (e-mail); or through the ASTM website(www.astm.org). Permission rights to photocopy the standard may also be secured from the ASTM website (www.astm.org/COPYRIGHT/).TABLE 2 Minimum Metallic Elements To Be AssayedMetallic Elements To Be Assayed ForAluminum, nickel, silicon, titanium, vanadiumF1367 98 (2011)2
